SCHEMBL11364641

SCHEMBL11364641

CC(C)(C)NC(=O)c1cc(NC(=O)C(C)(C)C)cc(C(=O)NC(C)(C)C)c1

nearest known ligand 0.67

Predicted protein targets (top 9)

geneUniProtsupporting neighboursconfidence
MEN1 O00255 3/20 0.53
KMT2A Q03164 3/20 0.53
L3MBTL1 Q9Y468 1/20 0.52
GAA P10253 1/20 0.51
NPSR1 Q6W5P4 1/20 0.51
LMNA P02545 4/20 0.51
MAPT P10636 3/20 0.51
ANO1 Q5XXA6 1/20 0.42
ALDH1A1 P00352 1/20 0.42

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1948517 0.96 MEN1 (0.56) MEN1KMT2AL3MBTL1GAANPSR1
SCHEMBL13178768 0.85 LMNA (0.49) MEN1KMT2AL3MBTL1GAANPSR1
SCHEMBL3083596 0.83 NPSR1 (0.71) MEN1KMT2AGAANPSR1LMNA
SCHEMBL15180428 0.83 GAA (0.47) MEN1KMT2AGAANPSR1LMNA
SCHEMBL570284 0.82 MEN1 (0.49) MEN1KMT2AGAALMNAMAPT
SCHEMBL13139952 0.82 POLB (0.54) MEN1KMT2AL3MBTL1GAANPSR1
SCHEMBL20992041 0.82 L3MBTL1 (0.68) MEN1KMT2AL3MBTL1NPSR1LMNA
SCHEMBL1948578 0.80 KMT2A (0.51) MEN1KMT2ALMNAMAPTANO1
SCHEMBL1946584 0.80 MEN1 (0.51) MEN1KMT2AL3MBTL1GAANPSR1
SCHEMBL5506280 0.80 LMNA (0.60) MEN1KMT2AGAALMNAMAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 12 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1592738-B1 RESIN COMPOSITIONS CIBA HOLDING INC (CH) 2020-07-29 EP disclosed
US-8415416-B2 Electret materials BASF SE (DE) 2013-04-09 US disclosed
US-20130012091-A1 Electret Materials BASF SE (DE) 2013-01-10 US disclosed
US-20120184170-A1 Electret Materials CHIN HUI (US) 2012-07-19 US disclosed
US-20110230109-A1 Electret Materials CHIN HUI 2011-09-22 US disclosed
US-7790793-B2 Amide nucleating agent compositions CIBA SPECIALTY CHEM. CORP. (US) 2010-09-07 US disclosed
US-7790793-B2 Amide nucleating agent compositions CIBA SPECIALTY CHEM. CORP. (US) 2010-09-07 US disclosed
WO-2008122525-A1 ELECTRET MATERIALS BASF SE (CH) 2008-10-16 WO disclosed
US-20080249269-A1 Electret materials CIBA CORP. 2008-10-09 US disclosed
US-20080249269-A1 Electret materials CIBA CORP. 2008-10-09 US disclosed
US-20070149663-A1 Resin compositions CIBA SPECIALTY CHEMICALS CORP. 2007-06-28 US disclosed
US-20070149663-A1 Resin compositions CIBA SPECIALTY CHEMICALS CORP. 2007-06-28 US disclosed