Known targets — ChEMBL curated mechanism
FGFR1FGFR2FGFR3FGFR4FLT1FLT4KDRPDGFRAPDGFRB
The experimentally established mechanism targets of None. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Predicted protein targets (top 10)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MAP3K14 | Q99558 | 1/20 | 0.38 |
| ▸ | CRBN | Q96SW2 | 2/20 | 0.35 |
| ▸ | NPC1 | O15118 | 1/20 | 0.34 |
| ▸ | DDB1 | Q16531 | 1/20 | 0.33 |
| ▸ | BRD4 | O60885 | 1/20 | 0.31 |
| ▸ | CREBBP | Q92793 | 1/20 | 0.31 |
| ▸ | MEN1 | O00255 | 1/20 | 0.31 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.31 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.31 |
| ▸ | CYP19A1 | P11511 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL17065485 | 0.90 | MEN1 (0.35) | MAP3K14CRBNNPC1DDB1MEN1 | |
| SCHEMBL1028532 | 0.88 | MAP3K14 (0.40) | MAP3K14CRBNMEN1KMT2ACYP19A1 | |
| Sulfuric Acid SCHEMBL4970729 | 0.88 | MAP3K14 (0.43) | MAP3K14CRBNMEN1KMT2ACYP19A1 | |
| SCHEMBL2573073 | 0.85 | NPC1 (0.38) | CRBNNPC1ALDH1A1 | |
| SCHEMBL112503 | 0.84 | ALDH1A1 (0.38) | NPC1ALDH1A1 | |
| Ethane SCHEMBL28857929 | 0.83 | MAP3K14 (0.46) | MAP3K14CRBNNPC1BRD4CREBBP | |
| SCHEMBL15494454 | 0.83 | — | — | |
| SCHEMBL114518 | 0.83 | MAP3K14 (0.36) | MAP3K14CRBN | |
| SCHEMBL17065493 | 0.82 | MAP3K14 (0.33) | MAP3K14 | |
| Ammonia Solution, Strong SCHEMBL25176856 | 0.81 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-108008600-A | Radiation-ray sensitive composition | 三菱瓦斯化学株式会社 | 2018-05-08 | — | — | CN | disclosed |
| CN-103733136-B | Underlayer film forming material for lithography, underlayer film for lithography, and pattern forming method | 三菱瓦斯化学株式会社 | 2017-06-23 | — | — | CN | disclosed |
| EP-2424947-A1 | COMPOSITIONS AND METHODS INCORPORATING PHOTOCATALYSTS | The Procter & Gamble Company (US) | 2012-03-07 | — | — | EP | disclosed |
| EP-2384457-A2 | COATING COMPOSITIONS | AZ Electronic Materials USA Corp. (US) | 2011-11-09 | — | — | EP | disclosed |
| EP-2273968-A1 | COMPOSITIONS AND METHODS INCORPORATING PHOTOCATALYSTS | THE PROCTER & GAMBLE COMPANY (US) | 2011-01-19 | — | — | EP | disclosed |
| WO-2010126919-A1 | COMPOSITIONS AND METHODS INCORPORATING PHOTOCATALYSTS | THE PROCTER & GAMBLE COMPANY (US) | 2010-11-04 | — | — | WO | disclosed |
| WO-2010055406-A2 | COATING COMPOSITIONS | AZ ELECTRONIC MATERIALS USA CORP. (US) | 2010-05-20 | — | — | WO | disclosed |
| WO-2009140076-A1 | COMPOSITIONS AND METHODS INCORPORATING PHOTOCATALYSTS | THE PROCTER & GAMBLE COMPANY (US) | 2009-11-19 | — | — | WO | disclosed |