SCHEMBL11566002

SCHEMBL11566002

O=C(Oc1ccccc1)Oc1cc(Br)c(Br)c(Br)c1Br

nearest known ligand 0.42

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TDP1 Q9NUW8 2/20 0.42
HPGD P15428 2/20 0.40
ATM Q13315 1/20 0.40
L3MBTL1 Q9Y468 1/20 0.40
ALDH1A1 P00352 3/20 0.38
KMT2A Q03164 3/20 0.38
MAPT P10636 2/20 0.38
PPARG P37231 1/20 0.38
NCOA2 Q15596 1/20 0.38
NPSR1 Q6W5P4 1/20 0.38
RXFP1 Q9HBX9 1/20 0.38
AKR1B1 P15121 2/20 0.38
USP2 O75604 1/20 0.37
NSD2 O96028 1/20 0.37
NCEH1 Q6PIU2 1/20 0.36
MEN1 O00255 1/20 0.36
ALOX15 P16050 1/20 0.35
HSD17B10 Q99714 1/20 0.35
EIF2AK2 P19525 1/20 0.34
CSNK2A2 P19784 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5704392 0.79 ALDH1A1 (0.42) TDP1HPGDATML3MBTL1ALDH1A1
SCHEMBL27352197 0.75 TDP1 (0.54) TDP1HPGDATML3MBTL1ALDH1A1
SCHEMBL9353455 0.75 TDP1 (0.54) TDP1HPGDATML3MBTL1ALDH1A1
SCHEMBL18073 0.75 TDP1 (0.54) TDP1HPGDATML3MBTL1ALDH1A1
SCHEMBL9353461 0.75 TDP1 (0.54) TDP1HPGDATML3MBTL1ALDH1A1
SCHEMBL9241160 0.75 TDP1 (0.54) TDP1HPGDATML3MBTL1ALDH1A1
SCHEMBL755527 0.74 TDP1 (0.64) TDP1KMT2AAKR1B1ALOX15
SCHEMBL1624312 0.73 MAPT (0.49) TDP1HPGDATML3MBTL1ALDH1A1
Bicarbonate SCHEMBL9240263 0.73 TDP1 (0.52) TDP1HPGDATML3MBTL1ALDH1A1
SCHEMBL10945396 0.73 TDP1 (0.52) TDP1HPGDATML3MBTL1ALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-4155949-A ANTIMONY TETRAOXIDE, HALOGENATED POLYMER OR COMPOUND MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 1979-05-22 US disclosed