Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ADRA1A | P35348 | 2/20 | 0.48 |
| ▸ | HMGCR | P04035 | 1/20 | 0.48 |
| ▸ | CHRM1 | P11229 | 1/20 | 0.48 |
| ▸ | TBXA2R | P21731 | 1/20 | 0.48 |
| ▸ | TSHR | P16473 | 4/20 | 0.46 |
| ▸ | CYP2C19 | P33261 | 3/20 | 0.46 |
| ▸ | HIF1A | Q16665 | 2/20 | 0.46 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.46 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.37 |
| ▸ | KDM4E | B2RXH2 | 3/20 | 0.37 |
| ▸ | TDP1 | Q9NUW8 | 3/20 | 0.37 |
| ▸ | FFAR1 | O14842 | 1/20 | 0.37 |
| ▸ | CPT2 | P23786 | 1/20 | 0.37 |
| ▸ | LMNA | P02545 | 2/20 | 0.33 |
| ▸ | ALOX15 | P16050 | 2/20 | 0.33 |
| ▸ | FFAR3 | O14843 | 1/20 | 0.33 |
| ▸ | MAPT | P10636 | 1/20 | 0.33 |
| ▸ | EYA2 | O00167 | 1/20 | 0.33 |
| ▸ | APP | P05067 | 1/20 | 0.33 |
| ▸ | ACE | P12821 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL5159992 | 0.82 | TSHR (0.36) | ADRA1AHMGCRCHRM1TBXA2RTSHR | |
| SCHEMBL30366377 | 0.78 | ALDH1A1 (0.44) | TSHRCYP2C19HIF1ACYP2D6ALDH1A1 | |
| SCHEMBL9346279 | 0.76 | ADRA1A (0.46) | ADRA1AHMGCRCHRM1TBXA2RTSHR | |
| SCHEMBL1547956 | 0.75 | ADRA1A (0.43) | ADRA1AHMGCRCHRM1TBXA2RTSHR | |
| SCHEMBL4998722 | 0.74 | HMGCR (0.50) | ADRA1AHMGCRCHRM1TBXA2RTSHR | |
| SCHEMBL8580780 | 0.74 | HMGCR (0.50) | ADRA1AHMGCRCHRM1TBXA2RTSHR | |
| SCHEMBL16390585 | 0.73 | TSHR (0.40) | ADRA1AHMGCRCHRM1TBXA2RTSHR | |
| SCHEMBL783010 | 0.72 | TDP1 (0.41) | ADRA1AHMGCRCHRM1TBXA2RTSHR | |
| SCHEMBL9660711 | 0.72 | TDP1 (0.41) | ADRA1AHMGCRCHRM1TBXA2RTSHR | |
| SCHEMBL3871128 | 0.71 | FFAR3 (0.36) | ADRA1AHMGCRCHRM1TBXA2RTSHR |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 18 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9966596-B2 | Coating liquid, coating liquid for manufacturing electrode plate, undercoating agent, and use thereof | DAINICHISEIKA COLOR & CHEMICALS MFG. CO., LTD. (JP) | 2018-05-08 | — | — | US | disclosed |
| EP-2284235-B1 | COATING LIQUID, COATING LIQUID FOR MANUFACTURING ELECTRODE PLATE, UNDERCOATING AGENT, AND USE THEREOF | DAINICHISEIKA COLOR CHEM (JP) | 2016-08-31 | — | — | EP | disclosed |
| US-9123940-B2 | Coating liquid, coating liquid for manufacturing electrode plate, undercoating agent, and use thereof | DAINICHISEIKA COLOR & CHEMICALS MFG. CO, LTD. (JP) | 2015-09-01 | — | — | US | disclosed |
| US-20150147648-A1 | COATING LIQUID, COATING LIQUID FOR MANUFACTURING ELECTRODE PLATE, UNDERCOATING AGENT, AND USE THEREOF | DAINICHISEIKA COLOR CHEM (JP) | 2015-05-28 | — | — | US | disclosed |
| EP-1521123-B1 | Alkaline Developer for radiation sensitive compositions | AGFA GRAPHICS NV (BE) | 2013-08-07 | — | — | EP | disclosed |
| US-20110091771-A1 | COATING LIQUID, COATING LIQUID FOR MANUFACTURING ELECTRODE PLATE, UNDERCOATING AGENT, AND USE THEREOF | DAINICHISEIKA COLOR & CHEMICALS MFG. CO., LTD. (JP) | 2011-04-21 | — | — | US | disclosed |
| EP-2284235-A1 | COATING LIQUID, COATING LIQUID FOR MANUFACTURING ELECTRODE PLATE, UNDERCOATING AGENT, AND USE THEREOF | Dainichiseika Color & Chemicals Mfg. Co., Ltd. (JP) | 2011-02-16 | — | — | EP | disclosed |
| EP-1722275-B1 | Method for processing lithographic printing plates | AGFA GRAPHICS NV (BE) | 2010-10-27 | — | — | EP | disclosed |
| EP-1722274-B1 | Alkaline developer for radiation sensitive compositions | AGFA GRAPHICS NV (BE) | 2010-09-08 | — | — | EP | disclosed |
| US-7186498-B2 | Alkaline developer for radiation sensitive compositions | AGFA GRAPHICS NV (BE) | 2007-03-06 | — | — | US | disclosed |
| US-20060257798-A1 | Alkaline developer for radiation sensitive compositions | AGFA-GEVAERT (BE) | 2006-11-16 | — | — | US | disclosed |
| US-20060257789-A1 | Method for processing lithographic printing plates | AGFA-GEVAERT (BE) | 2006-11-16 | — | — | US | disclosed |
| EP-1722274-A1 | Alkaline developer for radiation sensitive compositions | AGFA-GEVAERT N.V. (BE) | 2006-11-15 | — | — | EP | disclosed |
| EP-1722275-A1 | Method for processing lithographic printing plates | AGFA-GEVAERT N.V. (BE) | 2006-11-15 | — | — | EP | disclosed |
| US-20050106510-A1 | Alkaline developer for radiation sensitive compositions | AGFA-GEVAERT (BE) | 2005-05-19 | — | — | US | disclosed |
| EP-1521123-A1 | Alkaline Developer for radiation sensitive compositions | Agfa-Gevaert (BE) | 2005-04-06 | — | — | EP | disclosed |
| US-6458348-B1 | Use of water-soluble polymers as biocides | BASF AKTIENGESELLSCHAFT (DE) | 2002-10-01 | — | — | US | disclosed |
| US-6162575-A | Process for making lithographic printing plate | MITSUBISHI PAPER MILLS LIMITED (JP) | 2000-12-19 | — | — | US | disclosed |