Known targets — ChEMBL curated mechanism
ACHEBDKRB2CHRM1CHRM2CHRM3CHRNA1CHRNB1CHRNDCHRNECHRNGGUCY1A1GUCY1A2GUCY1B1GUCY1B2NAMPTPTAFRSLC10A2SLC6A2SLC6A3TACR1dacAdacBdacCftsImrcAmrcBmrdA
The experimentally established mechanism targets of Hydrochloric Acid. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ACHE known ✓ | P22303 | 4/20 | 0.95 |
| ▸ | CHRM2 known ✓ | P08172 | 2/20 | 0.95 |
| ▸ | CHRM1 known ✓ | P11229 | 2/20 | 0.95 |
| ▸ | SLC6A2 known ✓ | P23975 | 2/20 | 0.95 |
| ▸ | SLC6A3 known ✓ | Q01959 | 2/20 | 0.95 |
| ▸ | CHRM3 known ✓ | P20309 | 1/20 | 0.91 |
| ▸ | KMT2A | Q03164 | 2/20 | 1.00 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 1.00 |
| ▸ | MEN1 | O00255 | 1/20 | 1.00 |
| ▸ | MAPT | P10636 | 1/20 | 1.00 |
| ▸ | MAPK1 | P28482 | 1/20 | 1.00 |
| ▸ | CASP2 | P42575 | 1/20 | 1.00 |
| ▸ | RAD52 | P43351 | 3/20 | 0.95 |
| ▸ | HSPD1 | P10809 | 1/20 | 0.95 |
| ▸ | HSPE1 | P61604 | 1/20 | 0.95 |
| ▸ | ADRA2A | P08913 | 2/20 | 0.95 |
| ▸ | ADORA3 | P0DMS8 | 2/20 | 0.95 |
| ▸ | SLC6A4 | P31645 | 2/20 | 0.95 |
| ▸ | ABCB11 | O95342 | 1/20 | 0.95 |
| ▸ | ESR1 | P03372 | 1/20 | 0.95 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Hydrochloric Acid SCHEMBL6300556 | 1.00 | KMT2A (1.00) | KMT2ASMN1; SMN2MEN1MAPTMAPK1 | |
| Hydrochloric Acid SCHEMBL8505201 | 1.00 | KMT2A (1.00) | KMT2ASMN1; SMN2MEN1MAPTMAPK1 | |
| Hydrochloric Acid SCHEMBL329731 | 1.00 | KMT2A (1.00) | KMT2ASMN1; SMN2MEN1MAPTMAPK1 | |
| Hydrochloric Acid SCHEMBL313837 | 1.00 | KMT2A (1.00) | KMT2ASMN1; SMN2MEN1MAPTMAPK1 | |
| Hydrochloric Acid SCHEMBL122151 | 1.00 | KMT2A (1.00) | KMT2ASMN1; SMN2MEN1MAPTMAPK1 | |
| Cetylpyridinium SCHEMBL3232752 | 1.00 | KMT2A (1.00) | KMT2ASMN1; SMN2MEN1MAPTMAPK1 | |
| Hydrochloric Acid SCHEMBL120932 | 1.00 | KMT2A (1.00) | KMT2ASMN1; SMN2MEN1MAPTMAPK1 | |
| Hydrochloric Acid SCHEMBL5084795 | 1.00 | KMT2A (1.00) | KMT2ASMN1; SMN2MEN1MAPTMAPK1 | |
| Hydrochloric Acid SCHEMBL1889303 | 1.00 | KMT2A (1.00) | KMT2ASMN1; SMN2MEN1MAPTMAPK1 | |
| Hydrochloric Acid SCHEMBL329979 | 1.00 | KMT2A (1.00) | KMT2ASMN1; SMN2MEN1MAPTMAPK1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-111819171-B | 1,2,3,5,6-pentathiazepan manufacturing method | 三菱瓦斯化学株式会社 | 2023-03-28 | — | — | CN | disclosed |
| CN-115362216-A | Film-forming composition | 日产化学株式会社 | 2022-11-18 | — | — | CN | disclosed |
| CN-115016230-A | Composition for forming silicon-containing resist underlayer film | 日产化学工业株式会社 | 2022-09-06 | — | — | CN | disclosed |
| CN-112558410-A | Composition for forming silicon-containing resist underlayer film having organic group containing aliphatic polycyclic structure | 日产化学工业株式会社 | 2021-03-26 | — | — | CN | disclosed |
| CN-112218854-A | Process for producing polyfunctional sulfur-containing epoxy compound | 三菱瓦斯化学株式会社 | 2021-01-12 | — | — | CN | disclosed |
| CN-111819171-A | Method for producing 1,2,3,5, 6-pentathiazepan | 三菱瓦斯化学株式会社 | 2020-10-23 | — | — | CN | disclosed |
| CN-108885997-A | Method for planarizing semiconductor substrate using silicon-containing composition | 日产化学株式会社 | 2018-11-23 | — | — | CN | disclosed |
| CN-106946841-A | The manufacture method of high-purity phenolic compound | 宇部兴产株式会社 | 2017-07-14 | — | — | CN | disclosed |
| CN-103748517-B | Silicon-containing resist underlayer film-forming composition having sulfone structure | 日产化学工业株式会社 | 2017-04-19 | — | — | CN | disclosed |
| CN-1790772-A | Patterned substrate, electro-optical device, and method for manufacturing an electro-optical device | SEIKO EPSON CORP (JP) | 2006-06-21 | — | — | CN | disclosed |
| US-4348292-A | Multi-layered liquid detergent-builder concentrate compositions which on addition to water produce stable cleaning solutions | WALTON-MARCH, INC. (US) | 1982-09-07 | — | — | US | disclosed |