SCHEMBL11355384

SCHEMBL11355384

NC(=O)C=Cc1cc(Cl)c(Cl)cc1Cl

nearest known ligand 0.42

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 2/20 0.42
MAPT P10636 2/20 0.42
KDM4E B2RXH2 1/20 0.42
GAA P10253 1/20 0.42
L3MBTL1 Q9Y468 1/20 0.42
BACE1 P56817 2/20 0.41
PELI1 Q96FA3 2/20 0.40
CCNC P24863 1/20 0.40
CDK8 P49336 1/20 0.40
MAOB P27338 1/20 0.37
PTPN1 P18031 2/20 0.37
PTGER1 P34995 1/20 0.36
PTGER3 P43115 1/20 0.36
PTGER2 P43116 1/20 0.36
NPC1 O15118 1/20 0.36
POLB P06746 1/20 0.36
RAB9A P51151 1/20 0.36
SMN1; SMN2 Q16637 1/20 0.36
HDAC1 Q13547 1/20 0.34
HDAC8 Q9BY41 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL28200281 0.81 PTGER3 (0.51) ALDH1A1MAPTKDM4EGAAL3MBTL1
SCHEMBL30560948 0.79 MAPT (0.50) ALDH1A1MAPTKDM4EGAAL3MBTL1
SCHEMBL24530076 0.79 MAPT (0.68) ALDH1A1MAPTKDM4EGAAL3MBTL1
SCHEMBL8709511 0.79 MAPT (0.68) ALDH1A1MAPTKDM4EGAAL3MBTL1
SCHEMBL8148561 0.76 MAPT (0.47) ALDH1A1MAPTKDM4EGAAL3MBTL1
SCHEMBL8148557 0.76 MAPT (0.47) ALDH1A1MAPTKDM4EGAAL3MBTL1
SCHEMBL30560952 0.73 HDAC1 (0.62) ALDH1A1MAPTKDM4EL3MBTL1MAOB
SCHEMBL8002124 0.73 HDAC1 (0.62) ALDH1A1MAPTKDM4EL3MBTL1MAOB
SCHEMBL8002126 0.73 HDAC1 (0.62) ALDH1A1MAPTKDM4EL3MBTL1MAOB
SCHEMBL11358215 0.73 DPP4 (0.62) ALDH1A1MAPTKDM4EGAA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0001997-B1 ELECTRON BEAM-CURABLE PHOTORESIST LACQUERS BAYER AG (DE) 1981-02-11 EP disclosed
EP-0001997-A1 Electron beam-curable photoresist lacquers BAYER AG (DE) 1979-05-30 EP disclosed