SCHEMBL10977916

SCHEMBL10977916

CCCN(CCC)c1ccc(C=C2CC(C)CC(=Cc3ccc(N(CCC)CCC)cc3)C2=O)cc1

nearest known ligand 0.54

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MAPT P10636 9/20 0.54
RAB9A P51151 6/20 0.54
NPC1 O15118 5/20 0.54
MAPK1 P28482 4/20 0.54
HTT P42858 4/20 0.54
HSP90AA1 P07900 2/20 0.54
LMNA P02545 7/20 0.46
NSD2 O96028 2/20 0.46
MITF O75030 1/20 0.46
ATM Q13315 1/20 0.46
CYP1A2 P05177 1/20 0.43
MEN1 O00255 7/20 0.43
KMT2A Q03164 7/20 0.43
ACHE P22303 1/20 0.42
ALDH1A1 P00352 6/20 0.41
PKM P14618 2/20 0.41
L3MBTL1 Q9Y468 2/20 0.41
POLB P06746 1/20 0.41
KDM4E B2RXH2 3/20 0.40
SMN1; SMN2 Q16637 3/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10977914 1.00 MAPT (0.54) MAPTRAB9ANPC1MAPK1HTT
SCHEMBL355427 0.88 MAPT (0.56) MAPTRAB9ANPC1MAPK1HTT
SCHEMBL2775363 0.88 MAPT (0.56) MAPTRAB9ANPC1MAPK1HTT
SCHEMBL10977686 0.87 MAPT (0.51) MAPTRAB9ANPC1MAPK1HTT
SCHEMBL10979490 0.87 MAPT (0.51) MAPTRAB9ANPC1MAPK1HTT
SCHEMBL10976305 0.86 CYP1A2 (0.41) MAPTRAB9ANPC1MAPK1HTT
SCHEMBL10976308 0.86 CYP1A2 (0.41) MAPTRAB9ANPC1MAPK1HTT
SCHEMBL10980443 0.82 CYP1A2 (0.65) MAPTRAB9ANPC1MAPK1HTT
SCHEMBL10980442 0.82 CYP1A2 (0.65) MAPTRAB9ANPC1MAPK1HTT
SCHEMBL24105852 0.80 CYP1A2 (0.66) MAPTRAB9ANPC1MAPK1HTT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0068808-B1 PHOTORESIST COMPOSITION JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1985-06-05 EP claimed
US-4407927-A ANTIHALATION AGENT JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1983-10-04 US claimed
EP-0068808-A2 Photoresist composition JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1983-01-05 EP claimed
EP-0068808-B1 PHOTORESIST COMPOSITION JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1985-06-05 EP disclosed
US-4407927-A ANTIHALATION AGENT JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1983-10-04 US disclosed
EP-0068808-A2 Photoresist composition JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1983-01-05 EP disclosed