Predicted protein targets (top 18)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.47 |
| ▸ | TSHR | P16473 | 2/20 | 0.47 |
| ▸ | LMNA | P02545 | 1/20 | 0.47 |
| ▸ | ESR1 | P03372 | 4/20 | 0.46 |
| ▸ | TP53 | P04637 | 1/20 | 0.44 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.44 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.44 |
| ▸ | NPC1 | O15118 | 1/20 | 0.43 |
| ▸ | MAPT | P10636 | 1/20 | 0.43 |
| ▸ | RAB9A | P51151 | 1/20 | 0.43 |
| ▸ | AKR1C4 | P17516 | 1/20 | 0.43 |
| ▸ | AKR1C3 | P42330 | 1/20 | 0.43 |
| ▸ | AKR1C2 | P52895 | 1/20 | 0.43 |
| ▸ | AKR1C1 | Q04828 | 1/20 | 0.43 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.42 |
| ▸ | POLB | P06746 | 1/20 | 0.42 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.42 |
| ▸ | STS | P08842 | 5/20 | 0.41 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL11526322 | 1.00 | ALDH1A1 (0.47) | ALDH1A1TSHRLMNAESR1TP53 | |
| SCHEMBL11529476 | 1.00 | ALDH1A1 (0.47) | ALDH1A1TSHRLMNAESR1TP53 | |
| SCHEMBL11526903 | 0.99 | TSHR (0.45) | ALDH1A1TSHRLMNAESR1TP53 | |
| SCHEMBL11526791 | 0.94 | TSHR (0.44) | ALDH1A1TSHRLMNAESR1TP53 | |
| SCHEMBL11525930 | 0.88 | ALDH1A1 (0.41) | ALDH1A1TSHRLMNAESR1TP53 | |
| SCHEMBL1831584 | 0.82 | TSHR (0.38) | ALDH1A1TSHRLMNAESR1CYP3A4 | |
| SCHEMBL11529710 | 0.79 | ALDH1A1 (0.54) | ALDH1A1TSHRLMNAESR1TP53 | |
| SCHEMBL12228761 | 0.78 | ESR1 (0.31) | ALDH1A1TSHRLMNAESR1TP53 | |
| SCHEMBL11527713 | 0.77 | TSHR (0.53) | ALDH1A1TSHRLMNAESR1TP53 | |
| SCHEMBL10175343 | 0.75 | ALDH1A1 (0.42) | ALDH1A1TSHRLMNATP53NPC1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 20 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8043788-B2 | Alkali soluble resin; immersion lithography | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2011-10-25 | — | — | US | disclosed |
| US-8043788-B2 | Alkali soluble resin; immersion lithography | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2011-10-25 | — | — | US | disclosed |
| US-7598016-B2 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2009-10-06 | — | — | US | disclosed |
| US-7598016-B2 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2009-10-06 | — | — | US | disclosed |
| US-7514204-B2 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2009-04-07 | — | — | US | disclosed |
| US-7514204-B2 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2009-04-07 | — | — | US | disclosed |
| US-20090011365-A1 | RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2009-01-08 | — | — | US | disclosed |
| US-20090011365-A1 | RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2009-01-08 | — | — | US | disclosed |
| US-20080241736-A1 | Immersion lithography; copolymer containing ammonium salt of carboxylic acid and fluorine monomer | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2008-10-02 | — | — | US | disclosed |
| US-20080241736-A1 | Immersion lithography; copolymer containing ammonium salt of carboxylic acid and fluorine monomer | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2008-10-02 | — | — | US | disclosed |
| US-20080096131-A1 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. | 2008-04-24 | — | — | US | disclosed |
| US-20080096131-A1 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. | 2008-04-24 | — | — | US | disclosed |
| US-4132750-A | RING OPENING POLYMERIZATION OF NORBORNENE DERIVATIVES | SHOWA DENKO K.K. (JP) | 1979-01-02 | — | — | US | disclosed |
| US-4105608-A | HIGH IMPACT COMPOSITION OF RING-OPENING POLYMERIZATION PRODUCT | SHOWA DENKO K.K. (JP) | 1978-08-08 | — | — | US | disclosed |
| US-4080491-A | CATALYST CONTAINS ORGANOMETALLIC COMPOUND AND THE REACTION PRODUCT OF TUNGSTEN OR MOLYBDENUM OXIDE AND A PHOSPHOROUS HALIDE OR OXYHALIDE | SHOWA DENKO K.K. (JA) | 1978-03-21 | — | — | US | disclosed |
| US-4059561-A | AND A HALOGEN COMPOUND | SHOWA DENKO KABUSHIKI KAISHA (JA) | 1977-11-22 | — | — | US | disclosed |
| US-4028482-A | LOW VISCOSITY POLYALKENAMER | SHOWA DENKO KABUSHIKI KAISHA (JA) | 1977-06-07 | — | — | US | disclosed |
| US-4022954-A | ADHESIVES, FLOCCULATING AGENTS, ION EXCHANGE RESINS, MOLDING AGENTS | SHOWA DENKO KABUSHIKI KAISHA (JA) | 1977-05-10 | — | — | US | disclosed |
| US-3991139-A | NORBORNENE DERIVATIVES, PHENOLS, ESTER THIOETHERS | SHOWA DENKO KABUSHIKI KAISHA (JA) | 1976-11-09 | — | — | US | disclosed |
| US-3959234-A | CATALYSTS OF ORGANOALUMINUM COMPOUNDS AND A TUNGSTEN OR MOLYBDENUM COMPOUND, RING-OPENING | SHOWA DENKO KABUSHIKI KAISHA (JA) | 1976-05-25 | — | — | US | disclosed |