SCHEMBL111996

SCHEMBL111996

O=S(=O)(NS(=O)(=O)C(F)(F)F)c1cc(C(F)(F)F)cc(C(F)(F)F)c1

nearest known ligand 0.42

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CA1 P00915 2/20 0.42
CA2 P00918 2/20 0.42
MMP1 P03956 1/20 0.42
MMP2 P08253 1/20 0.42
MMP9 P14780 1/20 0.42
MMP8 P22894 1/20 0.42
MMP13 P45452 1/20 0.42
CES2 O00748 1/20 0.41
PSEN1 P49768 6/20 0.40
PSEN2 P49810 6/20 0.40
APH1B Q8WW43 6/20 0.40
NCSTN Q92542 6/20 0.40
APH1A Q96BI3 6/20 0.40
PSENEN Q9NZ42 6/20 0.40
CYP2D6 P10635 5/20 0.40
TDP1 Q9NUW8 1/20 0.40
GAA P10253 2/20 0.39
CYP3A4 P08684 3/20 0.38
ACP1 P24666 1/20 0.37
GPBAR1 Q8TDU6 2/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL23543589 0.89 CA1 (0.40) CA1CA2MMP1MMP2MMP9
SCHEMBL26430459 0.88 PSEN1 (0.39) CA1CA2MMP1MMP2MMP9
SCHEMBL13623382 0.88 CA1 (0.47) CA1CA2MMP1MMP2MMP9
SCHEMBL23709075 0.85 PSEN1 (0.41) CA1CA2MMP1MMP2MMP9
SCHEMBL23706953 0.85 CA1 (0.40) CA1CA2MMP1MMP2MMP9
SCHEMBL26432677 0.85 PSEN1 (0.41) CA1CA2MMP1MMP2MMP9
SCHEMBL25117905 0.81 CA1 (0.42) CA1CA2MMP1MMP2MMP9
SCHEMBL25782130 0.81 PSEN1 (0.39) CA1CA2MMP1MMP2MMP9
SCHEMBL12386319 0.81 PSEN1 (0.43) CA1CA2MMP1MMP2MMP9
SCHEMBL13588301 0.81 CA1 (0.50) CA1CA2MMP1MMP2MMP9

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 69 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11796912-B2 Radiation-sensitive composition and pattern-forming method JSR CORPORATION (JP) 2023-10-24 US disclosed
US-11703758-B2 Photosensitive composition for EUV light, pattern forming method, and method for manufacturing electronic device FUJIFILM CORPORATION (JP) 2023-07-18 US disclosed
US-20230217677-A1 Organic Electronic Device Comprising a Substrate, an Anode Layer, a Cathode Layer, at Least One First Emission Layer, and a Hole Injection Layer That Comprises a Metal Complex NOVALED GMBH (DE) 2023-07-06 US disclosed
US-20230217677-A1 Organic Electronic Device Comprising a Substrate, an Anode Layer, a Cathode Layer, at Least One First Emission Layer, and a Hole Injection Layer That Comprises a Metal Complex NOVALED GMBH (DE) 2023-07-06 US disclosed
US-20230126203-A1 An Organic Electronic Device Comprising an Anode Layer, a Cathode Layer, at Least One Emission Layer (EML) and at Least One Hole Injection Layer (HIL) NOVALED GMBH (DE) 2023-04-27 US disclosed
US-20230097962-A1 Organic Electronic Device Comprising a Compound of Formula (I), Display Device Comprising the Organic Electronic Device as Well as Compounds of Formula (I) for Use in Organic Electronic Devices NOVALED GMBH (DE) 2023-03-30 US disclosed
US-20230056322-A1 Organic Electronic Device Comprising a Compound of Formula (I), Display Device Comprising the Organic Electronic Device as Well as Compounds of Formula (I) for Use in Organic Electronic Devices NOVALED GMBH (DE) 2023-02-23 US disclosed
US-11204552-B2 Radiation-sensitive composition, pattern-forming method and radiation-sensitive acid generating agent JSR CORPORATION (JP) 2021-12-21 US disclosed
EP-3840076-A1 ORGANIC ELECTRONIC DEVICE COMPRISING A COMPOUND OF FORMULA (1), DISPLAY DEVICE COMPRISING THE ORGANIC ELECTRONIC DEVICE AS WELL AS COMPOUNDS OF FORMULA (1) FOR USE IN ORGANIC ELECTRONIC DEVICES Novaled GmbH (DE) 2021-06-23 EP disclosed
US-11009791-B2 Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, pattern forming method, and method for manufacturing electronic device FUJIFILM CORPORATION (JP) 2021-05-18 US disclosed
US-20080261150-A1 PATTERN FORMING METHOD, RESIST COMPOSITION FOR MULTIPLE DEVELOPMENT USED IN THE PATTERN FORMING METHOD, DEVELOPER FOR NEGATIVE DEVELOPMENT USED IN THE PATTERN FORMING METHOD, AND RINSING SOLUTION FOR NEGATIVE DEVELOPMENT USED IN THE PATTERN FORMING METHOD FUJIFILM CORPORATION (JP) 2008-10-23 US disclosed
US-20080248420-A1 POSITIVE RESIST COMPOSITION AND PATTERN-FORMING METHOD FUJIFILM CORPORATION (JP) 2008-10-09 US disclosed
US-20080248420-A1 POSITIVE RESIST COMPOSITION AND PATTERN-FORMING METHOD FUJIFILM CORPORATION (JP) 2008-10-09 US disclosed
US-20080187860-A1 PATTERN FORMING METHOD, RESIST COMPOSITION FOR MULTIPLE DEVELOPMENT USED IN THE PATTERN FORMING METHOD, DEVELOPER FOR NEGATIVE DEVELOPMENT USED IN THE PATTERN FORMING METHOD, AND RINSING SOLUTION FOR NEGATIVE DEVELOPMENT USED IN THE PATTERN FORMING METHOD FUJIFILM CORPORATION (JP) 2008-08-07 US disclosed
US-20080187860-A1 PATTERN FORMING METHOD, RESIST COMPOSITION FOR MULTIPLE DEVELOPMENT USED IN THE PATTERN FORMING METHOD, DEVELOPER FOR NEGATIVE DEVELOPMENT USED IN THE PATTERN FORMING METHOD, AND RINSING SOLUTION FOR NEGATIVE DEVELOPMENT USED IN THE PATTERN FORMING METHOD FUJIFILM CORPORATION (JP) 2008-08-07 US disclosed
EP-1701214-B1 Positive photosensitive composition and pattern-forming method using the same FUJIFILM CORP (JP) 2008-04-23 EP disclosed
US-20070160815-A1 Ink composition, inkjet recording method, printed material, process for producing lithographic printing plate, and lithographic printing plate FUJIFILM CORPORATION (JP) 2007-07-12 US disclosed
US-20070160815-A1 Ink composition, inkjet recording method, printed material, process for producing lithographic printing plate, and lithographic printing plate FUJIFILM CORPORATION (JP) 2007-07-12 US disclosed
US-20070065752-A1 Positive resist composition and pattern forming method using the same FUJI PHOTO FILM CO., LTD. 2007-03-22 US disclosed
US-20070065752-A1 Positive resist composition and pattern forming method using the same FUJI PHOTO FILM CO., LTD. 2007-03-22 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20230097962-A1 Organic Electronic Device Comprising a Compound of Formula (I), Display Device Comprising the Organic Electronic Device as Well as Compounds of Formula (I) for Use in Organic Electronic Devices AOX1, CYP1B1, CYP1A1 CA1 1881/4885CA2 3827/4885MMP1 3607/4885
US-11204552-B2 Radiation-sensitive composition, pattern-forming method and radiation-sensitive acid generating agent NOS1, ADCY1, IFNAR1 CA1 54/4885CA2 141/4885MMP1 3875/4885
US-20230056322-A1 Organic Electronic Device Comprising a Compound of Formula (I), Display Device Comprising the Organic Electronic Device as Well as Compounds of Formula (I) for Use in Organic Electronic Devices AOX1, CYP1B1, CYP1A1 CA1 1881/4885CA2 3827/4885MMP1 3607/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.