SCHEMBL11528248

SCHEMBL11528248

C=C(C)C(=O)OCCC(CC)CCCC

nearest known ligand 0.59

Predicted protein targets (top 16)

geneUniProtsupporting neighboursconfidence
TSHR P16473 6/20 0.59
THRB P10828 1/20 0.47
CYP3A4 P08684 4/20 0.46
TDP1 Q9NUW8 2/20 0.46
ATM Q13315 1/20 0.46
CA2 P00918 4/20 0.46
ALDH1A1 P00352 6/20 0.41
CA1 P00915 1/20 0.40
RECQL P46063 1/20 0.39
L3MBTL1 Q9Y468 1/20 0.39
LMNA P02545 2/20 0.38
MMP9 P14780 1/20 0.38
MMP8 P22894 1/20 0.38
MMP14 P50281 1/20 0.38
MAPK1 P28482 1/20 0.37
HSD17B10 Q99714 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL11528645 0.95 TSHR (0.62) TSHRTHRBCYP3A4TDP1ATM
SCHEMBL20148192 0.94 TSHR (0.65) TSHRTHRBCYP3A4TDP1ATM
SCHEMBL2817127 0.93 TSHR (0.64) TSHRTHRBCYP3A4TDP1ATM
SCHEMBL22567351 0.93 TSHR (0.62) TSHRTHRBCYP3A4TDP1ATM
Acrylic Acid SCHEMBL27702562 0.91 TSHR (0.51) TSHRTHRBCYP3A4TDP1ATM
Acrylic Acid SCHEMBL27262731 0.91 TSHR (0.51) TSHRTHRBCYP3A4TDP1ATM
SCHEMBL4313868 0.91 THRB (0.55) TSHRTHRBCYP3A4TDP1ATM
SCHEMBL2469659 0.90 TSHR (0.59) TSHRTHRBCYP3A4TDP1ATM
SCHEMBL11584823 0.90 TSHR (0.53) TSHRTHRBCYP3A4TDP1ATM
SCHEMBL3802304 0.88 THRB (0.55) TSHRTHRBCYP3A4TDP1ATM

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 26 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-111356712-A (meth) acrylic block copolymer and active energy ray-curable composition containing same 株式会社可乐丽 2020-06-30 CN disclosed
CN-108587527-B Preparation method of low-temperature pressure-sensitive adhesive 北京一撕得物流技术有限公司 2020-02-04 CN disclosed
US-10247863-B2 Organic pigment composition for color filters, method for producing same, and color filter DIC CORPORATION (JP) 2019-04-02 US disclosed
US-20180095205-A1 ORGANIC PIGMENT COMPOSITION FOR COLOR FILTERS, METHOD FOR PRODUCING SAME, AND COLOR FILTER DIC CORPORATION (JP) 2018-04-05 US disclosed
US-9862847-B2 Inkjet discharge method, pattern formation method, and pattern FUJIFILM CORPORATION (JP) 2018-01-09 US disclosed
CN-103718106-B Coloring composition, coloring radiation-sensitive composition, color filter, and solid-state imaging device 富士胶片株式会社 2017-10-17 CN disclosed
US-9716024-B2 Temporary bonding laminates for used in manufacture of semiconductor devices FUJIFILM CORPORATION (JP) 2017-07-25 US disclosed
US-9643221-B2 Ultrasonic cleaning method and apparatus DENKA COMPANY LIMITED (JP) 2017-05-09 US disclosed
US-9482950-B2 Curable composition for imprints, pattern-forming method and pattern FUJIFILM CORPORATION (JP) 2016-11-01 US disclosed
US-20160122563-A1 Inkjet discharge method, pattern formation method, and pattern FUJIFILM CORPORATION (JP) 2016-05-05 US disclosed
US-20140050900-A1 CURABLE COMPOSITION FOR IMPRINTS, PATTERN-FORMING METHOD AND PATTERN FUJIFILM CORPORATION (JP) 2014-02-20 US disclosed
US-20130335840-A1 MIRROR AND REFLECTIVE DEVICE FOR GENERATING SOLAR POWER Konica Minolta, Inc. (JP) 2013-12-19 US disclosed
US-20130298941-A1 ULTRASONIC CLEANING METHOD AND APPARATUS DENKA COMPANY LIMITED (JP) 2013-11-14 US disclosed
US-20130149455-A1 CURABLE COMPOSITION AND PROCESS FOR PRODUCTION OF ORGANOSILICON COMPOUND TOAGOSEI CO., LTD. (JP) 2013-06-13 US disclosed
US-20130120485-A1 LIQUID APPLICATION DEVICE, LIQUID APPLICATION METHOD, AND NANOIMPRINT SYSTEM FUJIFILM CORPORATION (JP) 2013-05-16 US disclosed
US-20130101815-A1 LAYERED PRODUCT FOR METAMATERIAL TRANSFER AND METAMATERIAL TRANSFERRED SUBSTRATE ASAHI KASEI KABUSHIKI KAISHA (JP) 2013-04-25 US disclosed
US-20130032971-A1 METHOD FOR FORMING PATTERNS AND METHOD FOR PRODUCING PATTERNED SUBSTRATES FUJIFILM CORPORATION (JP) 2013-02-07 US disclosed
US-20130026674-A1 NANOIMPRINTING METHOD AND METHOD FOR PRODUCING A MOLD FUJIFILM CORPORATION (JP) 2013-01-31 US disclosed
US-4150945-A AND AN AMINO ACID CURING AGENT SANYO TRADING CO., LTD. (JP) 1979-04-24 US disclosed
US-4069214-A ACRYLIC ESTER POLYMER, AMINO ACID CURING AGENT, COATING METALS, BONDING PLYWOOD, FINISHING TEXTILES SANYO TRADING CO., LTD. (JA) 1978-01-17 US disclosed