Known targets — ChEMBL curated mechanism
The experimentally established mechanism targets of Adipic Acid. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | LMNA | P02545 | 2/20 | 0.73 |
| ▸ | TSHR | P16473 | 5/20 | 0.69 |
| ▸ | NFKB1 | P19838 | 1/20 | 0.69 |
| ▸ | PMP22 | Q01453 | 1/20 | 0.69 |
| ▸ | AKR1B1 | P15121 | 1/20 | 0.63 |
| ▸ | SLC22A6 | Q4U2R8 | 2/20 | 0.62 |
| ▸ | GPR84 | Q9NQS5 | 8/20 | 0.60 |
| ▸ | PPARG | P37231 | 7/20 | 0.60 |
| ▸ | PPARD | Q03181 | 7/20 | 0.60 |
| ▸ | PPARA | Q07869 | 7/20 | 0.60 |
| ▸ | HDAC11 | Q96DB2 | 5/20 | 0.60 |
| ▸ | PTPN1 | P18031 | 3/20 | 0.60 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.60 |
| ▸ | TLR2 | O60603 | 2/20 | 0.60 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.60 |
| ▸ | FABP4 | P15090 | 2/20 | 0.60 |
| ▸ | FFAR1 | O14842 | 2/20 | 0.60 |
| ▸ | FFAR4 | Q5NUL3 | 2/20 | 0.60 |
| ▸ | SLC22A8 | Q8TCC7 | 1/20 | 0.60 |
| ▸ | MEN1 | O00255 | 1/20 | 0.60 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Adipic Acid SCHEMBL106657 | 1.00 | LMNA (0.73) | LMNATSHRNFKB1PMP22AKR1B1 | |
| Sebacic Acid SCHEMBL5874505 | 0.97 | TSHR (0.75) | LMNATSHRNFKB1PMP22AKR1B1 | |
| Azelaic Acid SCHEMBL8158750 | 0.97 | TSHR (0.75) | LMNATSHRNFKB1PMP22AKR1B1 | |
| Glutarate SCHEMBL105858 | 0.93 | SLC22A6 (0.73) | LMNATSHRNFKB1PMP22AKR1B1 | |
| Glutarate SCHEMBL104189 | 0.93 | SLC22A6 (0.73) | LMNATSHRNFKB1PMP22AKR1B1 | |
| Adipic Acid SCHEMBL28239414 | 0.89 | LMNA (0.92) | LMNATSHRNFKB1PMP22AKR1B1 | |
| Hexanoate SCHEMBL5570503 | 0.89 | AKR1B1 (0.84) | LMNATSHRAKR1B1SLC22A6GPR84 | |
| Stearic Acid SCHEMBL109194 | 0.87 | GPR84 (0.85) | LMNATSHRAKR1B1SLC22A6GPR84 | |
| Octanoic Acid SCHEMBL3118549 | 0.87 | GPR84 (0.85) | LMNATSHRAKR1B1SLC22A6GPR84 | |
| Myristic Acid SCHEMBL5154031 | 0.87 | GPR84 (0.85) | LMNATSHRAKR1B1SLC22A6GPR84 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 48 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| JP-7196781-A | — | — | None | — | — | JP | disclosed |
| EP-2426558-B1 | Silicon-containing film-forming composition, silicon-containing film-formed substrate, and patterning process | SHINETSU CHEMICAL CO (JP) | 2018-10-24 | — | — | EP | disclosed |
| EP-2500775-B1 | PATTERNING PROCESS AND COMPOSITION FOR FORMING SILICON-CONTAINING FILM USABLE THEREFOR | SHINETSU CHEMICAL CO (JP) | 2018-01-03 | — | — | EP | disclosed |
| US-8951711-B2 | Patterning process and composition for forming silicon-containing film usable therefor | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-02-10 | — | — | US | disclosed |
| US-20140342289-A1 | PATTERNING PROCESS AND COMPOSITION FOR FORMING SILICON-CONTAINING FILM USABLE THEREFOR | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-11-20 | — | — | US | disclosed |
| US-8852844-B2 | Composition for forming silicon-containing film, silicon-containing film-formed substrate and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-10-07 | — | — | US | disclosed |
| US-8835102-B2 | Patterning process and composition for forming silicon-containing film usable therefor | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-09-16 | — | — | US | disclosed |
| EP-2172807-B1 | Composition for forming silicon-containing film, silicon-containing film-formed substrate and patterning process | SHINETSU CHEMICAL CO (JP) | 2014-06-18 | — | — | EP | disclosed |
| EP-2172808-B1 | Metal oxide-containing film-forming composition metal oxide-containing film-formed substrate, and patterning process | SHINETSU CHEMICAL CO (JP) | 2014-06-04 | — | — | EP | disclosed |
| US-8652267-B2 | Coated-type silicon-containing film stripping process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-02-18 | — | — | US | disclosed |
| EP-1867681-A1 | Silicon-containing film-forming composition, silicon-containing film, silicon-containing film-bearing substrate, and patterning method | Shin-Etsu Chemical Co., Ltd. (JP) | 2007-12-19 | — | — | EP | disclosed |
| EP-1845132-A2 | Silicon-containing film-forming composition, silicon-containing film, silicon-containing film-bearing substrate, and patterning method | Shinetsu Chemical Co., Ltd. (JP) | 2007-10-17 | — | — | EP | disclosed |
| US-20070238300-A1 | Silicon-containing film-forming composition, silicon-containing film, silicon-containing film-bearing substrate, and patterning method | SHIN-ETSU CHEMICAL CO., LTD. | 2007-10-11 | — | — | US | disclosed |
| EP-0688806-B1 | Biodegradable aliphatic polyester, melt-extrusion film thereof, and process for the production thereof | TOKUYAMA CORP (JP) | 1999-12-22 | — | — | EP | disclosed |
| US-5783271-A | POLYLACTONE GARBAGE BAG; WATER VAPOR PERMABILITY, HIGH MOLECULAR WEIGHT | TOKUYAMA CORPORATION (JP) | 1998-07-21 | — | — | US | disclosed |
| US-5750218-A | USING 2-OXETANONE | TOKUYAMA CORPORATION (JP) | 1998-05-12 | — | — | US | disclosed |
| US-5731402-A | Biodegradable aliphatic polyester, melt-extrusion film thereof, and process for the production thereof | TOKUYAMA CORPORATION (JP) | 1998-03-24 | — | — | US | disclosed |
| EP-0688806-A2 | Biodegradable aliphatic polyester, melt-extrusion film thereof, and process for the production thereof | TOKUYAMA CORPORATION (JP) | 1995-12-27 | — | — | EP | disclosed |
| JP-H07196781-A | PRODUCTION OF POLY(2-OXETHANONE) | TOKUYAMA CORP | 1995-08-01 | — | — | JP | disclosed |
| US-4255553-A | COMPRISING A COMPOUND HAVING AT LEAST TWO EPOXY GROUPS, A POLYESTER OR ACRYLIC RESIN, AND A QUARTERNARY AMMONIUM CARBOXYLATE AS CATALYST | TOYO BOSEKI KABUSHIKI KAISHA (JP) | 1981-03-10 | — | — | US | disclosed |