SCHEMBL11070985

SCHEMBL11070985

O=C(Nc1cccc(O)c1)c1cc2ccccc2cc1O

nearest known ligand 0.83

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
SRC P12931 1/20 0.83
MEN1 O00255 7/20 0.67
KMT2A Q03164 7/20 0.67
RAB9A P51151 6/20 0.67
POLB P06746 3/20 0.67
MAPT P10636 3/20 0.67
LMNA P02545 2/20 0.67
TNF P01375 1/20 0.67
POLA1 P09884 1/20 0.67
THRB P10828 1/20 0.67
HTT P42858 1/20 0.67
NOD1 Q9Y239 1/20 0.67
L3MBTL1 Q9Y468 1/20 0.67
NPC1 O15118 5/20 0.64
PLG P00747 3/20 0.63
KLK1 P06870 2/20 0.63
KLK6 Q92876 2/20 0.63
AKR1C3 P42330 1/20 0.61
CASP3 P42574 1/20 0.61
SENP7 Q9BQF6 1/20 0.61

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2735971 0.91 SRC (1.00) SRCMEN1KMT2ARAB9APOLB
SCHEMBL29890853 0.87 MEN1 (0.77) SRCMEN1KMT2ARAB9APOLB
SCHEMBL57970 0.87 MEN1 (0.77) SRCMEN1KMT2ARAB9APOLB
SCHEMBL30084384 0.87 MEN1 (0.77) SRCMEN1KMT2ARAB9APOLB
SCHEMBL2760104 0.87 SRC (0.68) SRCMEN1KMT2ARAB9APOLB
SCHEMBL5426499 0.85 KMT2A (0.84) MEN1KMT2ARAB9APOLBMAPT
SCHEMBL2743105 0.85 KMT2A (0.74) SRCMEN1KMT2ARAB9APOLB
SCHEMBL2129288 0.85 P2RX1 (0.71) SRCMEN1KMT2ARAB9APOLB
SCHEMBL2129113 0.85 FADS1 (0.71) SRCMEN1KMT2ARAB9APOLB
SCHEMBL10863807 0.85 RAB9A (0.64) SRCMEN1KMT2ARAB9APOLB

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-4446218-A Sulfur and/or amide-containing exposure accelerators for light-sensitive coatings with diazonium compounds AMERICAN HOECHST CORPORATION (US) 1984-05-01 US claimed
US-4446218-A Sulfur and/or amide-containing exposure accelerators for light-sensitive coatings with diazonium compounds AMERICAN HOECHST CORPORATION (US) 1984-05-01 US disclosed
US-4256825-A Photographic element and photographic record prepared therefrom GAF CORPORATION (US) 1981-03-17 US disclosed