SCHEMBL1122765

SCHEMBL1122765

CCCCCc1cc(Cc2cc(CCCCC)c(O)c(O)c2O)c(O)c(O)c1O

nearest known ligand 0.53

Predicted protein targets (top 13)

geneUniProtsupporting neighboursconfidence
ALOX5 P09917 6/20 0.51
PTGS2 P35354 7/20 0.50
TYR P14679 3/20 0.47
CYP3A4 P08684 2/20 0.47
MEN1 O00255 1/20 0.47
TP53 P04637 1/20 0.47
MAPT P10636 1/20 0.47
ALOX15 P16050 1/20 0.47
TSHR P16473 1/20 0.47
HTT P42858 1/20 0.47
KMT2A Q03164 1/20 0.47
TDP1 Q9NUW8 1/20 0.47
LIPG Q9Y5X9 1/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL11795777 0.84 AMY1A (0.52) ALOX5PTGS2TYRCYP3A4MEN1
SCHEMBL11002265 0.84 PTGS2 (0.65) ALOX5PTGS2TYRCYP3A4MEN1
SCHEMBL15313677 0.83 CNR1 (0.48) ALOX5PTGS2TYRCYP3A4MEN1
SCHEMBL30462316 0.82 ALOX5 (0.50) ALOX5PTGS2TYRCYP3A4MEN1
SCHEMBL29357138 0.82 ALOX5 (0.50) ALOX5PTGS2TYRCYP3A4MEN1
SCHEMBL30462317 0.82 ALOX5 (0.50) ALOX5PTGS2TYRCYP3A4MEN1
SCHEMBL29701337 0.82 ALOX5 (0.50) ALOX5PTGS2TYRCYP3A4MEN1
SCHEMBL11472526 0.82 PTGS2 (0.58) ALOX5PTGS2TYRCYP3A4MEN1
SCHEMBL9652322 0.82 ALOX5 (0.50) ALOX5PTGS2TYRCYP3A4MEN1
SCHEMBL39347 0.82 ALOX5 (0.50) ALOX5PTGS2TYRCYP3A4MEN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 26 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0541905-B1 Light-sensitive mixture containing o-naphthoquinone diazide sulfonic acid esters and recording material prepared therefrom AGFA GEVAERT AG (DE) 1999-12-08 EP claimed
US-5413899-A Light-sensitive mixture containing an 0-naphthoquinonediazide-sulfonic acid ester and recording material produced therewith wherein the 0-naphthoquinone diazides are partial esters HOECHST AKTIENGESELLSCHAFT (DE) 1995-05-09 US claimed
EP-0541905-A1 Light-sensitive mixture containing o-naphthoquinone diazide sulfonic acid esters and recording material prepared therefrom HOECHST AKTIENGESELLSCHAFT (DE) 1993-05-19 EP claimed
EP-1217447-B1 Radiation-sensitive recording material having a structured back AGFA GRAPHICS NV (BE) 2011-02-09 EP disclosed
EP-1167063-B1 Presensitized printing plate with pigmented back coating AGFA GRAPHICS NV (BE) 2007-06-13 EP disclosed
EP-1239328-B1 Radiation-sensitive recording material having an electrically conductive back coating AGFA GEVAERT (BE) 2006-06-21 EP disclosed
US-6936404-B2 Radiation-sensitive recording material having a structured back AGFA-GEVAERT (BE) 2005-08-30 US disclosed
US-6670092-B2 For production of offset printing plates having a web- or plate-form support AGFA-GEVAERT (BE) 2003-12-30 US disclosed
US-6670097-B2 Offset printing; dimensional stable support AGFA-GEVAERT (BE) 2003-12-30 US disclosed
US-20020182533-A1 For production of offset printing plates having a web- or plate-form support AGFA NV (BE) 2002-12-05 US disclosed
US-20020127489-A1 Radiation-sensitive recording material having a structured back AGFA GRAPHICS NV (BE) 2002-09-12 US disclosed
US-6165685-A Thermally recordable material insensitive to white light AGFA-GEVAERT N.V. (BE) 2000-12-26 US disclosed
US-6100004-A RADIATION-SENSITIVE MIXTURE COMPRISING AS AN INFRARED RADIATION ABSORBING COMPONENT A CARBON BLACK PIGMENT HAVING A PRIMARY PARTICLE SIZE SMALLER THAN 80 NM, WHICH IS PREDISPERSED IN A POLYMER CONTAINING ACIDIC UNITS AGFA-GEVAERT N.V. (BE) 2000-08-08 US disclosed
EP-0541905-B1 Light-sensitive mixture containing o-naphthoquinone diazide sulfonic acid esters and recording material prepared therefrom AGFA GEVAERT AG (DE) 1999-12-08 EP disclosed
EP-0900652-A2 White-light insensitive material for thermal registration and process for the fabrication of lithographic printing plates Agfa-Gevaert AG (DE) 1999-03-10 EP disclosed
EP-0867278-A1 Radiation sensitive composition and registration materials for lithographic printing plates prepared therewith Agfa-Gevaert AG (DE) 1998-09-30 EP disclosed
US-5413899-A Light-sensitive mixture containing an 0-naphthoquinonediazide-sulfonic acid ester and recording material produced therewith wherein the 0-naphthoquinone diazides are partial esters HOECHST AKTIENGESELLSCHAFT (DE) 1995-05-09 US disclosed
EP-0541905-A1 Light-sensitive mixture containing o-naphthoquinone diazide sulfonic acid esters and recording material prepared therefrom HOECHST AKTIENGESELLSCHAFT (DE) 1993-05-19 EP disclosed
US-4407926-A PHOTORESISTS, PRINTING PLATES HOECHST AKTIENGESELLSCHAFT (DE) 1983-10-04 US disclosed
EP-0052788-A1 Photosensitive mixture based on o-naphthoquinone diazides, and photosensible copying material made therefrom HOECHST AKTIENGESELLSCHAFT (DE) 1982-06-02 EP disclosed