SCHEMBL11212282

SCHEMBL11212282

CCN(CC)c1ccc(/C=C/c2ccccc2N(CC)CC)cc1

nearest known ligand 0.53

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MAPT P10636 7/20 0.53
ALDH1A1 P00352 6/20 0.53
MEN1 O00255 5/20 0.53
KMT2A Q03164 5/20 0.53
LMNA P02545 1/20 0.53
ALDH3A1 P30838 1/20 0.52
ALDH1A3 P47895 1/20 0.52
MAPK1 P28482 3/20 0.50
TDP1 Q9NUW8 3/20 0.50
BCHE P06276 2/20 0.50
ACHE P22303 2/20 0.50
USP2 O75604 2/20 0.50
L3MBTL1 Q9Y468 2/20 0.50
SMN1; SMN2 Q16637 2/20 0.50
NPSR1 Q6W5P4 2/20 0.50
CTNNB1 P35222 1/20 0.50
ATM Q13315 1/20 0.50
RXFP1 Q9HBX9 1/20 0.50
NPC1 O15118 1/20 0.50
CYP1A2 P05177 1/20 0.50

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8529392 1.00 MAPT (0.53) MAPTALDH1A1MEN1KMT2ALMNA
SCHEMBL19583375 0.93 APP (0.43) MAPTALDH1A1MEN1KMT2ALMNA
SCHEMBL13778825 0.93 APP (0.43) MAPTALDH1A1MEN1KMT2ALMNA
SCHEMBL133494 0.91 ALDH1A1 (0.57) MAPTALDH1A1MEN1KMT2ALMNA
SCHEMBL133495 0.91 ALDH1A1 (0.57) MAPTALDH1A1MEN1KMT2ALMNA
SCHEMBL11206640 0.87 NFE2L2 (0.47) MAPTALDH1A1MEN1KMT2AMAPK1
SCHEMBL11206645 0.87 NFE2L2 (0.47) MAPTALDH1A1MEN1KMT2AMAPK1
SCHEMBL4403054 0.87 NFE2L2 (0.49) MAPTALDH1A1MEN1KMT2ALMNA
SCHEMBL12144190 0.85 RAB9A (0.50) MAPTALDH1A1MEN1KMT2ALMNA
SCHEMBL12144183 0.85 NFE2L2 (0.53) MAPTALDH1A1MEN1KMT2ALMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0026088-B1 PHOTORESIST COMPOSITIONS JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1983-11-23 EP claimed
US-4349619-A CONTAINING ANTIHALATION AGENTS JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1982-09-14 US claimed
EP-0026088-A2 Photoresist compositions JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1981-04-01 EP claimed