SCHEMBL1142259

SCHEMBL1142259

O=C([O-])C(CCO)CCO.O=C([O-])C(CCO)CCO.[Pd+2]

nearest known ligand 0.55

Predicted protein targets (top 9)

geneUniProtsupporting neighboursconfidence
CYP3A4 P08684 2/20 0.55
TSHR P16473 2/20 0.55
NFKB1 P19838 2/20 0.55
NPSR1 Q6W5P4 2/20 0.55
CA2 P00918 2/20 0.43
CA4 P22748 2/20 0.32
CA1 P00915 3/20 0.31
LMNA P02545 1/20 0.31
THRB P10828 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Lithium Ion SCHEMBL5144792 0.83 CYP3A4 (0.44) CYP3A4TSHRNFKB1NPSR1CA2
SCHEMBL2782576 0.83 CYP3A4 (0.48) CYP3A4TSHRNFKB1NPSR1CA2
Potassium Ion SCHEMBL2701666 0.83 CYP3A4 (0.44) CYP3A4TSHRNFKB1NPSR1CA2
SCHEMBL5142316 0.83 CYP3A4 (0.44) CYP3A4TSHRNFKB1NPSR1CA2
SCHEMBL9620244 0.76 CA2 (0.75) CYP3A4TSHRNFKB1NPSR1CA2
Zinc Ion SCHEMBL14739642 0.76 CA2 (0.75) CYP3A4TSHRNFKB1NPSR1CA2
SCHEMBL17061402 0.71 NFKB1 (0.78) CYP3A4TSHRNFKB1NPSR1CA2
SCHEMBL6928955 0.69 CYP3A4 (0.46) CYP3A4TSHRNFKB1NPSR1CA2
SCHEMBL3893901 0.69 CHRM1 (0.55) CA2
SCHEMBL28598227 0.69 CYP3A4 (0.50) CYP3A4TSHRNFKB1NPSR1CA2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7884537-B2 Pattern substrate including conductive pattern of overlapping circular patterns disposed on substrate RICOH COMPANY, LTD. (JP) 2011-02-08 US disclosed
US-20080138570-A1 ELECTRON-EMITTING DEVICE AND IMAGE DISPLAY APPARATUS USING THE SAME SEKIYA TAKURO 2008-06-12 US disclosed
US-7355335-B2 Electron-emitting device and image display apparatus using the same RICOH COMPANY, LTD. (JP) 2008-04-08 US disclosed
EP-0936652-B1 Film formation method, method for fabricating electron emitting element employing the same film, and method for manufacturing image forming apparatus employing the same element CANON KK (JP) 2006-12-13 EP disclosed
US-20060028118-A1 Electron-emitting device and image display apparatus using the same SEKIYA TAKURO 2006-02-09 US disclosed
US-6992433-B2 Electron-emitting device and image display apparatus using the same RICOH COMPANY, LTD. (JP) 2006-01-31 US disclosed
US-20050202583-A1 Antistatic film forming composition, and producing method for conductive film pattern, electron source and image display apparatus CANON KABUSHIKI KAISHA (JP) 2005-09-15 US disclosed
US-6815001-B1 Electronic device, method for producing electron source and image forming device, and apparatus for producing electronic device CANON KABUSHIKI KAISHA (JP) 2004-11-09 US disclosed
US-6579139-B1 Film formation method, method for fabricating electron emitting element employing the same film, and method for manufacturing image forming apparatus employing the same element CANON KABUSHIKI KAISHA (JP) 2003-06-17 US disclosed
US-20010024227-A1 Electron-emitting device and image display apparatus using the same RICOH COMPANY, LTD. 2001-09-27 US disclosed
EP-0936652-A1 Film formation method, method for fabricating electron emitting element employing the same film, and method for manufacturing image forming apparatus employing the same element CANON KABUSHIKI KAISHA (JP) 1999-08-18 EP disclosed