SCHEMBL11196196

SCHEMBL11196196

COc1ccc(C=Cc2ccc(C(=O)C#N)cc2)cc1

nearest known ligand 0.60

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
F3 P13726 3/20 0.60
MAPT P10636 5/20 0.55
ALDH1A1 P00352 3/20 0.55
CYP3A4 P08684 2/20 0.55
KDM4E B2RXH2 2/20 0.54
CYP1A2 P05177 1/20 0.54
HPGD P15428 1/20 0.54
TSHR P16473 1/20 0.54
NFKB1 P19838 1/20 0.54
APEX1 P27695 1/20 0.54
BLM P54132 1/20 0.54
PMP22 Q01453 1/20 0.54
NPSR1 Q6W5P4 1/20 0.54
THRB P10828 1/20 0.54
ATM Q13315 1/20 0.54
MAOB P27338 4/20 0.54
MAOA P21397 3/20 0.54
XDH P47989 2/20 0.54
P4HB P07237 1/20 0.54
CALM1 P0DP23 1/20 0.54

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL11196194 1.00 F3 (0.60) F3MAPTALDH1A1CYP3A4KDM4E
SCHEMBL7896809 0.91 CES2 (0.59) MAPTALDH1A1CYP3A4KDM4ECYP1A2
SCHEMBL25954596 0.82 F3 (0.68) F3MAPTALDH1A1CYP3A4HPGD
SCHEMBL10926361 0.81 F3 (0.54) F3MAPTALDH1A1CYP3A4KDM4E
SCHEMBL5692873 0.80 XDH (0.78) F3MAPTALDH1A1CYP3A4KDM4E
SCHEMBL12243319 0.80 F3 (0.66) F3MAPTALDH1A1CYP3A4KDM4E
SCHEMBL5692868 0.80 XDH (0.78) F3MAPTALDH1A1CYP3A4KDM4E
SCHEMBL14336693 0.80 F3 (0.66) F3MAPTALDH1A1CYP3A4KDM4E
SCHEMBL10921923 0.79 F3 (0.66) F3MAPTALDH1A1CYP3A4KDM4E
Cyanide SCHEMBL11196198 0.79 XDH (0.71) F3MAPTALDH1A1CYP3A4KDM4E

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-4371606-A 2-(Halogenomethyl-phenyl)-4-halogeno-oxaxole derivatives, a process for the preparation thereof, and radiation-sensitive compositions containing these derivatives HOECHST AKTIENGESELLSCHAFT (DE) 1983-02-01 US disclosed