SCHEMBL1089019

SCHEMBL1089019

C=Cc1cc(OC(C)=O)c(OC(C)=O)c(OC(C)=O)c1

nearest known ligand 0.47

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TUBB4A P04350 2/20 0.47
TUBB P07437 2/20 0.47
TUBA3C P0DPH7 2/20 0.47
TUBA1B P68363 2/20 0.47
TUBA4A P68366 2/20 0.47
TUBB4B P68371 2/20 0.47
TUBB3 Q13509 2/20 0.47
TUBB2A Q13885 2/20 0.47
TUBB8 Q3ZCM7 2/20 0.47
TUBA3E Q6PEY2 2/20 0.47
TUBA1A Q71U36 2/20 0.47
TUBA1C Q9BQE3 2/20 0.47
TUBB6 Q9BUF5 2/20 0.47
TUBB2B Q9BVA1 2/20 0.47
TUBB1 Q9H4B7 2/20 0.47
TOP1 P11387 3/20 0.47
POLB P06746 2/20 0.42
JUN P05412 1/20 0.41
NFKB1 P19838 1/20 0.41
HTT P42858 1/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL22991517 0.90 HTT (0.47) TUBB4ATUBBTUBA3CTUBA1BTUBA4A
SCHEMBL8830702 0.90 TRPA1 (0.41) TUBB4ATUBBTUBA3CTUBA1BTUBA4A
SCHEMBL726669 0.89 TUBB4A (0.60) TUBB4ATUBBTUBA3CTUBA1BTUBA4A
SCHEMBL22991516 0.88 TOP1 (0.40) TUBB4ATUBBTUBA3CTUBA1BTUBA4A
Methyl Alcohol SCHEMBL28819052 0.87 TUBB4A (0.59) TUBB4ATUBBTUBA3CTUBA1BTUBA4A
SCHEMBL8830730 0.85 POLB (0.46) TUBB4ATUBBTUBA3CTUBA1BTUBA4A
SCHEMBL22991412 0.83 JUN (0.41) TUBB4ATUBBTUBA3CTUBA1BTUBA4A
SCHEMBL2939004 0.82 FNTA (0.55) TUBB4ATUBBTUBA3CTUBA1BTUBA4A
SCHEMBL8671926 0.81 KDM4E (0.45) TUBB4ATUBBTUBA3CTUBA1BTUBA4A
SCHEMBL8830854 0.81 TUBB4A (0.47) TUBB4ATUBBTUBA3CTUBA1BTUBA4A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 19 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-108911982-B Environment-friendly method for synthesizing acyloxy-substituted styrene compound 徐州博康信息化学品有限公司 2022-08-26 CN claimed
CN-113880694-B Synthesis method of hydroxy-substituted styrene compound and synthesis method of photoresist resin monomer 徐州博康信息化学品有限公司 2024-09-13 CN disclosed
US-20220348698-A1 COMPOUND, POLYMER, COMPOSITION, COMPOSITION FOR FILM FORMATION, PATTERN FORMATION METHOD, INSULATING FILM FORMATION METHOD, AND METHOD FOR PRODUCING COMPOUND, AS WELL AS METHOD FOR PRODUCING IODINE-CONTAINING VINYL POLYMER AND ACETYLATED DERIVATIVE THEREOF MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2022-11-03 US disclosed
CN-108911982-B Environment-friendly method for synthesizing acyloxy-substituted styrene compound 徐州博康信息化学品有限公司 2022-08-26 CN disclosed
CN-114245792-A Compound, polymer, composition for film formation, method for pattern formation, method for forming insulating film, method for producing compound, and method for producing iodine-containing vinyl polymer and acetylated derivative thereof 三菱瓦斯化学株式会社 2022-03-25 CN disclosed
CN-113880694-A Synthesis method of hydroxyl-substituted styrene compound and synthesis method of photoresist resin monomer 江苏汉拓光学材料有限公司 2022-01-04 CN disclosed
WO-2021029395-A1 COMPOUND, POLYMER, COMPOSITION, COMPOSITION FOR FILM FORMATION, PATTERN FORMING METHOD, METHOD FOR FORMING INSULATING FILM, METHOD FOR PRODUCING COMPOUND, IODINE-CONTAINING VINYL POLYMER AND METHOD FOR PRODUCING ACETYLATED DERIVATIVE OF SAME 三菱瓦斯化学株式会社 2021-02-18 WO disclosed
US-20190276575-A1 METHOD FOR PRODUCING RESIN AND METHOD FOR PRODUCING ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE COMPOSITION FUJIFILM CORPORATION (JP) 2019-09-12 US disclosed
US-8535872-B2 Thermally cured underlayer for lithographic application FUJIFILM ELECTRONIC MATERIALS, U.S.A., INC. (US) 2013-09-17 US disclosed
US-8377617-B2 Toner for developing electrostatic image and manufacturing method of toner for developing electrostatic image KONICA MINOLTA BUSINESS TECHNOLOGIES, INC. (JP) 2013-02-19 US disclosed
US-8377617-B2 Toner for developing electrostatic image and manufacturing method of toner for developing electrostatic image KONICA MINOLTA BUSINESS TECHNOLOGIES, INC. (JP) 2013-02-19 US disclosed
US-20120178871-A1 THERMALLY CURED UNDERLAYER FOR LITHOGRAPHIC APPLICATION DE BINOD B (US) 2012-07-12 US disclosed
US-20120123075-A1 TONER FOR DEVELOPING ELECTROSTATIC IMAGE AND MANUFACTURING METHOD OF TONER FOR DEVELOPING ELECTROSTATIC IMAGE KONICA MINOLTA BUSINESS TECHNOLOGIES, INC. (JP) 2012-05-17 US disclosed
US-20120123075-A1 TONER FOR DEVELOPING ELECTROSTATIC IMAGE AND MANUFACTURING METHOD OF TONER FOR DEVELOPING ELECTROSTATIC IMAGE KONICA MINOLTA BUSINESS TECHNOLOGIES, INC. (JP) 2012-05-17 US disclosed
US-8153346-B2 Hydroxyl containing polymer, amino crosslinking agent and thermal acid generator; undercoating for multilayer lithography material FUJIFILM ELECTRONIC MATERIALS, U.S.A., INC. (US) 2012-04-10 US disclosed
WO-2008103776-A2 THERMALLY CURED UNDERLAYER FOR LITHOGRAPHIC APPLICATION FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) 2008-08-28 WO disclosed
US-20080206676-A1 THERMALLY CURED UNDERLAYER FOR LITHOGRAPHIC APPLICATION FUJIFILM ELECTRONIC MATERIALS, U.S.A, INC 2008-08-28 US disclosed
US-5661153-A FOR TREATING ALLERGIES, ASTHMA, DERMATITIS, GRAFT REJECTIONS JAPAN ENERGY CORPORATION (JP) 1997-08-26 US disclosed
EP-0700908-A1 1-Arylpyrimidine derivatives and pharmaceutical use thereof JAPAN ENERGY CORPORATION (JP) 1996-03-13 EP disclosed