SCHEMBL11259009

SCHEMBL11259009

CC(C)(Oc1ccccc1O)C(=O)c1ccccc1

nearest known ligand 0.45

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
HSD17B10 Q99714 6/20 0.45
KDM4E B2RXH2 5/20 0.45
ALDH1A1 P00352 3/20 0.45
TSHR P16473 3/20 0.42
CA1 P00915 1/20 0.42
CA2 P00918 1/20 0.42
TP53 P04637 1/20 0.42
CES1 P23141 2/20 0.42
SRC P12931 1/20 0.42
MAPT P10636 4/20 0.41
SMN1; SMN2 Q16637 3/20 0.41
ALOX15 P16050 2/20 0.41
GAA P10253 2/20 0.41
MEN1 O00255 1/20 0.41
JAK2 O60674 1/20 0.41
USP2 O75604 1/20 0.41
ESR1 P03372 1/20 0.41
KMT2A Q03164 1/20 0.41
NPSR1 Q6W5P4 1/20 0.41
ESR2 Q92731 1/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL11814304 0.79 MAPT (0.41) HSD17B10KDM4EALDH1A1TSHRCA1
SCHEMBL9359773 0.78 TSHR (0.48) HSD17B10KDM4EALDH1A1TSHRCA1
SCHEMBL2142613 0.78 PPARG (0.48) HSD17B10KDM4EALDH1A1TSHRCES1
SCHEMBL2033994 0.75 CES1 (0.52) HSD17B10ALDH1A1TSHRCA1CA2
SCHEMBL11246495 0.74 TSHR (0.54) HSD17B10KDM4EALDH1A1TSHRMAPT
SCHEMBL28761122 0.74 TSHR (0.44) HSD17B10KDM4EALDH1A1TSHRCA1
SCHEMBL10090157 0.74 CES1 (0.60) HSD17B10KDM4EALDH1A1TSHRCES1
SCHEMBL1805490 0.73 CA2 (0.56) HSD17B10KDM4EALDH1A1TSHRCA1
SCHEMBL10385943 0.73 CES1 (0.46) HSD17B10ALDH1A1TSHRTP53CES1
SCHEMBL11251806 0.73 CES1 (0.46) HSD17B10KDM4EALDH1A1TSHRCES1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-4321118-A Bis benzoyl sensitizers for photopolymerization or photo cross linking process and composition CIBA-GEIGY CORPORATION (US) 1982-03-23 US disclosed
US-4318791-A PHOTOPOLYMERIZABLE SYSTEM FOR INKS CIBA-GEIGY CORPORATION (US) 1982-03-09 US disclosed
US-4315807-A Sensitizers for photopolymerization CIBA-GEIGY CORPORATION (US) 1982-02-16 US disclosed
US-4308400-A AROMATIC HYDROXY KETONES CIBA-GEIGY A.G. (CH) 1981-12-29 US disclosed
EP-0003002-A2 Use of aromatic-aliphatic ketones as photoinitiators, photopolymerisable systems containing such ketones and aromatic-aliphatic ketones CIBA-GEIGY AG (CH) 1979-07-11 EP disclosed