SCHEMBL1831584

SCHEMBL1831584

CCOC(=O)C1=CC2C=CC1C2

nearest known ligand 0.38

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TSHR P16473 1/20 0.38
CA12 O43570 4/20 0.36
CA1 P00915 4/20 0.36
CA2 P00918 4/20 0.36
CA7 P43166 4/20 0.36
CA9 Q16790 4/20 0.36
CA14 Q9ULX7 4/20 0.36
ESR1 P03372 1/20 0.36
ESR2 Q92731 1/20 0.36
KDM4E B2RXH2 3/20 0.35
LMNA P02545 2/20 0.35
CYP1A2 P05177 2/20 0.35
MAPT P10636 2/20 0.35
MEN1 O00255 1/20 0.35
ALOX15 P16050 1/20 0.35
KMT2A Q03164 1/20 0.35
NR1H2 P55055 1/20 0.35
NR1H3 Q13133 1/20 0.35
CYP3A4 P08684 1/20 0.35
MAOA P21397 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL11525930 0.87 ALDH1A1 (0.41) TSHRESR1KDM4ELMNACYP3A4
SCHEMBL18053344 0.85 LMNA (0.38) TSHRCA12CA1CA2CA7
SCHEMBL29929033 0.85 LMNA (0.38) TSHRCA12CA1CA2CA7
SCHEMBL11529476 0.82 ALDH1A1 (0.47) TSHRESR1KDM4ELMNAMAPT
SCHEMBL11529682 0.82 ALDH1A1 (0.47) TSHRESR1KDM4ELMNAMAPT
SCHEMBL11796042 0.82 TSHR (0.45) TSHRCA12CA1CA2CA7
SCHEMBL4169291 0.81 KDM4E (0.36) TSHRCA12CA1CA2CA7
SCHEMBL12228707 0.80 HTT (0.33) TSHRMEN1KMT2AALDH1A1GAA
SCHEMBL8911607 0.77 ALDH1A1 (0.36) TSHRCA12CA1CA2CA7
SCHEMBL11533080 0.77 CA12 (0.36) TSHRCA12CA1CA2CA7

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8039198-B2 Sulfonium salt-containing polymer, resist composition, and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2011-10-18 US disclosed
EP-2101217-B1 Sulfonium salt-containing polymer, resist compositon, and patterning process SHINETSU CHEMICAL CO (JP) 2011-05-11 EP disclosed
US-20090233223-A1 SULFONIUM SALT-CONTAINING POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2009-09-17 US disclosed
EP-2101217-A1 Sulfonium salt-containing polymer, resist compositon, and patterning process Shin-Etsu Chemical Co., Ltd. (JP) 2009-09-16 EP disclosed
US-6013413-A Alicyclic nortricyclene polymers and co-polymers CORNELL RESEARCH FOUNDATION, INC. (US) 2000-01-11 US disclosed
US-4132750-A RING OPENING POLYMERIZATION OF NORBORNENE DERIVATIVES SHOWA DENKO K.K. (JP) 1979-01-02 US disclosed
US-4080491-A CATALYST CONTAINS ORGANOMETALLIC COMPOUND AND THE REACTION PRODUCT OF TUNGSTEN OR MOLYBDENUM OXIDE AND A PHOSPHOROUS HALIDE OR OXYHALIDE SHOWA DENKO K.K. (JA) 1978-03-21 US disclosed
US-4028482-A LOW VISCOSITY POLYALKENAMER SHOWA DENKO KABUSHIKI KAISHA (JA) 1977-06-07 US disclosed
US-3959234-A CATALYSTS OF ORGANOALUMINUM COMPOUNDS AND A TUNGSTEN OR MOLYBDENUM COMPOUND, RING-OPENING SHOWA DENKO KABUSHIKI KAISHA (JA) 1976-05-25 US disclosed