SCHEMBL11322368

SCHEMBL11322368

FC(F)(F)[n+]1ccccc1

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Bromide SCHEMBL29205001 0.94
SCHEMBL2329383 0.80
Trifluoroacetic Acid SCHEMBL3552335 0.80 HDAC3 (0.33)
SCHEMBL2330239 0.69
SCHEMBL2328276 0.67 LMNA (0.33)
SCHEMBL2323753 0.66 LMNA (0.38)
SCHEMBL319735 0.64 KMT2A (0.32)
SCHEMBL29171515 0.62 KMT2A (0.31)
Lithium Ion SCHEMBL30397728 0.62 KMT2A (0.31)
Hydrochloric Acid SCHEMBL29080220 0.62 KMT2A (0.31)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 24 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-119350984-A Acrylic ester modified polyurethane hot melt adhesive and preparation method and application thereof 韦尔通科技股份有限公司 2025-01-24 CN claimed
CN-119351032-A Electrically detachable single-component polyurethane hot melt adhesive and preparation method and application thereof 韦尔通科技股份有限公司 2025-01-24 CN claimed
US-4086423-A CEPHALOSPORINS, CYCLOADDITION OF GLYCINE DERIVATIVE TO THIAZINE COMPOUND MERCK & CO., INC. (US) 1978-04-25 US claimed
US-20260118765-A1 RESIST UNDERLAYER FILM FORMING COMPOSITION NISSAN CHEMICAL CORPORATION (JP) 2026-04-30 US disclosed
US-12601972-B2 Resist underlayer film-forming composition with suppressed degeneration of crosslinking agent NISSAN CHEMICAL CORPORATION (JP) 2026-04-14 US disclosed
US-20250004367-A1 RESIST UNDERLAYER FILM-FORMING COMPOSITION NISSAN CHEMICAL CORPORATION (JP) 2025-01-02 US disclosed
CN-119039226-A Method for synthesizing fluorine-containing methyl pyrazole carboxylic ester 中蓝晨光化工研究设计院有限公司 2024-11-29 CN disclosed
CN-117440991-A Polysiloxane composition 默克专利有限公司 2024-01-23 CN disclosed
CN-113785005-B Curing composition 美国圣戈班性能塑料公司 2023-12-12 CN disclosed
WO-2023189803-A1 RESIST UNDERLAYER FILM FORMING COMPOSITION 日産化学株式会社 2023-10-05 WO disclosed
US-20230131253-A1 RESIST UNDERLAYER FILM-FORMING COMPOSITION WITH SUPPRESSED DEGENERATION OF CROSSLINKING AGENT NISSAN CHEMICAL CORPORATION (JP) 2023-04-27 US disclosed
US-11241014-B2 Antimicrobial coatings and methods of making and using thereof GEORGIA TECH RESEARCH CORPORATION (US) 2022-02-08 US disclosed
US-7649118-B2 Process for preparing fluorine-containing norbornene derivative DAIKIN INDUSTRIES, LTD. (JP) 2010-01-19 US disclosed
US-7649118-B2 Process for preparing fluorine-containing norbornene derivative DAIKIN INDUSTRIES, LTD. (JP) 2010-01-19 US disclosed
US-20070129576-A1 Process for preparing fluorine-containing norbornene derivative DAIKIN INDUSTRIES, LTD. 2007-06-07 US disclosed
US-20070129576-A1 Process for preparing fluorine-containing norbornene derivative DAIKIN INDUSTRIES, LTD. 2007-06-07 US disclosed
US-7186773-B2 Process for preparing fluorine-containing norbornene derivative DAIKIN INDUSTRIES, LTD. (JP) 2007-03-06 US disclosed
US-7186773-B2 Process for preparing fluorine-containing norbornene derivative DAIKIN INDUSTRIES, LTD. (JP) 2007-03-06 US disclosed
US-4269773-A CEPHALOSPORINS SHIONOGI & CO., LTD. (JP) 1981-05-26 US disclosed
US-4159984-A METAL AND PROTON DONOR SHIONOGI & CO., LTD. (JP) 1979-07-03 US disclosed