SCHEMBL11211587

SCHEMBL11211587

O=S(=O)(CNS(=O)(=O)c1ccccc1)c1ccccc1

nearest known ligand 0.60

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 5/20 0.60
LMNA P02545 2/20 0.59
SMN1; SMN2 Q16637 2/20 0.59
KEAP1 Q14145 2/20 0.59
KDM4E B2RXH2 1/20 0.59
PKM P14618 1/20 0.59
GBA1 P04062 2/20 0.53
PSIP1 O75475 1/20 0.52
MAPT P10636 1/20 0.52
CA1 P00915 2/20 0.50
CA2 P00918 2/20 0.50
MMP1 P03956 1/20 0.50
MMP2 P08253 1/20 0.50
MMP9 P14780 1/20 0.50
MMP8 P22894 1/20 0.50
MMP13 P45452 1/20 0.50
CA12 O43570 1/20 0.49
CA9 Q16790 1/20 0.49
MAPK1 P28482 1/20 0.49
IL1RN P18510 1/20 0.48

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL11304422 0.90 ALDH1A1 (0.50) ALDH1A1LMNASMN1; SMN2KEAP1KDM4E
SCHEMBL28901448 0.89 CA12 (0.63) ALDH1A1KDM4EGBA1MAPTCA1
SCHEMBL11207554 0.89 CA12 (0.63) ALDH1A1KDM4EGBA1MAPTCA1
SCHEMBL5450999 0.82 ALDH1A1 (0.63) ALDH1A1LMNASMN1; SMN2KEAP1KDM4E
SCHEMBL2573481 0.81 ALDH1A1 (0.57) ALDH1A1LMNASMN1; SMN2KEAP1KDM4E
SCHEMBL10790350 0.81 ALDH1A1 (0.62) ALDH1A1LMNASMN1; SMN2KEAP1KDM4E
SCHEMBL9703022 0.79 PSIP1 (0.58) ALDH1A1LMNASMN1; SMN2KEAP1KDM4E
SCHEMBL8349568 0.79 ALDH1A1 (0.79) ALDH1A1LMNASMN1; SMN2KEAP1KDM4E
SCHEMBL13922066 0.79 ALDH1A1 (0.66) ALDH1A1LMNASMN1; SMN2GBA1MAPT
SCHEMBL606282 0.78 ALDH1A1 (0.70) ALDH1A1LMNASMN1; SMN2KEAP1KDM4E

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-3644122-A1 ONIUM SALT, NEGATIVE RESIST COMPOSITION, AND RESIST PATTERN FORMING PROCESS Shin-Etsu Chemical Co., Ltd. (JP) 2020-04-29 EP disclosed
EP-0017068-B1 MIXTURES CONTAINING AZODICARBON AMIDE AND ALPHA-AMIDO SULFONES, THEIR PREPARATION AND USE AS A BLOWING AGENTS BAYER AG (DE) 1983-01-12 EP disclosed
US-4280004-A ACTIVATORS BAYER AKTIENGESELLSCHAFT (DE) 1981-07-21 US disclosed
EP-0017068-A1 Mixtures containing azodicarbon amide and alpha-amido sulfones, their preparation and use as a blowing agents BAYER AG (DE) 1980-10-15 EP disclosed