Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | LDHA | P00338 | 1/20 | 0.44 |
| ▸ | PSD | A5PKW4 | 1/20 | 0.41 |
| ▸ | EP300 | Q09472 | 2/20 | 0.40 |
| ▸ | KAT2B | Q92831 | 2/20 | 0.40 |
| ▸ | KAT8 | Q9H7Z6 | 2/20 | 0.40 |
| ▸ | IDO1 | P14902 | 3/20 | 0.39 |
| ▸ | GPR3 | P46089 | 1/20 | 0.38 |
| ▸ | GAA | P10253 | 4/20 | 0.38 |
| ▸ | MEN1 | O00255 | 4/20 | 0.38 |
| ▸ | KMT2A | Q03164 | 4/20 | 0.38 |
| ▸ | ESR1 | P03372 | 2/20 | 0.38 |
| ▸ | ESR2 | Q92731 | 2/20 | 0.38 |
| ▸ | CDK2 | P24941 | 1/20 | 0.37 |
| ▸ | CTSB | P07858 | 1/20 | 0.36 |
| ▸ | HKDC1 | Q2TB90 | 2/20 | 0.35 |
| ▸ | MITF | O75030 | 1/20 | 0.35 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.35 |
| ▸ | LMNA | P02545 | 1/20 | 0.35 |
| ▸ | TP53 | P04637 | 1/20 | 0.35 |
| ▸ | MAPT | P10636 | 1/20 | 0.35 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Trifluoromethanesulfonic Acid SCHEMBL31168271 | 1.00 | LDHA (0.44) | LDHAPSDEP300KAT2BKAT8 | |
| Trifluoromethanesulfonic Acid SCHEMBL6566331 | 0.92 | MEN1 (0.41) | LDHAPSDEP300KAT2BKAT8 | |
| SCHEMBL1593672 | 0.88 | LDHA (0.39) | LDHAPSDEP300KAT2BKAT8 | |
| Trifluoromethanesulfonic Acid SCHEMBL5827824 | 0.87 | APP (0.42) | LDHAPSDGPR3GAAMEN1 | |
| SCHEMBL271896 | 0.86 | LDHA (0.38) | LDHAPSDEP300KAT2BKAT8 | |
| Trifluoromethanesulfonic Acid SCHEMBL29351989 | 0.85 | APP (0.44) | LDHAPSDGPR3GAAMEN1 | |
| SCHEMBL3120012 | 0.85 | LDHA (0.37) | LDHAPSDEP300KAT2BKAT8 | |
| Trifluoromethanesulfonic Acid SCHEMBL2516940 | 0.84 | MEN1 (0.39) | LDHAPSDEP300KAT2BKAT8 | |
| Trifluoromethanesulfonic Acid SCHEMBL3287537 | 0.84 | PTGS1 (0.37) | LDHAPSDGAAMEN1KMT2A | |
| Trifluoromethanesulfonic Acid SCHEMBL29353026 | 0.84 | PTGS1 (0.37) | LDHAPSDGAAMEN1KMT2A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 770 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-114779577-A | Cyclodextrin inclusion compound molecular glass photoresist | 南通林格橡塑制品有限公司 | 2022-07-22 | — | — | CN | claimed |
| CN-114442429-A | Molecular glass photoresist of metallocene compound and preparation method thereof | 南通林格橡塑制品有限公司 | 2022-05-06 | — | — | CN | claimed |
| WO-2005057285-A1 | THERMAL CURABLE ONE-LIQUID TYPE EPOXY RESIN COMPOSITION FOR OVER-COAT | SAMYANGEMS CO., LTD. (KR) | 2005-06-23 | — | — | WO | claimed |
| CN-121873631-B | Spin-on carbon composition, semiconductor preparation method and semiconductor device | Jiageng Innovation Laboratory (CN) | 2026-05-26 | — | — | CN | disclosed |
| CN-122011922-A | Bottom anti-reflection coating composition and preparation and application thereof | 嘉庚创新实验室 | 2026-05-12 | — | — | CN | disclosed |
| EP-4714988-A1 | FLUORINE-CONTAINING POLYMER, COMPOSITION FOR FORMING FLUORINE-CONTAINING RESIN FILM, FLUORINE-CONTAINING RESIN FILM, COMPOSITION FOR FORMING RESIST PATTERN, METHOD FOR FORMING RESIST PATTERN, COMPOSITION FOR FORMING RESIST UPPER LAYER FILM, METHOD FOR DECOMPOSING FLUORINE-CONTAINING POLYMER, FLUORINE-CONTAINING POLYMERIZABLE MONOMER, COMPOUND, AND METHOD FOR PRODUCING FLUORINE-CONTAINING POLYMERIZABLE MONOMER | Central Glass Company, Limited (JP) | 2026-03-25 | — | — | EP | disclosed |
| EP-4714990-A1 | COPOLYMER, POLYMER FOR WATER-REPELLENT AGENT, COMPOSITION FOR FORMING WATER-REPELLENT FILM, RESIN FILM, AND METHOD FOR FORMING RESIST PATTERN | Central Glass Company, Limited (JP) | 2026-03-25 | — | — | EP | disclosed |
| WO-2024248136-A1 | COPOLYMER, POLYMER FOR WATER-REPELLENT AGENT, COMPOSITION FOR FORMING WATER-REPELLENT FILM, RESIN FILM, AND METHOD FOR FORMING RESIST PATTERN | セントラル硝子株式会社 | 2024-12-05 | — | — | WO | disclosed |
| WO-2024248135-A1 | FLUORINE-CONTAINING POLYMER, COMPOSITION FOR FORMING FLUORINE-CONTAINING RESIN FILM, FLUORINE-CONTAINING RESIN FILM, COMPOSITION FOR FORMING RESIST PATTERN, METHOD FOR FORMING RESIST PATTERN, COMPOSITION FOR FORMING RESIST UPPER LAYER FILM, METHOD FOR DECOMPOSING FLUORINE-CONTAINING POLYMER, FLUORINE-CONTAINING POLYMERIZABLE MONOMER, COMPOUND, AND METHOD FOR PRODUCING FLUORINE-CONTAINING POLYMERIZABLE MONOMER | セントラル硝子株式会社 | 2024-12-05 | — | — | WO | disclosed |
| US-20240206290-A1 | DISPLAY PANEL AND MANUFACTURING METHOD THEREOF | SAMSUNG DISPLAY CO., LTD. (KR) | 2024-06-20 | — | — | US | disclosed |
| CN-118201424-A | Display panel and manufacturing method of display panel | 三星显示有限公司 | 2024-06-14 | — | — | CN | disclosed |
| US-6159655-A | Positive photoresist composition for exposure to far ultraviolet light | FUJI PHOTO FILM CO., LTD. (JP) | 2000-12-12 | — | — | US | disclosed |
| EP-1048983-A1 | Radiation sensitive resin composition | JSR Corporation (JP) | 2000-11-02 | — | — | EP | disclosed |
| EP-1045290-A2 | Composition for resist underlayer film and method for producing the same | JSR Corporation (JP) | 2000-10-18 | — | — | EP | disclosed |
| EP-0982628-A2 | A chemical amplifying type positive resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2000-03-01 | — | — | EP | disclosed |
| EP-0930541-A1 | Radiation sensitive resin composition | JSR Corporation (JP) | 1999-07-21 | — | — | EP | disclosed |
| EP-0917000-A2 | Positive resist composition and method for forming a resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1999-05-19 | — | — | EP | disclosed |
| EP-0856773-A1 | Chemical amplification type positive resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1998-08-05 | — | — | EP | disclosed |
| EP-0849634-A1 | Radiation sensitive resin composition | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1998-06-24 | — | — | EP | disclosed |
| EP-0789278-A2 | Radiation-sensitive resin composition | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1997-08-13 | — | — | EP | disclosed |