SCHEMBL11529296

SCHEMBL11529296

O=C1OC(=O)C2C(c3ccccc3)=CC=C(c3ccccc3)C12

nearest known ligand 0.37

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CFTR P13569 2/20 0.36
GOPC Q9HD26 2/20 0.36
MAPT P10636 2/20 0.36
LMNA P02545 1/20 0.36
HTT P42858 1/20 0.36
ALDH1A1 P00352 3/20 0.34
L3MBTL1 Q9Y468 1/20 0.34
PDE4B Q07343 1/20 0.33
CTRC Q99895 1/20 0.33
ABCG2 Q9UNQ0 1/20 0.33
PTGES O14684 1/20 0.32
PTGS2 P35354 1/20 0.32
KMT2A Q03164 1/20 0.32
KDM4E B2RXH2 1/20 0.32
PLA2G10 O15496 1/20 0.32
GAA P10253 1/20 0.32
HPGD P15428 1/20 0.32
HSD17B10 Q99714 1/20 0.32
ALOX15 P16050 1/20 0.32
TDP1 Q9NUW8 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL20429730 0.72 SMN1; SMN2 (0.46) MAPTLMNAALDH1A1CTRCGAA
SCHEMBL21537157 0.69 MEN1 (0.51) MAPTLMNAALDH1A1L3MBTL1KMT2A
SCHEMBL16866268 0.65 RAB9A (0.39) MAPTLMNAALDH1A1CTRCKDM4E
SCHEMBL21860423 0.65 RAB9A (0.39) MAPTLMNAALDH1A1CTRCKDM4E
SCHEMBL16870171 0.65 RAB9A (0.39) MAPTLMNAALDH1A1CTRCKDM4E
SCHEMBL18674140 0.65 RAB9A (0.39) MAPTLMNAALDH1A1CTRCKDM4E
SCHEMBL19201565 0.65 RAB9A (0.39) MAPTLMNAALDH1A1CTRCKDM4E
SCHEMBL23074143 0.64 ALDH1A1 (0.42) CFTRGOPCMAPTLMNAHTT
SCHEMBL17480245 0.64 ALDH1A1 (0.42) CFTRGOPCLMNAALDH1A1HSD17B10
SCHEMBL24610064 0.64 SMN1; SMN2 (0.39) MAPTLMNAALDH1A1KMT2AGAA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-4140606-A Process for preparing a polymerizable (meth) acrylate oligomer SHOWA DENKO K.K. (JP) 1979-02-20 US disclosed
US-4010289-A METHOD OF MANUFACTURING SYNTHETIC RESIN FILM HAVING HIGH WRITABILITY AND PRINTABILITY SHOWA DENKO KABUSHIKI KAISHA (JA) 1977-03-01 US disclosed