SCHEMBL1096817

SCHEMBL1096817

c1ccc(COc2ccc(-c3ccccc3)cc2)cc1

nearest known ligand 0.69

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
LMNA P02545 1/20 0.69
CYP1A2 P05177 1/20 0.69
PTGS1 P23219 1/20 0.69
SLC6A2 P23975 1/20 0.69
CYP2C19 P33261 1/20 0.69
PTGS2 P35354 1/20 0.69
SLC6A3 Q01959 1/20 0.69
HIF1A Q16665 1/20 0.69
HDAC6 Q9UBN7 1/20 0.69
GSTP1 P09211 2/20 0.68
MAOB P27338 4/20 0.67
GAA P10253 2/20 0.67
RAB9A P51151 2/20 0.67
SMN1; SMN2 Q16637 2/20 0.67
MAPT P10636 1/20 0.67
MAOA P21397 1/20 0.67
L3MBTL1 Q9Y468 1/20 0.67
FFAR1 O14842 1/20 0.64
BCHE P06276 1/20 0.62
NR4A1 P22736 1/20 0.60

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL23483029 1.00 LMNA (0.69) LMNACYP1A2PTGS1SLC6A2CYP2C19
SCHEMBL197017 0.98 LMNA (0.72) LMNACYP1A2PTGS1SLC6A2CYP2C19
Bicarbonate SCHEMBL9638235 0.92 FFAR1 (0.71) LMNACYP1A2PTGS1SLC6A2CYP2C19
SCHEMBL6059308 0.91 LMNA (0.64) LMNACYP1A2PTGS1SLC6A2CYP2C19
SCHEMBL12285274 0.91 GSTP1 (0.68) LMNACYP1A2PTGS1SLC6A2CYP2C19
SCHEMBL23665904 0.91 GSTP1 (0.68) LMNACYP1A2PTGS1SLC6A2CYP2C19
SCHEMBL27367676 0.91 LMNA (0.82) LMNACYP1A2PTGS1SLC6A2CYP2C19
SCHEMBL339813 0.91 LMNA (0.82) LMNACYP1A2PTGS1SLC6A2CYP2C19
SCHEMBL29978578 0.90 GSTP1 (0.71) LMNACYP1A2PTGS1SLC6A2CYP2C19
SCHEMBL254671 0.90 LMNA (0.88) LMNACYP1A2PTGS1SLC6A2CYP2C19

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 61 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-12091595-B2 Curable organopolysiloxane release agent composition for thermal paper, thermal paper, and thermal recording label sheet DOW TORAY CO., LTD. (JP) 2024-09-17 US disclosed
CN-115784847-B New application of triphenylphosphine diiodide as reaction promoter 南昌大学 2024-02-09 CN disclosed
CN-115125553-B Electrochemical synthesis method of alcohol 绍兴久孚新材料科技有限公司 2023-12-22 CN disclosed
US-20230332046-A1 LOW DIALECTRIC, HIGH HEAT-DISSIPATION LIQUID CRYSTAL POLYMER COMPOSITION FOR MILLIMETER WAVE BAND, AND METHOD FOR PRODUCING SAME INDUSTRIAL COOPERATION FOUNDATION JEONBUK NATIONAL UNIVERSITY (KR) 2023-10-19 US disclosed
US-20230332046-A1 LOW DIALECTRIC, HIGH HEAT-DISSIPATION LIQUID CRYSTAL POLYMER COMPOSITION FOR MILLIMETER WAVE BAND, AND METHOD FOR PRODUCING SAME INDUSTRIAL COOPERATION FOUNDATION JEONBUK NATIONAL UNIVERSITY (KR) 2023-10-19 US disclosed
CN-115784847-A New use of triphenylphosphine diiodide as reaction promoter 南昌大学 2023-03-14 CN disclosed
CN-111315841-B Curable organopolysiloxane release agent composition for thermal paper, and thermal recording label sheet 陶氏东丽株式会社 2023-02-21 CN disclosed
CN-113402350-B Biaryl compound and preparation method and application thereof 南京工业大学 2022-11-11 CN disclosed
CN-115125553-A Electrochemical synthesis method of alcohol 绍兴久孚新材料科技有限公司 2022-09-30 CN disclosed
US-20220128867-A1 SUBSTRATE AND LIQUID CRYSTAL DISPLAY DEVICE DIC CORPORATION (JP) 2022-04-28 US disclosed
US-5561016-A HAVING PHOTOCONDUCTIVE LAYER CONTAINING CHARGE GENERATING MATERIAL, POLYVINYL BUTYRAL BINDER, CHARGE TRANSPORTING MATERIAL AND BIPHENYL(OR DERIVATIVE) ON ELECTROCONDUCTIVE SUPPORT RICOH COMPANY, LTD. (JP) 1996-10-01 US disclosed
EP-0687571-A2 Heat-sensitive recording material ASAHI DENKA KOGYO KABUSHIKI KAISHA (JP) 1995-12-20 EP disclosed
US-4918046-A DISULFONATES AND COLORLESS OR LIGHT-COLORED COLORING MATERIAL; DISCOLORATION INHIBITION ADEKA ARGUS CHEMICAL CO., LTD. (JP) 1990-04-17 US disclosed
EP-0256303-A2 Liquid crystal compounds having fluorine-containing core POLAROID CORPORATION (US) 1988-02-24 EP disclosed
US-4644377-A Fluoran derivatives and recording material using the same FUJI PHOTO FILM CO., LTD. (JP) 1987-02-17 US disclosed
EP-0051235-B1 PROCESS FOR THE PRODUCTION OF DIPHENYL ETHERS HOECHST AKTIENGESELLSCHAFT (DE) 1985-01-09 EP disclosed
EP-0051235-A1 Process for the production of diphenyl ethers HOECHST AKTIENGESELLSCHAFT (DE) 1982-05-12 EP disclosed
US-4229564-A SUITABLE FOR MELT PROCESSING AND EXTRUSION COATINGS RAYCHEM CORPORATION (US) 1980-10-21 US disclosed
US-4111908-A POLYKETONES AND METHODS THEREFOR RAYCHEM CORPORATION (US) 1978-09-05 US disclosed
US-3965146-A POLYMER INTERMEDIATE RAYCHEM CORPORATION (US) 1976-06-22 US disclosed