⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL788769 | 0.89 | KMT2A (0.53) | — | |
| SCHEMBL11938132 | 0.86 | KMT2A (0.50) | — | |
| SCHEMBL4858666 | 0.85 | TDP1 (0.40) | — | |
| SCHEMBL1106829 | 0.79 | LMNA (0.74) | — | |
| SCHEMBL10024581 | 0.79 | — | — | |
| SCHEMBL14235175 | 0.79 | TSHR (0.46) | — | |
| SCHEMBL15147841 | 0.78 | KMT2A (0.41) | — | |
| SCHEMBL4727074 | 0.78 | — | — | |
| SCHEMBL24169230 | 0.77 | — | — | |
| SCHEMBL9162190 | 0.77 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 15 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| JP-7252209-A | — | — | None | — | — | JP | disclosed |
| EP-2030968-B1 | Sulfur-containing compound, method of preparation and pharmaceutical uses thereof | NAT SUN YAT-SEN UNIV (TW) | 2017-02-22 | — | — | EP | disclosed |
| US-9238620-B1 | Pharmaceutical uses of sulfur-containing compound | NATIONAL SUN YAT-SEN UNIVERSITY (TW) | 2016-01-19 | — | — | US | disclosed |
| US-20160009642-A1 | PHARMACEUTICAL USES OF SULFUR-CONTAINING COMPOUND | NATIONAL SUN YAT-SEN UNIVERSITY (TW) | 2016-01-14 | — | — | US | disclosed |
| US-8722745-B2 | Sulfur-containing compound, method of preparation and pharmaceutical uses thereof | NATIONAL SUN YAT-SEN UNIVERSITY (TW) | 2014-05-13 | — | — | US | disclosed |
| US-20130172355-A1 | SULFUR-CONTAINING COMPOUND, METHOD OF PREPARATION AND PHARMACEUTICAL USES THEREOF | NATIONAL SUN YAT-SEN UNIVERSITY (TW) | 2013-07-04 | — | — | US | disclosed |
| US-8153716-B2 | Dispersant for an aqueous dispersion of positively charged or chargeable solid particulates which comprises a compound having an anchoring moiety linked to a polymeric hydrophilic moiety; inkjet recording element | EASTMAN KODAK COMPANY (US) | 2012-04-10 | — | — | US | disclosed |
| US-8063132-B2 | Coating composition comprising boehmite particles and one or more dispersants and a method of coating a substrate using said coating composition | EASTMAN KODAK COMPANY (US) | 2011-11-22 | — | — | US | disclosed |
| EP-2030968-A2 | Sulfur-containing compound, method of preparation and pharmaceutical uses thereof | National Sun Yat-Sen University (TW) | 2009-03-04 | — | — | EP | disclosed |
| US-20080145546-A1 | Dispersant For Reducing Viscosity Of Particulate Solids | FPC INC. | 2008-06-19 | — | — | US | disclosed |
| US-20080090012-A1 | Aqueous boehmite particles of a hydrophilic polymer having a linked anchoring moiety which contains acid(s) and/or hydroxy(s); the polymeric moiety has a lower affinity for a boehmite surface than the anchoring moiety; mercaptosuccinic acid-modified polyacrylamide; ink jet; paper coating; gloss porousity | KODAK PHILIPPINES LTD. | 2008-04-17 | — | — | US | disclosed |
| CN-1354775-A | Method for adhesion of vinylidene fluoride resins to metal substrates, and electrode structure and its method of production | ATOFINA S A (FR) | 2002-06-19 | — | — | CN | disclosed |
| EP-1157074-A1 | A METHOD FOR THE ADHESION OF VINYLIDENE FLUORIDE RESINS TO METAL SUBSTRATES, AND AN ELECTRODE STRUCTURE AND ITS METHOD OF PRODUCTION | ELF ATOCHEM S.A. (FR) | 2001-11-28 | — | — | EP | disclosed |
| WO-2000049103-A1 | A METHOD FOR THE ADHESION OF VINYLIDENE FLUORIDE RESINS TO METAL SUBSTRATES, AND AN ELECTRODE STRUCTURE AND ITS METHOD OF PRODUCTION | ATOFINA (FR) | 2000-08-24 | — | — | WO | disclosed |
| JP-H07252209-A | PRODUCTION OF AMIDE COMPOUND | NIPPON SHOKUBAI CO LTD | 1995-10-03 | — | — | JP | disclosed |