Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | IDO1 | P14902 | 9/20 | 0.43 |
| ▸ | LDHA | P00338 | 1/20 | 0.40 |
| ▸ | CTSB | P07858 | 1/20 | 0.39 |
| ▸ | EP300 | Q09472 | 4/20 | 0.36 |
| ▸ | KAT2B | Q92831 | 4/20 | 0.36 |
| ▸ | KAT8 | Q9H7Z6 | 4/20 | 0.36 |
| ▸ | HDAC3 | O15379 | 1/20 | 0.36 |
| ▸ | NCOR2 | Q9Y618 | 1/20 | 0.36 |
| ▸ | PSD | A5PKW4 | 1/20 | 0.35 |
| ▸ | PTPN22 | Q9Y2R2 | 1/20 | 0.32 |
| ▸ | GAA | P10253 | 2/20 | 0.32 |
| ▸ | MEN1 | O00255 | 1/20 | 0.32 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.32 |
| ▸ | MITF | O75030 | 1/20 | 0.32 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.32 |
| ▸ | LMNA | P02545 | 1/20 | 0.32 |
| ▸ | TP53 | P04637 | 1/20 | 0.32 |
| ▸ | MAPT | P10636 | 1/20 | 0.32 |
| ▸ | THRB | P10828 | 1/20 | 0.32 |
| ▸ | HPGD | P15428 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL132348 | 0.86 | IDO1 (0.59) | IDO1LDHACTSBEP300KAT2B | |
| SCHEMBL29420748 | 0.86 | IDO1 (0.59) | IDO1LDHACTSBEP300KAT2B | |
| Hydrochloric Acid SCHEMBL4410534 | 0.84 | IDO1 (0.56) | IDO1LDHACTSBEP300KAT2B | |
| SCHEMBL19469373 | 0.83 | MAPT (0.47) | IDO1LDHAGAAMEN1KMT2A | |
| SCHEMBL19469378 | 0.83 | ESR1 (0.33) | ALDH1A1LMNAALOX15HSD17B10 | |
| SCHEMBL1130216 | 0.82 | IDO1 (0.50) | IDO1LDHACTSBEP300KAT2B | |
| Trifluoroacetic Acid SCHEMBL1130145 | 0.81 | IDO1 (0.41) | IDO1LDHACTSBEP300KAT2B | |
| SCHEMBL1130788 | 0.81 | IDO1 (0.41) | IDO1LDHACTSBEP300KAT2B | |
| Trifluoromethanesulfonic Acid SCHEMBL36124 | 0.80 | LDHA (0.44) | IDO1LDHACTSBEP300KAT2B | |
| Trifluoromethanesulfonic Acid SCHEMBL31168271 | 0.80 | LDHA (0.44) | IDO1LDHACTSBEP300KAT2B |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 18 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-10720259-B2 | Electroconductive film and method for manufacturing electroconductive pattern | TOKYO UNIVERSITY OF SCIENCE FOUNDATION (JP) | 2020-07-21 | — | — | US | disclosed |
| US-20170309363-A1 | ELECTROCONDUCTIVE FILM AND METHOD FOR MANUFACTURING ELECTROCONDUCTIVE PATTERN | TOKYO UNIVERSITY OF SCIENCE FOUNDATION (JP) | 2017-10-26 | — | — | US | disclosed |
| EP-1323742-B1 | Radiation sensitive refractive index changing composition and refractive index changing method | JSR CORP (JP) | 2011-02-16 | — | — | EP | disclosed |
| US-7320854-B2 | Mixture of oxide particles, polymerizable compound,radiation sensitive decomposer and releasing agent | JSR CORPORATION (JP) | 2008-01-22 | — | — | US | disclosed |
| US-7205085-B2 | Composition having permitivity being radiation-sensitively changeable and method for forming permitivity pattern | JSR CORPORATION (JP) | 2007-04-17 | — | — | US | disclosed |
| US-7125647-B2 | Radiation-sensitive composition changing in refractive index and utilization thereof | JSR CORPORATION (JP) | 2006-10-24 | — | — | US | disclosed |
| US-7071255-B2 | Radiation-sensitive composition capable of having refractive index distribution | JSR CORPORATION (JP) | 2006-07-04 | — | — | US | disclosed |
| EP-1494072-A2 | Radiation sensitive refractive index changing composition, pattern forming method and optical material | JSR Corporation (JP) | 2005-01-05 | — | — | EP | disclosed |
| US-20040265737-A1 | Radiation sensitive refractive index changing composition, pattern forming method and optical material | JSR CORPORATION (JP) | 2004-12-30 | — | — | US | disclosed |
| US-6787289-B2 | OPTICS | JSR CORPORATION (JP) | 2004-09-07 | — | — | US | disclosed |
| EP-1413924-A1 | COMPOSITION HAVING PERMITIVITY BEING RADIATION-SENSITIVELY CHANGEABLE AND METHOD FOR FORMING PERMITIVITY PATTERN | JSR Corporation (JP) | 2004-04-28 | — | — | EP | disclosed |
| US-20040005506-A1 | Composition having permitivity being radiation-sensitively changeable and method for forming permitivity pattern | JSR CORPORATION (JP) | 2004-01-08 | — | — | US | disclosed |
| EP-1375597-A1 | RADIATION-SENSITIVE COMPOSITION CHANGING IN REFRACTIVE INDEX AND UTILIZATION THEREOF | JSR Corporation (JP) | 2004-01-02 | — | — | EP | disclosed |
| EP-1369459-A1 | RADIATION-SENSITIVE COMPOSITION CAPABLE OF HAVING REFRACTIVE INDEX DISTRIBUTION | JSR Corporation (JP) | 2003-12-10 | — | — | EP | disclosed |
| US-20030187119-A1 | Radiation-sensitive composition capable of having refractive index distribution | JSR CORPORATION (JP) | 2003-10-02 | — | — | US | disclosed |
| US-20030171468-A1 | Radiation-sensitive composition changing in refractive index and utilization thereof | JSR CORPORATION (JP) | 2003-09-11 | — | — | US | disclosed |
| US-20030139486-A1 | Radiation sensitive refractive index changing composition and refractive index changing method | JSR CORPORATION (JP) | 2003-07-24 | — | — | US | disclosed |
| EP-1323742-A2 | Radiation sensitive refractive index changing composition and refractive index changing method | JSR Corporation (JP) | 2003-07-02 | — | — | EP | disclosed |