SCHEMBL1156077

SCHEMBL1156077

CN1c2ccccc2SC1[N]

nearest known ligand 0.43

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ MAOA P21397 1/20 0.43
▸ ALDH1A1 P00352 2/20 0.36
▸ SMN1; SMN2 Q16637 1/20 0.36
▸ GSK3B P49841 1/20 0.36
▸ KDM1A O60341 2/20 0.34
▸ NOX1 Q9Y5S8 2/20 0.33
▸ ADRA2A P08913 2/20 0.33
▸ ADRA2B P18089 2/20 0.33
▸ ADRA2C P18825 2/20 0.33
▸ CHRM3 P20309 2/20 0.33
▸ SLC6A2 P23975 2/20 0.33
▸ HTR2C P28335 2/20 0.33
▸ SLC6A4 P31645 2/20 0.33
▸ DRD3 P35462 2/20 0.33
▸ HTR2B P41595 2/20 0.33
▸ MEN1 O00255 1/20 0.33
▸ KMT2A Q03164 1/20 0.33
▸ L3MBTL1 Q9Y468 1/20 0.33
▸ GPR3 P46089 1/20 0.33
▸ BCHE P06276 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10776599 0.79 MAOA (0.43) MAOAALDH1A1SMN1; SMN2GSK3BKDM1A
SCHEMBL12264201 0.78 MAOA (0.46) MAOAALDH1A1SMN1; SMN2GSK3BKDM1A
SCHEMBL347425 0.77 MAOA (0.45) MAOAALDH1A1SMN1; SMN2GSK3BKDM1A
SCHEMBL29814962 0.77 MAOA (0.45) MAOAALDH1A1SMN1; SMN2GSK3BKDM1A
SCHEMBL16728889 0.77 MAOA (0.45) MAOAALDH1A1SMN1; SMN2GSK3BKDM1A
SCHEMBL7138108 0.75 MAOA (0.43) MAOAALDH1A1SMN1; SMN2GSK3BKDM1A
SCHEMBL31571121 0.75 MAOA (0.43) MAOAALDH1A1SMN1; SMN2GSK3BKDM1A
SCHEMBL1412732 0.75 MAOA (0.43) MAOAALDH1A1SMN1; SMN2GSK3BKDM1A
SCHEMBL32662573 0.75 MAOA (0.43) MAOAALDH1A1SMN1; SMN2GSK3BKDM1A
SCHEMBL4580436 0.75 MAOA (0.43) MAOAALDH1A1SMN1; SMN2GSK3BKDM1A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 12 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7887998-B2 Silver halide photographic light-sensitive material FUJIFILM CORPORATION (JP) 2011-02-15 — — US disclosed
EP-1403698-B1 Silver halide photographic light-sensitive material comprising a particular dye, a hydrazine derivate and a benzotriazole compound FUJIFILM CORP (JP) 2008-09-03 — — EP disclosed
US-7303851-B2 Silver halide photographic light-sensitive material FUJIFILM CORPORATION (JP) 2007-12-04 — — US disclosed
US-20070224536-A1 SILVER HALIDE PHOTOGRAPHIC LIGHT-SENSITIVE MATERIAL HIRANO MITSUNORI 2007-09-27 — — US disclosed
EP-1445649-B1 Silver halide photographic light-sensitive material comprising a particular dye, a hydrazine derivate and a benzotriazole compound FUJIFILM CORP (JP) 2007-08-22 — — EP disclosed
US-20040209204-A1 Silver halide photographic light-sensitive material FUJIFILM CORPORATION (JP) 2004-10-21 — — US disclosed
EP-1445649-A1 Silver halide photographic light-sensitive material comprising a particular dye, a hydrazine derivate and a benzotriazole compound FUJI PHOTO FILM CO., LTD. (JP) 2004-08-11 — — EP disclosed
US-20040126721-A1 Silver halide photographic light-sensitive material FUJIFILM CORPORATION (JP) 2004-07-01 — — US disclosed
EP-1403698-A1 Silver halide photographic light-sensitive material comprising a particular dye, a hydrazine derivate and a benzotriazole compound FUJI PHOTO FILM CO., LTD. (JP) 2004-03-31 — — EP disclosed
US-6200739-B1 PREVENTING SILVER CONTAMINATION BY DEVELOPING IN THE PRESENCE OF A MERCAPTO(S)-SUBSTITUTED PYRIMIDINE OR S-TRIAZINE; CYANINE DYES; SCANNER, IMAGE SETTER, RED SEMICONDUCTOR, LASER, LED; STABILITY; CONTRAST, SENSITIVITY, HIGH DENSITY FUJI PHOTO FILM CO., LTD. (JP) 2001-03-13 — — US disclosed
US-6114081-A COMPRISING A SUPPORT HAVING THEREON AT LEAST ONE OF SPECTRALLY SENSITIZED LIGHT-SENSITIVE SILVER HALIDE EMULSION LAYERS, WHEREIN AT LEAST ONE OF THE SILVER HALIDE EMULSION LAYERS CONTAINS AT LEAST TWO KINDS OF SILVER HALIDE EMULSIONS FUJI PHOTO FILM CO., LTD. (JP) 2000-09-05 — — US disclosed
US-5744279-A A SUPPORT WITH SILVER HALIDE EMULSION LAYER, EMULSION, COLLOID LAYER, HYDRAZINE GROUP, ANIONIC OR NONIONIC GROUPS FUJI PHOTO FILM CO., LTD. (JP) 1998-04-28 — — US disclosed
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