Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MAOA | P21397 | 1/20 | 0.43 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.36 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.36 |
| ▸ | GSK3B | P49841 | 1/20 | 0.36 |
| ▸ | KDM1A | O60341 | 2/20 | 0.34 |
| ▸ | NOX1 | Q9Y5S8 | 2/20 | 0.33 |
| ▸ | ADRA2A | P08913 | 2/20 | 0.33 |
| ▸ | ADRA2B | P18089 | 2/20 | 0.33 |
| ▸ | ADRA2C | P18825 | 2/20 | 0.33 |
| ▸ | CHRM3 | P20309 | 2/20 | 0.33 |
| ▸ | SLC6A2 | P23975 | 2/20 | 0.33 |
| ▸ | HTR2C | P28335 | 2/20 | 0.33 |
| ▸ | SLC6A4 | P31645 | 2/20 | 0.33 |
| ▸ | DRD3 | P35462 | 2/20 | 0.33 |
| ▸ | HTR2B | P41595 | 2/20 | 0.33 |
| ▸ | MEN1 | O00255 | 1/20 | 0.33 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.33 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.33 |
| ▸ | GPR3 | P46089 | 1/20 | 0.33 |
| ▸ | BCHE | P06276 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL10776599 | 0.79 | MAOA (0.43) | MAOAALDH1A1SMN1; SMN2GSK3BKDM1A | |
| SCHEMBL12264201 | 0.78 | MAOA (0.46) | MAOAALDH1A1SMN1; SMN2GSK3BKDM1A | |
| SCHEMBL347425 | 0.77 | MAOA (0.45) | MAOAALDH1A1SMN1; SMN2GSK3BKDM1A | |
| SCHEMBL29814962 | 0.77 | MAOA (0.45) | MAOAALDH1A1SMN1; SMN2GSK3BKDM1A | |
| SCHEMBL16728889 | 0.77 | MAOA (0.45) | MAOAALDH1A1SMN1; SMN2GSK3BKDM1A | |
| SCHEMBL7138108 | 0.75 | MAOA (0.43) | MAOAALDH1A1SMN1; SMN2GSK3BKDM1A | |
| SCHEMBL31571121 | 0.75 | MAOA (0.43) | MAOAALDH1A1SMN1; SMN2GSK3BKDM1A | |
| SCHEMBL1412732 | 0.75 | MAOA (0.43) | MAOAALDH1A1SMN1; SMN2GSK3BKDM1A | |
| SCHEMBL32662573 | 0.75 | MAOA (0.43) | MAOAALDH1A1SMN1; SMN2GSK3BKDM1A | |
| SCHEMBL1156077 | 0.75 | MAOA (0.43) | MAOAALDH1A1SMN1; SMN2GSK3BKDM1A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 31 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-116510781-B | Catalyst and preparation method thereof, and recycling method of residual polymer in musk-T production process | 山东新和成药业有限公司 | 2025-05-16 | — | — | CN | claimed |
| CN-117119704-A | Circuit board corrosion prevention method based on corrosion inhibitor | 苏州浪潮智能科技有限公司 | 2023-11-24 | — | — | CN | claimed |
| CN-117069770-A | Method for synthesizing N-heterocyclic carbene complex by utilizing hydrogen bond | 石河子大学 | 2023-11-17 | — | — | CN | claimed |
| CN-116510781-A | Catalyst and preparation method thereof, and recycling method of residual polymer in musk-T production process | 山东新和成药业有限公司 | 2023-08-01 | — | — | CN | claimed |
| CN-116510781-B | Catalyst and preparation method thereof, and recycling method of residual polymer in musk-T production process | 山东新和成药业有限公司 | 2025-05-16 | — | — | CN | disclosed |
| CN-118541213-A | Polydisulfide core-shell microcapsules | 弗门尼舍有限公司 | 2024-08-23 | — | — | CN | disclosed |
| CN-117991579-A | Silver halide film and preparation method thereof | 虎丘影像新材科技(苏州)有限公司 | 2024-05-07 | — | — | CN | disclosed |
| CN-117970738-A | Photosensitive film silver halide emulsion and preparation method thereof | 虎丘影像新材科技(苏州)有限公司 | 2024-05-03 | — | — | CN | disclosed |
| CN-117119704-A | Circuit board corrosion prevention method based on corrosion inhibitor | 苏州浪潮智能科技有限公司 | 2023-11-24 | — | — | CN | disclosed |
| CN-117119704-A | Circuit board corrosion prevention method based on corrosion inhibitor | 苏州浪潮智能科技有限公司 | 2023-11-24 | — | — | CN | disclosed |
| CN-117069770-A | Method for synthesizing N-heterocyclic carbene complex by utilizing hydrogen bond | 石河子大学 | 2023-11-17 | — | — | CN | disclosed |
| CN-116510781-A | Catalyst and preparation method thereof, and recycling method of residual polymer in musk-T production process | 山东新和成药业有限公司 | 2023-08-01 | — | — | CN | disclosed |
| EP-1408366-A2 | Non-resonant two-photon absorbing material, non-resonant two photon emitting material, and method for inducing absorption or generating emission of non-resonant two photons by using the material | FUJI PHOTO FILM CO., LTD. (JP) | 2004-04-14 | — | — | EP | disclosed |
| EP-1380887-A1 | X-radiation sensitive aqueous-based photothermographic materials and methods of using same | EASTMAN KODAK COMPANY (US) | 2004-01-14 | — | — | EP | disclosed |
| US-20030180673-A1 | Production process of silver halide photographic emulsion and silver halide photographic light-sensitive material | FUJI PHOTO FILM CO., LTD. | 2003-09-25 | — | — | US | disclosed |
| US-20030138746-A1 | Methine dye and silver halide photographic light-sensitive material containing the same | FUJI PHOTO FILM CO., LTD. | 2003-07-24 | — | — | US | disclosed |
| US-6573033-B1 | Photosensitive silver halide grains, nonphotosensitive source of reducible silver ions, reducing agent and phosphor | EASTMAN KODAK COMPANY | 2003-06-03 | — | — | US | disclosed |
| EP-0436249-B1 | Photographic emulsions sensitized by the introduction of oligomers | EASTMAN KODAK CO (US) | 1995-09-13 | — | — | EP | disclosed |
| EP-0436249-A1 | Photographic emulsions sensitized by the introduction of oligomers | EASTMAN KODAK COMPANY (US) | 1991-07-10 | — | — | EP | disclosed |
| US-5024931-A | Face centered cubic crystal lattice structure, group 8 metal ion of period 5 or 6 | EASTMAN KODAK COMPANY (US) | 1991-06-18 | — | — | US | disclosed |