SCHEMBL9703022

SCHEMBL9703022

O=S(=O)(CNCS(=O)(=O)c1ccccc1)c1ccccc1

nearest known ligand 0.58

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
PSIP1 O75475 1/20 0.58
MAPT P10636 1/20 0.57
HTR6 P50406 1/20 0.48
ALDH1A1 P00352 4/20 0.45
HSD11B1 P28845 3/20 0.45
TDP1 Q9NUW8 2/20 0.44
CA1 P00915 2/20 0.44
CA2 P00918 2/20 0.44
TP53 P04637 1/20 0.44
MMP1 P03956 1/20 0.44
MMP2 P08253 1/20 0.44
MMP9 P14780 1/20 0.44
MMP8 P22894 1/20 0.44
MMP13 P45452 1/20 0.44
KMT2A Q03164 1/20 0.44
L3MBTL1 Q9Y468 1/20 0.44
SMN1; SMN2 Q16637 2/20 0.44
HSD17B10 Q99714 1/20 0.44
CA12 O43570 1/20 0.44
CA3 P07451 1/20 0.44

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL492985 0.85 MAPT (0.49) PSIP1MAPTHTR6ALDH1A1HSD11B1
SCHEMBL2334382 0.83 MAPT (0.56) PSIP1MAPTALDH1A1HSD11B1TDP1
SCHEMBL8940894 0.82 MAPT (0.50) PSIP1MAPTHTR6ALDH1A1HSD11B1
SCHEMBL11211587 0.79 ALDH1A1 (0.60) PSIP1MAPTALDH1A1CA1CA2
SCHEMBL2616457 0.79 CA2 (0.59) PSIP1MAPTHTR6ALDH1A1HSD11B1
SCHEMBL11306682 0.78 MAPT (0.70) PSIP1MAPTALDH1A1HSD11B1TDP1
SCHEMBL11895163 0.78 MAPT (0.50) PSIP1MAPTHTR6ALDH1A1HSD11B1
SCHEMBL15791835 0.78 MAPT (0.70) PSIP1MAPTALDH1A1HSD11B1TDP1
SCHEMBL3975244 0.76 ALDH1A1 (0.59) MAPTALDH1A1TDP1CA1CA2
SCHEMBL7927400 0.76 MAPT (0.68) PSIP1MAPTALDH1A1HSD11B1TDP1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-5106718-A Heat resistant relief structures CIBA-GEIGY CORPORATION (US) 1992-04-21 US disclosed
EP-0364949-A2 Heat-stable positive photoresist CIBA-GEIGY AG (CH) 1990-04-25 EP disclosed