SCHEMBL114632

SCHEMBL114632

Cc1cccc(C(C)C)c1NCNc1c(C)cccc1C(C)C

nearest known ligand 0.49

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MAPK1 P28482 1/20 0.49
NLRP3 Q96P20 3/20 0.47
KMT2A Q03164 4/20 0.43
MEN1 O00255 3/20 0.43
SMN1; SMN2 Q16637 1/20 0.43
GABRA1 P14867 2/20 0.41
GABRG2 P18507 2/20 0.41
GABRB3 P28472 2/20 0.41
LMNA P02545 3/20 0.40
FAAH O00519 1/20 0.40
CA1 P00915 1/20 0.40
CA2 P00918 1/20 0.40
CYP1A2 P05177 1/20 0.40
CYP3A4 P08684 1/20 0.40
HPGD P15428 1/20 0.40
TSHR P16473 1/20 0.40
GABRB1 P18505 1/20 0.40
PTGS1 P23219 1/20 0.40
SLC6A2 P23975 1/20 0.40
HTR2C P28335 1/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29464080 1.00 MAPK1 (0.49) MAPK1NLRP3KMT2AMEN1SMN1; SMN2
SCHEMBL5839727 0.88 MAPK1 (0.49) MAPK1NLRP3KMT2AMEN1SMN1; SMN2
SCHEMBL113047 0.87 SMN1; SMN2 (0.48) MAPK1NLRP3KMT2AMEN1SMN1; SMN2
SCHEMBL12852058 0.86 MAPK1 (0.51) MAPK1NLRP3KMT2AMEN1SMN1; SMN2
SCHEMBL5839812 0.85 MAPK1 (0.47) MAPK1NLRP3KMT2AMEN1SMN1; SMN2
SCHEMBL5838002 0.83 NLRP3 (0.47) MAPK1NLRP3KMT2AMEN1SMN1; SMN2
SCHEMBL1259718 0.80 MAPT (0.42) MAPK1KMT2AMEN1LMNACA1
SCHEMBL5082721 0.79 MAPK1 (0.47) MAPK1NLRP3KMT2AMEN1SMN1; SMN2
SCHEMBL2925868 0.79 MAPK1 (0.47) MAPK1NLRP3KMT2AMEN1SMN1; SMN2
Hydrochloric Acid SCHEMBL2866658 0.78 MAPK1 (0.46) MAPK1NLRP3KMT2AMEN1SMN1; SMN2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 81 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11535686-B2 Tough, high temperature polymers produced by stereolithography CARBON, INC. (US) 2022-12-27 US claimed
EP-3441411-B1 POLYURETHANE SYSTEM AND ITS USE IN PRINTING TECHNOLOGY RAMPF POLYMER SOLUTIONS GMBH & CO KG (DE) 2022-02-09 EP claimed
EP-3441411-A1 POLYURETHANE SYSTEM AND ITS USE IN PRINTING TECHNOLOGY RAMPF Holding GmbH & Co. KG (DE) 2019-02-13 EP claimed
EP-3441410-A1 POLYURETHANE SYSTEM AND ITS USE IN PRINTING TECHNOLOGY RAMPF Holding GmbH & Co. KG (DE) 2019-02-13 EP claimed
US-8779036-B2 Catalysis of epoxy resin formulations EVONIK DEGUSSA GMBH (DE) 2014-07-15 US claimed
EP-2456804-A1 CATALYSIS OF EPOXY RESIN FORMULATIONS HAVING SPARINGLY SOLUBLE CATALYSTS Evonik Degussa GmbH (DE) 2012-05-30 EP claimed
US-20120115988-A1 CATALYSIS OF EPOXY RESIN FORMULATIONS HAVING SPARINGLY SOLUBLE CATALYSTS EVONIK DEGUSSA GMBH (DE) 2012-05-10 US claimed
EP-2424916-A1 CATALYSIS OF EPOXY RESIN FORMULATIONS Evonik Degussa GmbH (DE) 2012-03-07 EP claimed
US-20120041101-A1 CATALYSIS OF EPOXY RESIN FORMULATIONS EVONIK DEGUSSA GMBH (DE) 2012-02-16 US claimed
WO-2011009648-A1 CATALYSIS OF EPOXY RESIN FORMULATIONS HAVING SPARINGLY SOLUBLE CATALYSTS EVONIK DEGUSSA GMBH (DE) 2011-01-27 WO claimed
WO-2010124901-A1 CATALYSIS OF EPOXY RESIN FORMULATIONS EVONIK DEGUSSA GMBH (DE) 2010-11-04 WO claimed
CN-121575594-A Urethane adhesive cord treatment and tape for electric power transmission tape 盖茨公司 2026-02-27 CN disclosed
CN-118234975-A Polyurethane tapes with improved hydrolysis resistance 盖茨公司 2024-06-21 CN disclosed
US-11834574-B2 Dual cure additive manufacturing resins for production of flame retardant objects CARBON, INC. (US) 2023-12-05 US disclosed
US-11833744-B2 Dual precursor resin systems for additive manufacturing with dual cure resins CARBON, INC. (US) 2023-12-05 US disclosed
EP-0996655-B1 THIXOTROPIC TWO-COMPONENT POLYURETHANE SYSTEMS SIKA GMBH (DE) 2003-08-06 EP disclosed
WO-2003044070-A1 HIGH IMPACT POLY(URETHANE UREA) POLYSULFIDES PPG INDUSTRIES OHIO, INC. (US) 2003-05-30 WO disclosed
US-6379799-B1 CURABLE EPOXIDE REACTION PRODUCT OF PHENOL, DICYCLOPENTADIENE AND EPICHLOROHYDRIN; HEAT RESISTANCE, WATERPROOFING; AEROSPACE CYTEC TECHNOLOGY CORP. 2002-04-30 US disclosed
EP-0996655-A1 THIXOTROPIC TWO-COMPONENT POLYURETHANE SYSTEMS Sika Chemie GmbH (DE) 2000-05-03 EP disclosed
WO-1999002578-A1 THIXOTROPIC TWO-COMPONENT POLYURETHANE SYSTEMS SIKA CHEMIE GMBH (DE) 1999-01-21 WO disclosed