Water

Water

SCHEMBL108322

[Co+2].[Co+2].[Co+2].[O-2].[O-2].[OH-].[OH-]

nearest known ligand 0.00

Full drug profile on Sugi Atlas →

Known targets — ChEMBL curated mechanism

GABRA1GABRA2GABRA3GABRA4GABRA5GABRA6GABRB1GABRB2GABRB3GABRDGABREGABRG1GABRG2GABRG3GABRPGABRQ

The experimentally established mechanism targets of Water. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Water SCHEMBL14973706 0.87
Water SCHEMBL3678756 0.87
Water SCHEMBL5137146 0.87
Water SCHEMBL29611399 0.87
Water SCHEMBL16468522 0.87
SCHEMBL23529290 0.82
SCHEMBL3927663 0.82
SCHEMBL8454130 0.82
Water SCHEMBL73275 0.82
SCHEMBL3934651 0.82

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 180 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-115869935-B Semiconductor particles for water-splitting photocatalysts, photocatalysts formed from the semiconductor particles, and methods of synthesizing the same 丰田自动车株式会社 2025-01-10 CN claimed
CN-116161709-B Graphene oxide coated nano lithium cobalt oxide positive electrode material and preparation method thereof 电子科技大学长三角研究院(湖州) 2024-12-20 CN claimed
US-12157110-B2 Semiconductor particles used in water-splitting photocatalyst, photocatalyst formed of semiconductor particles, and synthesis method thereof TOYOTA JIDOSHA KABUSHIKI KAISHA (JP) 2024-12-03 US claimed
CN-114072488-B Etching composition 富士胶片电子材料美国有限公司 2024-08-09 CN claimed
EP-3963036-B1 METHOD OF ETCHING SEMICONDUCTORS FUJIFILM ELECTRONIC MAT USA INC (US) 2024-07-10 EP claimed
US-20240174924-A1 ETCHING COMPOSITIONS FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. 2024-05-30 US claimed
US-20240091755-A1 SEMICONDUCTOR PARTICLES USED IN WATER DECOMPOSITION PHOTOCATALYST, PHOTOCATALYST USING THE SAME, AND METHODS OF SYNTHESIZING THEM TOYOTA JIDOSHA KABUSHIKI KAISHA (JP) 2024-03-21 US claimed
CN-114258424-B Etching composition 富士胶片电子材料美国有限公司 2023-07-04 CN claimed
EP-3337859-B1 LIQUID-REPELLENT COATINGS UNIV CALIFORNIA (US) 2023-06-07 EP claimed
CN-116161709-A Graphene oxide coated nano lithium cobalt oxide positive electrode material and preparation method thereof 电子科技大学长三角研究院(湖州) 2023-05-26 CN claimed
US-20200165461-A1 LIQUID-REPELLENT COATINGS THE REGENTS OF THE UNIVERSITY OF CALIFORNIA 2020-05-28 US claimed
CN-107543809-B Test strip for glutathione molecule detection and detection method ZHENGZHOU UNIVERSITY (CN) 2019-12-10 CN claimed
EP-3337859-A1 LIQUID-REPELLENT COATINGS The Regents of the University of California (US) 2018-06-27 EP claimed
WO-2017031391-A1 LIQUID-REPELLENT COATINGS THE REGENTS OF THE UNIVERSITY OF CALIFORNIA (US) 2017-02-23 WO claimed
EP-0864539-B1 Process for producing lithium-cobalt oxide TODA KOGYO CORP (JP) 2002-06-12 EP claimed
EP-0867408-B1 Process for producing lithium-cobalt oxide TODA KOGYO CORP (JP) 2002-06-05 EP claimed
US-6103213-A PARTICLES CAN BE PRODUCED BY CALCINATION IN A SHORT TIME, AND HAVE A NARROW PARTICLE SIZE DISTRIBUTION AND A UNIFORM SMALL PARTICLE SIZE. TODA KOGYO CORPORATION (JP) 2000-08-15 US claimed
EP-0867408-A1 Process for producing lithium-cobalt oxide TODA KOGYO CORP. (JP) 1998-09-30 EP claimed
EP-0864539-A1 Process for producing lithium-cobalt oxide TODA KOGYO CORP. (JP) 1998-09-16 EP claimed
US-5605668-A USING COBALT OXIDE HYDROXIDE INTERMEDIATE QUEENSLAND NICKEL PYT. LTD. (AU) 1997-02-25 US claimed