SCHEMBL1105075

SCHEMBL1105075

Cc1cccc(C)c1[SiH3]

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8995946 0.80
SCHEMBL11684311 0.76 MAPT (0.44)
SCHEMBL274676 0.71
SCHEMBL40704 0.69
SCHEMBL5494561 0.69 TRPA1 (0.61)
O-Xylene SCHEMBL29287109 0.69 TSHR (0.83)
SCHEMBL4021982 0.69 ACHE (0.57)
Hydrochloric Acid SCHEMBL11803918 0.69 TRPA1 (0.46)
SCHEMBL67969 0.69
O-Xylene SCHEMBL170581 0.68 TSHR (1.00)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-114920768-A Preparation method and application of tert-butyl substituted dihydrosilane and chiral silane 深圳湾实验室 2022-08-19 CN claimed
CN-114920768-A Preparation method and application of tert-butyl substituted dihydrosilane and chiral silane 深圳湾实验室 2022-08-19 CN disclosed
US-8153836-B2 Silsesquioxane compound mixture, hydrolyzable silane compound, making methods, resist composition, patterning process, and substrate processing SHIN-ETSU CHEMICAL CO., LTD. (JP) 2012-04-10 US disclosed
US-20080311514-A1 SILSESQUIOXANE COMPOUND MIXTURE, HYDROLYZABLE SILANE COMPOUND, MAKING METHODS, RESIST COMPOSITION, PATTERNING PROCESS, AND SUBSTRATE PROCESSING SHIN-ETSU CHEMICAL CO., LTD. (JP) 2008-12-18 US disclosed