SCHEMBL114518

SCHEMBL114518

CC(C)S(=O)(=O)O.O=C1CC(O)C(=O)N1

nearest known ligand 0.36

Predicted protein targets (top 3)

geneUniProtsupporting neighboursconfidence
MAP3K14 Q99558 1/20 0.36
GLA P06280 1/20 0.35
CRBN Q96SW2 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1028532 0.86 MAP3K14 (0.40) MAP3K14CRBN
Sulfuric Acid SCHEMBL4970729 0.86 MAP3K14 (0.43) MAP3K14CRBN
SCHEMBL114368 0.83 MAP3K14 (0.38) MAP3K14CRBN
Ethane SCHEMBL28857929 0.82 MAP3K14 (0.46) MAP3K14GLACRBN
SCHEMBL11288 0.82
SCHEMBL15494454 0.82
Ammonia Solution, Strong SCHEMBL25176856 0.80
Phosphine SCHEMBL22345181 0.80
Hydrochloric Acid SCHEMBL3986242 0.80
SCHEMBL31244467 0.80

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-108008600-A Radiation-ray sensitive composition 三菱瓦斯化学株式会社 2018-05-08 CN disclosed
CN-104981463-B Compound, lower layer film for lithography form material, lower layer film for lithography and pattern formation method 三菱瓦斯化学株式会社 2018-04-13 CN disclosed
CN-103733136-B Underlayer film forming material for lithography, underlayer film for lithography, and pattern forming method 三菱瓦斯化学株式会社 2017-06-23 CN disclosed
EP-2424947-A1 COMPOSITIONS AND METHODS INCORPORATING PHOTOCATALYSTS The Procter & Gamble Company (US) 2012-03-07 EP disclosed
EP-2273968-A1 COMPOSITIONS AND METHODS INCORPORATING PHOTOCATALYSTS THE PROCTER & GAMBLE COMPANY (US) 2011-01-19 EP disclosed
WO-2010126919-A1 COMPOSITIONS AND METHODS INCORPORATING PHOTOCATALYSTS THE PROCTER & GAMBLE COMPANY (US) 2010-11-04 WO disclosed
WO-2009140076-A1 COMPOSITIONS AND METHODS INCORPORATING PHOTOCATALYSTS THE PROCTER & GAMBLE COMPANY (US) 2009-11-19 WO disclosed