SCHEMBL1145280

SCHEMBL1145280

CCC(C(=O)O)=C(Oc1ccccc1)c1ccccc1

nearest known ligand 0.50

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
ELANE P08246 6/20 0.50
CES2 O00748 1/20 0.43
CES1 P23141 1/20 0.43
SMN1; SMN2 Q16637 3/20 0.40
NPC1 O15118 2/20 0.40
ALDH1A1 P00352 2/20 0.40
RAB9A P51151 2/20 0.40
LMNA P02545 1/20 0.40
KMT2A Q03164 3/20 0.39
MAPT P10636 2/20 0.39
TDP1 Q9NUW8 1/20 0.39
L3MBTL1 Q9Y468 1/20 0.39
PKM P14618 1/20 0.39
HPGD P15428 1/20 0.39
CYP1A2 P05177 1/20 0.39
ESR1 P03372 1/20 0.39
RECQL P46063 1/20 0.39
HIF1A Q16665 1/20 0.39
PTGS2 P35354 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6204941 1.00 ELANE (0.50) ELANECES2CES1SMN1; SMN2NPC1
SCHEMBL6206192 1.00 ELANE (0.50) ELANECES2CES1SMN1; SMN2NPC1
SCHEMBL9565752 0.81 KMT2A (0.47) CES2CES1SMN1; SMN2NPC1ALDH1A1
SCHEMBL3929746 0.80 ELANE (0.46) ELANECES2CES1SMN1; SMN2NPC1
SCHEMBL372385 0.79 ELANE (0.45) ELANESMN1; SMN2NPC1ALDH1A1RAB9A
SCHEMBL9309718 0.78 ELANE (0.47) ELANECES2CES1SMN1; SMN2NPC1
SCHEMBL5698374 0.77 CES1 (0.52) ELANECES2CES1SMN1; SMN2NPC1
SCHEMBL11312420 0.77 CES2 (0.41) ELANECES2CES1SMN1; SMN2NPC1
SCHEMBL6204752 0.77 ELANE (0.52) ELANECES2CES1ALDH1A1KMT2A
SCHEMBL9562937 0.77 ELANE (0.52) ELANECES2CES1ALDH1A1KMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2177956-B1 COMPOSITION FOR HOLOGRAPHIC RECORDING MEDIUM KYOEISHA CHEMICAL CO LTD (JP) 2013-10-16 EP disclosed
US-8383295-B2 Composition for holographic recording medium KYOEISHA CHEMICAL CO., LTD. (JP) 2013-02-26 US disclosed
US-20110028641-A1 Radiation Curable Compositions CYTEC SURFACE SPECIALTIES, S.A. (BE) 2011-02-03 US disclosed
US-20100128589-A1 COMPOSITION FOR HOLOGRAPHIC RECORDING MEDIUM KYOEISHA CHEMICAL CO., LTD. (JP) 2010-05-27 US disclosed
EP-2177956-A1 COMPOSITION FOR HOLOGRAPHIC RECORDING MEDIUM Kyoeisha Chemical Co., Ltd. (JP) 2010-04-21 EP disclosed