SCHEMBL1155693

SCHEMBL1155693

[Na]c1ccc2[nH]c(S)nc2c1

nearest known ligand 0.30

Predicted protein targets (top 15)

geneUniProtsupporting neighboursconfidence
KDM4E B2RXH2 1/20 0.30
MEN1 O00255 1/20 0.30
USP2 O75604 1/20 0.30
POLB P06746 1/20 0.30
MAPT P10636 1/20 0.30
TNNI3 P19429 1/20 0.30
HTT P42858 1/20 0.30
TNNT2 P45379 1/20 0.30
RAB9A P51151 1/20 0.30
CASP6 P55212 1/20 0.30
TNNC1 P63316 1/20 0.30
KMT2A Q03164 1/20 0.30
KEAP1 Q14145 1/20 0.30
NFE2L2 Q16236 1/20 0.30
SMN1; SMN2 Q16637 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29822961 0.79 MEN1 (0.32) KDM4EMEN1USP2POLBMAPT
SCHEMBL863229 0.79 MEN1 (0.32) KDM4EMEN1USP2POLBMAPT
SCHEMBL13533675 0.76 NOS1 (0.41) KDM4EMEN1USP2POLBMAPT
SCHEMBL712511 0.76 ALPL (0.40) KDM4EMAPTRAB9AKMT2ASMN1; SMN2
SCHEMBL3836448 0.76 NOS1 (0.41) HTTRAB9A
SCHEMBL482225 0.76 F7 (0.44) KDM4EMEN1POLBMAPTKMT2A
SCHEMBL1143305 0.76 MAPKAPK2 (0.49) KDM4EMEN1USP2POLBMAPT
SCHEMBL229607 0.76 KMT2A (0.44) MEN1USP2POLBMAPTHTT
SCHEMBL7718077 0.76 PLAU (0.43) KDM4EMEN1USP2POLBMAPT
SCHEMBL12892268 0.76 ALDH1A1 (0.40) KDM4EMAPTRAB9ASMN1; SMN2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7887998-B2 Silver halide photographic light-sensitive material FUJIFILM CORPORATION (JP) 2011-02-15 US disclosed
EP-1333319-B1 Silver halide photographic light-sensitive material FUJIFILM CORP (JP) 2009-06-10 EP disclosed
EP-1403698-B1 Silver halide photographic light-sensitive material comprising a particular dye, a hydrazine derivate and a benzotriazole compound FUJIFILM CORP (JP) 2008-09-03 EP disclosed
US-7229738-B2 Silver halide photographic light-sensitive material FUJIFILM CORPORATION (JP) 2007-06-12 US disclosed
US-7225926-B2 Cleaning container for photographic treatment composition FUJIFILM CORPORATION (JP) 2007-06-05 US disclosed
US-6818374-B2 SENSITIVITY, HIGH PROCESSING STABILITY AND HIGH CONTRAST IMAGES FUJI PHOTO FILM CO., LTD. (JP) 2004-11-16 US disclosed
US-6696215-B2 HIGH CONTRAST AND PHOTOSENSITIVITY FUJI PHOTO FILM CO., LTD. (JP) 2004-02-24 US disclosed
US-6526998-B2 Method of cleaning container for photographic treatment composition and apparatus therefor FUJI PHOTO FILM CO., LTD. (JP) 2003-03-04 US disclosed
US-6491047-B2 Method of cleaning container for photographic treatment composition and apparatus therefor FUJI PHOTO FILM CO., LTD. (JP) 2002-12-10 US disclosed
EP-1220022-A2 Silver halide photographic material FUJI PHOTO FILM CO., LTD. (JP) 2002-07-03 EP disclosed
US-6001544-A UNIFORM JETTING DROPS OF ALKALINE PROCESSING SOLUTION FUJI PHOTO FILM CO., LTD. (JP) 1999-12-14 US disclosed