Known targets — ChEMBL curated mechanism
ACHEBDKRB2CHRM1CHRM2CHRM3CHRNA1CHRNB1CHRNDCHRNECHRNGGUCY1A1GUCY1A2GUCY1B1GUCY1B2NAMPTPTAFRSLC10A2SLC6A2SLC6A3TACR1dacAdacBdacCftsImrcAmrcBmrdA
The experimentally established mechanism targets of Hydrochloric Acid. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 9/20 | 0.54 |
| ▸ | L3MBTL1 | Q9Y468 | 3/20 | 0.54 |
| ▸ | TSHR | P16473 | 3/20 | 0.54 |
| ▸ | GFER | P55789 | 2/20 | 0.54 |
| ▸ | MAPK1 | P28482 | 2/20 | 0.54 |
| ▸ | PSMD14 | O00487 | 1/20 | 0.54 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.54 |
| ▸ | RECQL | P46063 | 1/20 | 0.54 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.54 |
| ▸ | ALDH3A1 | P30838 | 1/20 | 0.50 |
| ▸ | ALDH1A3 | P47895 | 1/20 | 0.50 |
| ▸ | MEN1 | O00255 | 6/20 | 0.44 |
| ▸ | KMT2A | Q03164 | 6/20 | 0.44 |
| ▸ | KDM4E | B2RXH2 | 3/20 | 0.44 |
| ▸ | GAA | P10253 | 3/20 | 0.44 |
| ▸ | CNR2 | P34972 | 1/20 | 0.44 |
| ▸ | TERT | O14746 | 1/20 | 0.42 |
| ▸ | MAPT | P10636 | 4/20 | 0.41 |
| ▸ | HPGD | P15428 | 2/20 | 0.41 |
| ▸ | HSP90AA1 | P07900 | 2/20 | 0.41 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1735497 | 0.82 | ALDH1A1 (0.74) | ALDH1A1L3MBTL1TSHRGFERMAPK1 | |
| Hydrochloric Acid SCHEMBL8046149 | 0.79 | ALDH1A1 (0.70) | ALDH1A1L3MBTL1TSHRGFERMAPK1 | |
| Hydrochloric Acid SCHEMBL8046146 | 0.79 | ALDH1A1 (0.70) | ALDH1A1L3MBTL1TSHRGFERMAPK1 | |
| Sulfuric Acid SCHEMBL7234545 | 0.78 | MEN1 (0.49) | ALDH1A1L3MBTL1MEN1KMT2ACNR2 | |
| Sulfuric Acid SCHEMBL455054 | 0.77 | HSP90AA1 (0.51) | ALDH1A1L3MBTL1MEN1KMT2ACNR2 | |
| SCHEMBL1972710 | 0.76 | ALDH1A1 (0.67) | ALDH1A1L3MBTL1TSHRGFERMAPK1 | |
| SCHEMBL332675 | 0.76 | ALDH1A1 (0.67) | ALDH1A1L3MBTL1TSHRGFERMAPK1 | |
| SCHEMBL11672166 | 0.75 | ALDH1A1 (0.58) | ALDH1A1L3MBTL1TSHRGFERMAPK1 | |
| SCHEMBL7153357 | 0.74 | ALDH1A1 (0.64) | ALDH1A1L3MBTL1TSHRGFERMAPK1 | |
| Formaldehyde SCHEMBL28197258 | 0.74 | ALDH1A1 (0.65) | ALDH1A1L3MBTL1TSHRGFERMAPK1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 256 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2025035044-A2 | HOLOGRAPHIC PHOTOPOLYMERS AND METHODS FOR MAKING THE SAME | NITTO DENKO CORPORATION (JP) | 2025-02-13 | — | — | WO | disclosed |
| US-20250018066-A1 | Ophthalmic dye composition | VITREQ B.V. (NL) | 2025-01-16 | — | — | US | disclosed |
| WO-2024068274-A1 | CATIONICALLY CURABLE ADHESIVE WITH HOLDING-STRENGTH INDICATION | TESA SE (DE) | 2024-04-04 | — | — | WO | disclosed |
| EP-4345144-A1 | CURABLE PRESSURE-SENSITIVE ADHESIVE WITH IMPROVED ADHESIVE PROPERTIES | tesa SE (DE) | 2024-04-03 | — | — | EP | disclosed |
| EP-4345131-A1 | CATIONICALLY CURABLE ADHESIVE COMPOSITION WITH DEFINED COLOURING IN THE CURED STATE | tesa SE (DE) | 2024-04-03 | — | — | EP | disclosed |
| CN-117777895-A | Curable pressure sensitive adhesives with improved adhesive properties | 德莎欧洲股份公司 | 2024-03-29 | — | — | CN | disclosed |
| CN-117777894-A | Cationic curable adhesive having defined coloration in the cured state | 德莎欧洲股份公司 | 2024-03-29 | — | — | CN | disclosed |
| US-20240101874-A1 | CATIONICALLY CURABLE ADHESIVE WITH DEFINED COLOURATION IN THE CURED STATE | TESA SE (DE) | 2024-03-28 | — | — | US | disclosed |
| US-20240101871-A1 | CURABLE PRESSURE-SENSITIVE ADHESIVE HAVING IMPROVED ADHESIVE PROPERTIES | TESA SE (DE) | 2024-03-28 | — | — | US | disclosed |
| CN-115725706-A | Reagent for PCR (polymerase chain reaction), preparation method thereof, kit and PCR method | 珠海丽珠试剂股份有限公司 | 2023-03-03 | — | — | CN | disclosed |
| EP-1303399-A1 | THERMAL DIGITAL LITHOGRAPHIC PRINTING PLATE | Kodak Polychrome Graphics Company Ltd. (US) | 2003-04-23 | — | — | EP | disclosed |
| US-6534238-B1 | Substrate having a hydrophilic surface; polymeric underlayer over the hydrophilic surface; top layer over the underlayer; top layer is: ink receptive; insoluble in aqueous alkaline developer; comprises solubility-suppressing component | KODAK POLYCHROME GRAPHICS, LLC | 2003-03-18 | — | — | US | disclosed |
| EP-1291172-A2 | A multi-layer thermally imageable element | Kodak Polychrome Graphics LLC (US) | 2003-03-12 | — | — | EP | disclosed |
| EP-1268660-A1 | LITHOGRAPHIC PRINTING PLATE HAVING HIGH CHEMICAL RESISTANCE | Kodak Polychrome Graphics Company Ltd. (US) | 2003-01-02 | — | — | EP | disclosed |
| WO-2002074270-A1 | COMPOSITION FOR SIMULTANEOUSLY LIGHTENING AND COLORING HAIR UTILIZING BLEACH-STABLE ACID AND BASIC DYES | L'AVANT GARDE INC. (US) | 2002-09-26 | — | — | WO | disclosed |
| EP-1241003-A2 | Imageable element having a protective overlayer | Kodak Polychrome Graphics Company Ltd. (US) | 2002-09-18 | — | — | EP | disclosed |
| US-6358669-B1 | SUBSTRATE WITH HYDROPHILIC SURFACE, OVERCOATING | KODAK POLYCHROME GRAPHICS LLC | 2002-03-19 | — | — | US | disclosed |
| WO-2001096119-A1 | THERMAL DIGITAL LITHOGRAPHIC PRINTING PLATE | KODAK POLYCHROME GRAPHICS COMPANY LTD. (US) | 2001-12-20 | — | — | WO | disclosed |
| US-6294311-B1 | UNDERLAYER CONTAINS A COMBINATION OF POLYMERIC MATERIALS THAT PROVIDES RESISTANCE BOTH TO FOUNTAIN SOLUTION AND TO AGGRESSIVE WASHES, SUCH AS A UV WASH; CAN BE USED IN EITHER THERMALLY IMAGEABLE OR PHOTOCHEMICALLY IMAGEABLE ELEMENTS. | KODAK POLYCHROME GRAPHICS LLC | 2001-09-25 | — | — | US | disclosed |
| WO-2001046318-A1 | LITHOGRAPHIC PRINTING PLATE HAVING HIGH CHEMICAL RESISTANCE | KODAK POLYCHROME GRAPHICS COMPANY LTD. (US) | 2001-06-28 | — | — | WO | disclosed |