Predicted protein targets (top 18)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | THRB | P10828 | 1/20 | 0.42 |
| ▸ | TSHR | P16473 | 3/20 | 0.38 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.37 |
| ▸ | BTK | Q06187 | 1/20 | 0.35 |
| ▸ | EPHX2 | P34913 | 1/20 | 0.34 |
| ▸ | POLB | P06746 | 1/20 | 0.33 |
| ▸ | APEX1 | P27695 | 1/20 | 0.33 |
| ▸ | HTT | P42858 | 1/20 | 0.33 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.33 |
| ▸ | ANPEP | P15144 | 1/20 | 0.33 |
| ▸ | CA1 | P00915 | 1/20 | 0.32 |
| ▸ | CA2 | P00918 | 1/20 | 0.32 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.31 |
| ▸ | PPM1B | O75688 | 1/20 | 0.31 |
| ▸ | PTPN1 | P18031 | 1/20 | 0.31 |
| ▸ | PPP1CC | P36873 | 1/20 | 0.31 |
| ▸ | MEN1 | O00255 | 1/20 | 0.30 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL16243727 | 0.94 | TSHR (0.43) | THRBTSHRALDH1A1BTKEPHX2 | |
| SCHEMBL17531128 | 0.88 | THRB (0.47) | THRBTSHRALDH1A1POLBAPEX1 | |
| SCHEMBL17531131 | 0.85 | THRB (0.42) | THRBTSHRALDH1A1POLBAPEX1 | |
| SCHEMBL14533168 | 0.85 | THRB (0.42) | THRBTSHRALDH1A1EPHX2POLB | |
| SCHEMBL16243798 | 0.85 | BTK (0.36) | THRBTSHRALDH1A1BTKANPEP | |
| SCHEMBL1152044 | 0.84 | THRB (0.47) | THRBTSHRALDH1A1POLBAPEX1 | |
| SCHEMBL10040737 | 0.84 | THRB (0.53) | THRBTSHRALDH1A1POLBAPEX1 | |
| SCHEMBL10040880 | 0.84 | THRB (0.53) | THRBTSHRALDH1A1POLBAPEX1 | |
| SCHEMBL17531129 | 0.84 | THRB (0.44) | THRBTSHRALDH1A1POLBAPEX1 | |
| SCHEMBL75023 | 0.83 | THRB (0.46) | THRBTSHRALDH1A1POLBAPEX1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 12 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20160280829-A1 | RESIN COMPOSITION FOR FORMING OPTICAL WAVEGUIDE, RESIN FILM FOR FORMING OPTICAL WAVEGUIDE, AND OPTICAL WAVEGUIDE USING THE SAME | HITACHI CHEMICAL COMPANY, LTD. (JP) | 2016-09-29 | — | — | US | disclosed |
| US-20160209743-A1 | PHOTOSENSITIVE RESIN COMPOSITION FOR FORMING MEMBER HAVING CURVED SHAPE, PHOTOSENSITIVE RESIN FILM FOR FORMING MEMBER HAVING CURVED SHAPE USING SAID COMPOSITION, AND LENS MEMBER MANUFACTRED USING SAID COMPOSITION OR SAID FILM | HITACHI CHEMICAL COMPANY, LTD. (JP) | 2016-07-21 | — | — | US | disclosed |
| US-9177819-B2 | Method for manufacturing silicon substrate having textured structure | TOKUYAMA CORPORATION (JP) | 2015-11-03 | — | — | US | disclosed |
| US-20140349485-A1 | METHOD FOR MANUFACTURING SILICON SUBSTRATE HAVING TEXTURED STRUCTURE | TOKUYAMA CORPORATION a corporation | 2014-11-27 | — | — | US | disclosed |
| US-8604096-B2 | Photosensitive resin composition, photosensitive resin varnish, photosensitive resin film, and photosensitive resin cured product | HITACHI CHEMICAL COMPANY, LTD. (JP) | 2013-12-10 | — | — | US | disclosed |
| US-8573765-B2 | Active radiation curable ink composition, ink composition for inkjet recording, printed matter, and method of producing molded article of printed matter | FUJIFILM CORPORATION (JP) | 2013-11-05 | — | — | US | disclosed |
| US-20120270963-A1 | PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN VARNISH, PHOTOSENSITIVE RESIN FILM, AND PHOTOSENSITIVE RESIN CURED PRODUCT | HITACHI CHEMICAL COMPANY, LTD. (JP) | 2012-10-25 | — | — | US | disclosed |
| US-20110241264-A1 | ACTIVE RADIATION CURABLE INK COMPOSITION, INK COMPOSITION FOR INKJET RECORDING, PRINTED MATTER, AND METHOD OF PRODUCING MOLDED ARTICLE OF PRINTED MATTER | FUJIFILM CORPORATION (JP) | 2011-10-06 | — | — | US | disclosed |
| US-20110241264-A1 | ACTIVE RADIATION CURABLE INK COMPOSITION, INK COMPOSITION FOR INKJET RECORDING, PRINTED MATTER, AND METHOD OF PRODUCING MOLDED ARTICLE OF PRINTED MATTER | FUJIFILM CORPORATION (JP) | 2011-10-06 | — | — | US | disclosed |
| US-20110033161-A1 | RESIN COMPOSITION FOR PRODUCTION OF CLAD LAYER, RESIN FILM FOR PRODUCTION OF CLAD LAYER UTILIZING THE RESIN COMPOSITION, AND OPTICAL WAVEGUIDE AND OPTICAL MODULE EACH UTILIZING THE RESIN COMPOSITION OR THE RESIN FILM | HITACHI CHEMICAL COMPANY, LTD. (JP) | 2011-02-10 | — | — | US | disclosed |
| EP-2239603-A1 | RESIN COMPOSITION FOR PRODUCTION OF CLAD LAYER, RESIN FILM FOR PRODUCTION OF CLAD LAYER UTILIZING THE RESIN COMPOSITION, AND OPTICAL WAVEGUIDE AND OPTICAL MODULE EACH UTILIZING THE RESIN COMPOSITION OR THE RESIN FILM | Hitachi Chemical Company, Ltd. (JP) | 2010-10-13 | — | — | EP | disclosed |
| EP-2182410-A1 | PHOTOSENSITIVE RESIN COMPOSITION, CURED PHOTOSENSITIVE RESIN PRODUCT, PHOTOSENSITIVE RESIN FILM, CURED PHOTOSENSITIVE RESIN FILM PRODUCT, AND OPTICAL WAVEGUIDE PRODUCED BY USING THOSE PRODUCTS | Hitachi Chemical Company, Ltd. (JP) | 2010-05-05 | — | — | EP | disclosed |