Known targets — ChEMBL curated mechanism
The experimentally established mechanism targets of Sulfuric Acid. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Predicted protein targets (top 16)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | HSP90AA1 | P07900 | 2/20 | 0.51 |
| ▸ | TLR9 | Q9NR96 | 1/20 | 0.51 |
| ▸ | MEN1 | O00255 | 3/20 | 0.47 |
| ▸ | KMT2A | Q03164 | 3/20 | 0.47 |
| ▸ | L3MBTL1 | Q9Y468 | 3/20 | 0.47 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.47 |
| ▸ | HPGD | P15428 | 2/20 | 0.47 |
| ▸ | MAPT | P10636 | 1/20 | 0.47 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.47 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.47 |
| ▸ | HSD11B1 | P28845 | 1/20 | 0.47 |
| ▸ | NPC1 | O15118 | 1/20 | 0.46 |
| ▸ | RAB9A | P51151 | 1/20 | 0.46 |
| ▸ | NOX1 | Q9Y5S8 | 1/20 | 0.46 |
| ▸ | CNR2 | P34972 | 14/20 | 0.46 |
| ▸ | CNR1 | P21554 | 8/20 | 0.46 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Sulfuric Acid SCHEMBL7234545 | 0.92 | MEN1 (0.49) | HSP90AA1TLR9MEN1KMT2AL3MBTL1 | |
| Brilliant Green SCHEMBL2518588 | 0.82 | HPGD (0.44) | MEN1KMT2AALDH1A1HPGDMAPT | |
| Diethylaniline SCHEMBL9487131 | 0.77 | ALDH1A1 (0.56) | HSP90AA1TLR9MEN1KMT2AL3MBTL1 | |
| Hydrochloric Acid SCHEMBL1123567 | 0.77 | ALDH1A1 (0.54) | HSP90AA1MEN1KMT2AL3MBTL1ALDH1A1 | |
| Diethylaniline SCHEMBL27592326 | 0.76 | ALDH1A1 (0.55) | HSP90AA1TLR9MEN1KMT2AL3MBTL1 | |
| SCHEMBL2859161 | 0.76 | THRB (0.56) | MEN1KMT2AALDH1A1MAPTCNR2 | |
| Sulfuric Acid SCHEMBL7589189 | 0.72 | CNR2 (0.59) | HSP90AA1MEN1KMT2AL3MBTL1ALDH1A1 | |
| SCHEMBL3229040 | 0.72 | ALDH1A1 (0.65) | HSP90AA1MEN1KMT2AL3MBTL1ALDH1A1 | |
| SCHEMBL6313828 | 0.72 | ALDH1A1 (0.58) | HSP90AA1MEN1KMT2AL3MBTL1ALDH1A1 | |
| Sulfuric Acid SCHEMBL8542197 | 0.71 | ALDH1A1 (0.50) | HSP90AA1TLR9MEN1KMT2AL3MBTL1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 312 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2003022233-A1 | AGENT FOR DYEING KERATIN FIBERS, CONTAINING A BLUE CATIONIC ANTHRAQUINONE DYE | WELLA AKTIENGESELLSCHAFT (DE) | 2003-03-20 | — | — | WO | claimed |
| CN-122095314-A | Photosensitive resin laminate, method for forming resist pattern, and method for manufacturing wiring board having conductor pattern | — | 2026-05-26 | — | — | CN | disclosed |
| WO-2026100708-A1 | PHOTOSENSITIVE RESIN LAMINATE, PHOTOSENSITIVE ELEMENT, AND PATTERN FORMING METHOD | 旭化成株式会社 | 2026-05-15 | — | — | WO | disclosed |
| CN-122029490-A | Photosensitive resin laminate, method for forming resist pattern, and method for forming wiring board | 旭化成株式会社 | 2026-05-12 | — | — | CN | disclosed |
| CN-114114841-B | Photosensitive resin laminate and method for forming resist pattern | 旭化成株式会社 | 2026-05-12 | — | — | CN | disclosed |
| US-12416860-B2 | Photoresist film and application thereof | CHANG CHUN PLASTICS CO., LTD. (TW) | 2025-09-16 | — | — | US | disclosed |
| US-20250224674-A1 | PHOTOSENSITIVE RESIN FILM AND APPLICATION THEREOF | CHANG CHUN PLASTICS CO., LTD. (TW) | 2025-07-10 | — | — | US | disclosed |
| CN-120077329-A | Photosensitive resin composition, photosensitive resin laminate, and method for forming resist pattern | 旭化成株式会社 | 2025-05-30 | — | — | CN | disclosed |
| CN-120044756-A | Photosensitive resin composition | 旭化成株式会社 | 2025-05-27 | — | — | CN | disclosed |
| WO-2025095102-A1 | PHOTOSENSITIVE RESIN LAMINATE, METHOD FOR FORMING RESIST PATTERN, AND METHOD FOR MANUFACTURING WIRING BOARD HAVING CONDUCTOR PATTERN | 旭化成株式会社 | 2025-05-08 | — | — | WO | disclosed |
| US-6361571-B1 | USING TAUTOMERIC NONOXIDATIVE DYES AND POLYMETHINE DYES | WELLA AKTIENGESELLSCHAFT (DE) | 2002-03-26 | — | — | US | disclosed |
| EP-1153597-A2 | Hair dye composition comprising an associative thickener | Wella Aktiengesellschaft (DE) | 2001-11-14 | — | — | EP | disclosed |
| EP-1110942-A2 | Process for the preparation of 2-aminomethyl-1,4-diamino-benzene and salts thereof, and their use in dyeing composition for keratin fibers | Wella Aktiengesellschaft (DE) | 2001-06-27 | — | — | EP | disclosed |
| EP-1103542-A2 | Process for the preparation of 1,4-diamino-2-methoxymethyl-benzene and its salts and the use of these compounds in dyeing compositions for keratinous fibres | Wella Aktiengesellschaft (DE) | 2001-05-30 | — | — | EP | disclosed |
| US-6231622-B1 | MIXTURES; BLUE COLOR | WELLA AKTIENGESELLSCHAFT (DE) | 2001-05-15 | — | — | US | disclosed |
| US-6171347-B1 | REMOVAL OF HAIR COLOR TO BE WORN FOR ONLY A SHORT PERIOD OF TIME UNDER MILD, GENTLE CONDITIONS BY USING A COMBINATION OF A SUITABLE REDUCTONE, SUCH AS ASCORBIC ACID, AND/OR A THIOL AND/OR A SULFITE | WELLA AKTIENGESELLSCHAFT (DE) | 2001-01-09 | — | — | US | disclosed |
| EP-1002516-A1 | Hair dyes containing indan derivatives | Wella Aktiengesellschaft (DE) | 2000-05-24 | — | — | EP | disclosed |
| EP-0943316-A2 | Means for coloring and decoloring of hair | Wella Aktiengesellschaft (DE) | 1999-09-22 | — | — | EP | disclosed |
| EP-0898954-A2 | Composition for dyeing keratin fibres | Wella Aktiengesellschaft (DE) | 1999-03-03 | — | — | EP | disclosed |
| EP-0867171-A2 | Powder composition for the preparation of gels comprising a methyl hydroxyalkyl cellulose | Wella Aktiengesellschaft (DE) | 1998-09-30 | — | — | EP | disclosed |