Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MAPT | P10636 | 9/20 | 0.56 |
| ▸ | MAPK1 | P28482 | 6/20 | 0.56 |
| ▸ | NPC1 | O15118 | 4/20 | 0.56 |
| ▸ | RAB9A | P51151 | 4/20 | 0.56 |
| ▸ | HTT | P42858 | 3/20 | 0.56 |
| ▸ | HSP90AA1 | P07900 | 1/20 | 0.56 |
| ▸ | ALDH1A1 | P00352 | 9/20 | 0.50 |
| ▸ | ALDH3A1 | P30838 | 1/20 | 0.50 |
| ▸ | ALDH1A3 | P47895 | 1/20 | 0.50 |
| ▸ | MEN1 | O00255 | 10/20 | 0.48 |
| ▸ | KMT2A | Q03164 | 10/20 | 0.48 |
| ▸ | LMNA | P02545 | 6/20 | 0.48 |
| ▸ | GSK3B | P49841 | 1/20 | 0.48 |
| ▸ | MITF | O75030 | 1/20 | 0.48 |
| ▸ | NSD2 | O96028 | 1/20 | 0.48 |
| ▸ | ATM | Q13315 | 1/20 | 0.48 |
| ▸ | HPGD | P15428 | 3/20 | 0.47 |
| ▸ | NPSR1 | Q6W5P4 | 2/20 | 0.47 |
| ▸ | CRHBP | P24387 | 1/20 | 0.47 |
| ▸ | CRHR2 | Q13324 | 1/20 | 0.47 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2775363 | 1.00 | MAPT (0.56) | MAPTMAPK1NPC1RAB9AHTT | |
| SCHEMBL27854449 | 0.90 | ALDH1A1 (0.49) | MAPTMAPK1NPC1RAB9AHTT | |
| SCHEMBL10977914 | 0.88 | MAPT (0.54) | MAPTMAPK1NPC1RAB9AHTT | |
| SCHEMBL10977916 | 0.88 | MAPT (0.54) | MAPTMAPK1NPC1RAB9AHTT | |
| SCHEMBL1347925 | 0.87 | USP18 (0.54) | MAPTMAPK1NPC1RAB9AALDH1A1 | |
| SCHEMBL1347928 | 0.87 | USP18 (0.54) | MAPTMAPK1NPC1RAB9AALDH1A1 | |
| SCHEMBL10979150 | 0.87 | ALDH1A1 (0.53) | MAPTMAPK1NPC1RAB9AHTT | |
| SCHEMBL10979146 | 0.87 | ALDH1A1 (0.53) | MAPTMAPK1NPC1RAB9AHTT | |
| SCHEMBL9661326 | 0.84 | ALDH1A1 (0.46) | MAPTMAPK1NPC1RAB9AHTT | |
| SCHEMBL10985151 | 0.84 | ALDH1A1 (0.46) | MAPTMAPK1NPC1RAB9AHTT |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 412 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-117384378-A | Photosensitive polyamic acid ester resin, resin composition, preparation method and application thereof | 明士(北京)新材料开发有限公司 | 2024-01-12 | — | — | CN | claimed |
| CN-115160569-B | Photosensitive polyamic acid ester resin, resin composition and electronic component | 明士(北京)新材料开发有限公司 | 2022-12-27 | — | — | CN | claimed |
| CN-115160569-A | Photosensitive polyamic acid ester resin, resin composition and electronic component | 明士(北京)新材料开发有限公司 | 2022-10-11 | — | — | CN | claimed |
| US-8399176-B2 | Photosensitive resin composition | LG CHEM, LTD. (KR) | 2013-03-19 | — | — | US | claimed |
| US-20100216073-A1 | PHOTOSENSITIVE RESIN COMPOSITION | LG CHEM, LTD. (KR) | 2010-08-26 | — | — | US | claimed |
| EP-0068808-B1 | PHOTORESIST COMPOSITION | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1985-06-05 | — | — | EP | claimed |
| US-4407927-A | ANTIHALATION AGENT | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1983-10-04 | — | — | US | claimed |
| EP-0068808-A2 | Photoresist composition | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1983-01-05 | — | — | EP | claimed |
| WO-2026100508-A1 | RESIN COMPOSITION, CURED PRODUCT, LAMINATE, METHOD FOR PRODUCING CURED PRODUCT, METHOD FOR PRODUCING LAMINATE, METHOD FOR PRODUCING SEMICONDUCTOR DEVICE, SEMICONDUCTOR DEVICE, AND RESIN | 富士フイルム株式会社 | 2026-05-15 | — | — | WO | disclosed |
| WO-2026100338-A1 | PHOTOSENSITIVE RESIN COMPOSITION AND METHOD FOR PRODUCING CURED RELIEF PATTERN | 旭化成株式会社 | 2026-05-15 | — | — | WO | disclosed |
| US-12613465-B2 | Photosensitive resin composition and method for producing cured relief pattern | ASAHI KASEI KABUSHIKI KAISHA (JP) | 2026-04-28 | — | — | US | disclosed |
| US-20260104641-A1 | NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, PATTERNING PROCESS METHOD FOR FORMING CURED FILM, INTERLAYER INSULATING FILM, SURFACE PROTECTIVE FILM, AND ELECTRONIC COMPONENT | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2026-04-16 | — | — | US | disclosed |
| US-20260099093-A1 | PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR PRODUCING CURED RELIEF PATTERN USING SAME, AND METHOD FOR PRODUCING POLYIMIDE FILM USING SAME | ASAHI KASEI KABUSHIKI KAISHA (JP) | 2026-04-09 | — | — | US | disclosed |
| US-20260063999-A1 | NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, PRODUCTION METHOD FOR POLYIMIDE CURED FILM USING SAME, AND POLYIMIDE CURED FILM | ASAHI KASEI KABUSHIKI KAISHA (JP) | 2026-03-05 | — | — | US | disclosed |
| US-4778859-A | Tetramine derived polyimide with pendant unsaturation, and various photosensitive compositions therefrom | ASAHI KASEI KOGYO KABUSHIKI KAISHA (JP) | 1988-10-18 | — | — | US | disclosed |
| EP-0254230-A2 | Heat-resistant photoresist film | Asahi Kasei Kogyo Kabushiki Kaisha (JP) | 1988-01-27 | — | — | EP | disclosed |
| EP-0203393-A1 | Curable composition | Asahi Kasei Kogyo Kabushiki Kaisha (JP) | 1986-12-03 | — | — | EP | disclosed |
| EP-0068808-B1 | PHOTORESIST COMPOSITION | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1985-06-05 | — | — | EP | disclosed |
| US-4407927-A | ANTIHALATION AGENT | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1983-10-04 | — | — | US | disclosed |
| EP-0068808-A2 | Photoresist composition | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1983-01-05 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (4 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-12613465-B2 | Photosensitive resin composition and method for producing cured relief pattern | ARCN1, GLRA1, PSMA1 | MAPT 2839/4885MAPK1 2987/4885NPC1 3970/4885 |
| US-20260104641-A1 | NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, PATTERNING PROCESS METHOD FOR FORMING CURED FILM, INTERLAYER INSULATING FILM, SURFACE PROTECTIVE FILM, AND ELECTRONIC COMPONENT | ARCN1, PRDM9, LBR | MAPT 1027/4885MAPK1 3534/4885NPC1 3608/4885 |
| US-20260099093-A1 | PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR PRODUCING CURED RELIEF PATTERN USING SAME, AND METHOD FOR PRODUCING POLYIMIDE FILM USING SAME | CD79B, ITGA1, PTK2 | MAPT 1037/4885MAPK1 1924/4885NPC1 3340/4885 |
| US-20260063999-A1 | NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, PRODUCTION METHOD FOR POLYIMIDE CURED FILM USING SAME, AND POLYIMIDE CURED FILM | ARCN1, PBRM1, LCP1 | MAPT 950/4885MAPK1 3470/4885NPC1 4173/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.