Predicted protein targets (top 15)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MAPT | P10636 | 7/20 | 0.55 |
| ▸ | LMNA | P02545 | 5/20 | 0.48 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.48 |
| ▸ | KMT2A | Q03164 | 4/20 | 0.45 |
| ▸ | MEN1 | O00255 | 3/20 | 0.45 |
| ▸ | RECQL | P46063 | 2/20 | 0.45 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.45 |
| ▸ | NPC1 | O15118 | 3/20 | 0.40 |
| ▸ | RAB9A | P51151 | 3/20 | 0.40 |
| ▸ | GAA | P10253 | 1/20 | 0.40 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.40 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.40 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.38 |
| ▸ | TRPV4 | Q9HBA0 | 1/20 | 0.38 |
| ▸ | PTGS2 | P35354 | 1/20 | 0.38 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL31432402 | 0.86 | TRPV4 (0.54) | MAPTLMNAALDH1A1KMT2AMEN1 | |
| SCHEMBL16957628 | 0.86 | MAPT (0.53) | MAPTLMNAALDH1A1KMT2AMEN1 | |
| SCHEMBL2725343 | 0.82 | ALDH1A1 (0.53) | MAPTLMNAALDH1A1KMT2AMAPK1 | |
| SCHEMBL5068190 | 0.79 | MAPT (0.58) | MAPTLMNAALDH1A1KMT2AMEN1 | |
| SCHEMBL11058768 | 0.79 | MAPT (0.58) | MAPTLMNAALDH1A1KMT2AMEN1 | |
| SCHEMBL2119451 | 0.78 | TRPV4 (0.45) | MAPTLMNAALDH1A1KMT2AMEN1 | |
| Potassium Ion SCHEMBL10540930 | 0.78 | MAPT (0.57) | MAPTLMNAALDH1A1KMT2AMEN1 | |
| SCHEMBL309636 | 0.78 | MAPT (0.57) | MAPTLMNAALDH1A1KMT2AMEN1 | |
| SCHEMBL316689 | 0.78 | MAPT (0.57) | MAPTLMNAALDH1A1KMT2AMEN1 | |
| SCHEMBL310522 | 0.78 | MAPT (0.57) | MAPTLMNAALDH1A1KMT2AMEN1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-0006626-B1 | RADIATION-SENSITIVE MIXTURE AND PROCESS FOR PRODUCING RELIEF IMAGES | HOECHST AKTIENGESELLSCHAFT (DE) | 1982-12-15 | — | — | EP | disclosed |
| US-4250247-A | COMPRISING AN ACID-FORMING COMPOUND AND A COMPOUND HAVING AS AN ACID-CLEAVABLE GROUP AN N-ACYLIMINOCARBONATE; RELIEF IMAGES; OFFSET PRINTING | HOECHST AKTIENGESELLSCHAFT (DE) | 1981-02-10 | — | — | US | disclosed |
| EP-0006626-A2 | Radiation-sensitive mixture and process for producing relief images | HOECHST AKTIENGESELLSCHAFT (DE) | 1980-01-09 | — | — | EP | disclosed |