SCHEMBL11246495

SCHEMBL11246495

CCOC(=O)c1ccccc1OC(C)(C)C(=O)c1ccccc1

nearest known ligand 0.54

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TSHR P16473 2/20 0.54
ALDH1A1 P00352 4/20 0.48
HSD17B10 Q99714 1/20 0.48
CASP3 P42574 1/20 0.45
SENP8 Q96LD8 1/20 0.45
SENP7 Q9BQF6 1/20 0.45
SENP6 Q9GZR1 1/20 0.45
HTT P42858 1/20 0.45
LMNA P02545 2/20 0.43
KDM4E B2RXH2 1/20 0.43
KMT2A Q03164 4/20 0.42
HPGD P15428 1/20 0.42
NPC1 O15118 3/20 0.42
MEN1 O00255 2/20 0.42
SLC6A3 Q01959 1/20 0.42
MAPT P10636 3/20 0.42
USP2 O75604 1/20 0.42
CYP1A2 P05177 1/20 0.42
CYP3A4 P08684 1/20 0.42
CYP2C9 P11712 1/20 0.42

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL25263194 0.82 TSHR (0.56) TSHRALDH1A1HSD17B10LMNAKDM4E
SCHEMBL1127848 0.78 TSHR (0.62) TSHRALDH1A1HSD17B10HTTLMNA
SCHEMBL5706020 0.78 SLC6A3 (0.69) TSHRALDH1A1HSD17B10CASP3SENP8
SCHEMBL31745361 0.77 ALDH1A1 (0.51) TSHRALDH1A1CASP3SENP8SENP7
SCHEMBL31745119 0.75 FBP1 (0.54) TSHRALDH1A1HSD17B10HTTLMNA
SCHEMBL11251806 0.75 CES1 (0.46) TSHRALDH1A1HSD17B10LMNAKDM4E
SCHEMBL28974979 0.75 TSHR (0.74) TSHRALDH1A1HSD17B10LMNAKDM4E
Boric Acid SCHEMBL28107026 0.75 TSHR (0.54) TSHRALDH1A1HSD17B10LMNAKDM4E
Diethyl Phthalate SCHEMBL19252611 0.75 TSHR (0.95) TSHRALDH1A1HSD17B10LMNAKDM4E
Diethyl Phthalate SCHEMBL28775845 0.75 TSHR (0.95) TSHRALDH1A1HSD17B10LMNAKDM4E

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-4321118-A Bis benzoyl sensitizers for photopolymerization or photo cross linking process and composition CIBA-GEIGY CORPORATION (US) 1982-03-23 US disclosed
US-4318791-A PHOTOPOLYMERIZABLE SYSTEM FOR INKS CIBA-GEIGY CORPORATION (US) 1982-03-09 US disclosed
US-4315807-A Sensitizers for photopolymerization CIBA-GEIGY CORPORATION (US) 1982-02-16 US disclosed
US-4308400-A AROMATIC HYDROXY KETONES CIBA-GEIGY A.G. (CH) 1981-12-29 US disclosed