SCHEMBL1127610

SCHEMBL1127610

SCc1ccccc1Cc1cccc2ccccc12

nearest known ligand 0.53

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CYP2C19 P33261 5/20 0.50
CYP1A2 P05177 3/20 0.50
CYP2C9 P11712 2/20 0.50
CYP3A4 P08684 3/20 0.47
CTRC Q99895 1/20 0.47
CYP2D6 P10635 3/20 0.47
ADRA2A P08913 4/20 0.46
ADRA2B P18089 4/20 0.46
ADRA2C P18825 4/20 0.46
ADRA1A P35348 3/20 0.46
ADRA1D P25100 2/20 0.46
ADRA1B P35368 2/20 0.46
TDP1 Q9NUW8 1/20 0.46
LMNA P02545 1/20 0.45
HTR1A P08908 1/20 0.45
MAPT P10636 1/20 0.45
MAPK1 P28482 1/20 0.45
OPRM1 P35372 1/20 0.45
TAAR1 Q96RJ0 1/20 0.45
NISCH Q9Y2I1 1/20 0.45

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL28899 0.87 CYP1A2 (0.58) CYP2C19CYP1A2CYP2C9CYP2D6TDP1
SCHEMBL599659 0.87 CYP2C19 (0.62) CYP2C19CYP1A2CYP2C9CYP3A4CTRC
SCHEMBL29490353 0.87 CYP2C19 (0.62) CYP2C19CYP1A2CYP2C9CYP3A4CTRC
SCHEMBL11339937 0.84 CYP2C19 (0.60) CYP2C19CYP1A2CYP2C9CYP3A4CTRC
Hydrogen Sulfide SCHEMBL11348128 0.84 CYP2C19 (0.60) CYP2C19CYP1A2CYP2C9CYP3A4CTRC
SCHEMBL659517 0.84 CYP2C19 (0.60) CYP2C19CYP1A2CYP2C9CYP3A4CTRC
SCHEMBL11328087 0.84 CYP2C19 (0.60) CYP2C19CYP1A2CYP2C9CYP3A4CTRC
SCHEMBL4667060 0.84 CYP2C19 (0.60) CYP2C19CYP1A2CYP2C9CYP3A4CTRC
SCHEMBL659516 0.84 CYP2C19 (0.60) CYP2C19CYP1A2CYP2C9CYP3A4CTRC
Potassium SCHEMBL29867531 0.84 CYP2C19 (0.60) CYP2C19CYP1A2CYP2C9CYP3A4CTRC

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 101 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-4738010-A1 NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION COATING FILM, NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION FILM, CURED FILM, AND ELECTRONIC COMPONENT COMPRISING SAME Toray Industries, Inc. (JP) 2026-05-06 EP disclosed
EP-4696511-A1 INK-JET RECORDING HEAD Canon Kabushiki Kaisha (JP) 2026-02-18 EP disclosed
US-20260042918-A1 PHOTOSENSITIVE RESIN COMPOSITION, LIQUID-REPELLENT ANTI-FOULING FILM, AND INKJET RECORDING HEAD CANON KK (JP) 2026-02-12 US disclosed
US-20260042294-A1 INK-JET RECORDING HEAD CANON KK (JP) 2026-02-12 US disclosed
US-20260042917-A1 PHOTOSENSITIVE RESIN COMPOSITION, LIQUID-REPELLENT ANTI-FOULING FILM, AND INKJET RECORDING HEAD CANON KK (JP) 2026-02-12 US disclosed
EP-4691782-A1 PHOTOSENSITIVE RESIN COMPOSITION, LIQUID-REPELLENT ANTI-FOULING FILM, AND INKJET RECORDING HEAD Canon Kabushiki Kaisha (JP) 2026-02-11 EP disclosed
EP-4692937-A1 NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, CURED PRODUCT AND METHOD FOR PRODUCING SAME, HOLLOW STRUCTURE, ELECTRONIC COMPONENT, AND ELASTIC WAVE FILTER Toray Industries, Inc. (JP) 2026-02-11 EP disclosed
EP-4691783-A1 PHOTOSENSITIVE RESIN COMPOSITION, LIQUID-REPELLENT ANTI-FOULING FILM, AND INKJET RECORDING HEAD CANON KABUSHIKI KAISHA (JP) 2026-02-11 EP disclosed
EP-4668018-A1 NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION COATING, NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION FILM, CURED FILM, AND SEMICONDUCTOR DEVICE USING THESE Toray Industries, Inc. (JP) 2025-12-24 EP disclosed
US-20250115705-A1 RESIN COMPOSITION FOR LENS, CURED SUBSTANCE FOR LENS, AND LENS MITSUI CHEMICALS, INC. (JP) 2025-04-10 US disclosed
EP-2284165-B1 SULFONIUM SALT, PHOTOACID GENERATOR, PHOTO-CURABLE COMPOSITION, AND CURED PRODUCT OF THE PHOTO-CURABLE COMPOSITION SAN APRO LTD (JP) 2013-02-20 EP disclosed
US-20130037753-A1 ORGANIC ELECTRONIC MATERIAL, POLYMERIZATION INITIATOR AND THERMAL POLYMERIZATION INITIATOR, INK COMPOSITION, ORGANIC THIN FILM AND PRODUCTION METHOD FOR SAME, ORGANIC ELECTRONIC ELEMENT, ORGANIC ELECTROLUMINESCENT ELEMENT, LIGHTING DEVICE, DISPLAY ELEMENT, AND DISPLAY DEVICE HITACHI CHEMICAL COMPANY, LTD (JP) 2013-02-14 US disclosed
US-8278030-B2 Sulfonium salt, photoacid generator, and photocurable composition and cured body thereof SAN-APRO LIMITED (JP) 2012-10-02 US disclosed
EP-2485290-A1 MATERIAL FOR ORGANIC ELECTRONICS, ORGANIC ELECTRONIC ELEMENT, ORGANIC ELECTROLUMINESCENT ELEMENT, DISPLAY ELEMENT USING ORGANIC ELECTROLUMINESCENT ELEMENT, ILLUMINATING DEVICE, AND DISPLAY DEVICE Hitachi Chemical Company, Ltd. (JP) 2012-08-08 EP disclosed
US-20120181530-A1 MATERIAL FOR ORGANIC ELECTRONICS, ORGANIC ELECTRONIC ELEMENT, ORGANIC ELECTROLUMINESCENT ELEMENT, DISPLAY ELEMENT USING ORGANIC ELECTROLUMINESCENT ELEMENT, ILLUMINATING DEVICE, AND DISPLAY DEVICE RESONAC CORPORATION (JP) 2012-07-19 US disclosed
US-20110039205-A1 SULFONIUM SALT, PHOTOACID GENERATOR, AND PHOTOCURABLE COMPOSITION AND CURED BODY THEREOF SAN-APRO LIMITED (JP) 2011-02-17 US disclosed
EP-2284165-A1 PHOSPHONIUM SALT, PHOTOACID GENERATOR, PHOTO-CURABLE COMPOSITION, AND CURED PRODUCT OF THE PHOTO-CURABLE COMPOSITION San-Apro Limited (JP) 2011-02-16 EP disclosed
US-7709598-B2 Fluorinated alkyl fluorophoshoric acid salts of onium and transition metal complex SAN-APRO LIMITED (JP) 2010-05-04 US disclosed
US-20070225458-A1 Novel Fluorinated Alkyl Fluorophosphoric Acid Salts of Onium and Ttransition Metal Complex SAN-APRO LIMITED (JP) 2007-09-27 US disclosed
EP-1752463-A1 NOVEL FLUORINATED ALKYLFLUOROPHOSPHORIC ACID SALT OF ONIUM AND TRANSITION METAL COMPLEX San-Apro Limited (JP) 2007-02-14 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (6 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20260042917-A1 PHOTOSENSITIVE RESIN COMPOSITION, LIQUID-REPELLENT ANTI-FOULING FILM, AND INKJET RECORDING HEAD MLLT3, OR10J3, RFT1 CYP2C19 3098/4885CYP1A2 3129/4885CYP2C9 1974/4885
US-20130037753-A1 ORGANIC ELECTRONIC MATERIAL, POLYMERIZATION INITIATOR AND THERMAL POLYMERIZATION INITIATOR, INK COMPOSITION, ORGANIC THIN FILM AND PRODUCTION METHOD FOR SAME, ORGANIC ELECTRONIC ELEMENT, ORGANIC ELECTROLUMINESCENT ELEMENT, LIGHTING DEVICE, DISPLAY ELEMENT, AND DISPLAY DEVICE L1CAM, CD99, EPB41L2 CYP2C19 1485/4885CYP1A2 1880/4885CYP2C9 1358/4885
US-20110039205-A1 SULFONIUM SALT, PHOTOACID GENERATOR, AND PHOTOCURABLE COMPOSITION AND CURED BODY THEREOF ARSA, ASIC1, TST CYP2C19 1690/4885CYP1A2 2434/4885CYP2C9 1193/4885
US-20260042294-A1 INK-JET RECORDING HEAD SEM1, ASIC1, C9 CYP2C19 2738/4885CYP1A2 3560/4885CYP2C9 2002/4885
US-20070225458-A1 Novel Fluorinated Alkyl Fluorophosphoric Acid Salts of Onium and Ttransition Metal Complex AS3MT, TTR, PFAS CYP2C19 4807/4885CYP1A2 4455/4885CYP2C9 4494/4885
US-20260042918-A1 PHOTOSENSITIVE RESIN COMPOSITION, LIQUID-REPELLENT ANTI-FOULING FILM, AND INKJET RECORDING HEAD MLLT1, MLLT3, ERCC1 CYP2C19 2198/4885CYP1A2 1154/4885CYP2C9 1292/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.