SCHEMBL11577474

SCHEMBL11577474

CCCCNC1CN(C)CCN(C)C1

nearest known ligand 0.46

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
GNAI3 P08754 4/20 0.39
GNAO1 P09471 4/20 0.39
GNAI1 P63096 4/20 0.39
KDM4E B2RXH2 1/20 0.37
NPC1 O15118 1/20 0.37
ALDH1A1 P00352 1/20 0.37
CYP2C9 P11712 1/20 0.35
HRH3 Q9Y5N1 1/20 0.35
FUCA1 P04066 1/20 0.34
HRH4 Q9H3N8 2/20 0.33
S1PR4 O95977 2/20 0.33
S1PR1 P21453 2/20 0.33
S1PR3 Q99500 2/20 0.33
DRD2 P14416 1/20 0.33
DRD3 P35462 1/20 0.33
USP2 O75604 1/20 0.33
HDAC3 O15379 1/20 0.32
HDAC8 Q9BY41 1/20 0.32
S1PR5 Q9H228 1/20 0.32
BCHE P06276 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9699372 0.88 GNAI3 (0.41) GNAI3GNAO1GNAI1CYP2C9HRH3
SCHEMBL24072425 0.81 GNAI3 (0.50) GNAI3GNAO1GNAI1S1PR4S1PR1
SCHEMBL29316988 0.79 MEN1 (0.34)
SCHEMBL13301319 0.79 GNAI3 (0.47) GNAI3GNAO1GNAI1KDM4ENPC1
SCHEMBL25590730 0.78 GNAI3 (0.47) GNAI3GNAO1GNAI1S1PR4S1PR1
SCHEMBL14113751 0.78
SCHEMBL25653937 0.78 GUSB (0.48) GNAI3GNAO1GNAI1CYP2C9HRH3
SCHEMBL21218171 0.77 GNAI3 (0.40) GNAI3GNAO1GNAI1KDM4EALDH1A1
SCHEMBL20210155 0.75 MEN1 (0.38) HRH4DRD3
SCHEMBL23641956 0.75 MEN1 (0.38) HRH4DRD3

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-3154937-B1 CHLORINE-RESISTANT POLYETHYLENE COMPOUND AND ARTICLES MADE THEREFROM FINA TECHNOLOGY (US) 2024-05-22 EP claimed
EP-3154937-A1 CHLORINE-RESISTANT POLYETHYLENE COMPOUND AND ARTICLES MADE THEREFROM Fina Technology, Inc. (US) 2017-04-19 EP claimed
US-20170089503-A1 Chlorine-resistant Polyethylene Compound and Articles Made Therefrom TOTAL AMERICAN SERVICES, INC. 2017-03-30 US claimed
CN-106458883-A Chlorine resistant polyethylene compounds and articles made therefrom 弗纳技术股份有限公司 2017-02-22 CN claimed
WO-2015191721-A1 CHLORINE-RESISTANT POLYETHYLENE COMPOUND AND ARTICLES MADE THEREFROM FINA TECHNOLOGY, INC. (US) 2015-12-17 WO claimed
US-4112050-A Process for removing carbon dioxide containing acidic gases from gaseous mixtures using a basic salt activated with a hindered amine EXXON RESEARCH & ENGINEERING CO. (US) 1978-09-05 US claimed
EP-3154937-B1 CHLORINE-RESISTANT POLYETHYLENE COMPOUND AND ARTICLES MADE THEREFROM FINA TECHNOLOGY (US) 2024-05-22 EP disclosed
US-10584823-B2 Chlorine-resistant polyethylene compound and articles made therefrom FINA TECHNOLOGY, INC. (US) 2020-03-10 US disclosed
EP-3154937-A1 CHLORINE-RESISTANT POLYETHYLENE COMPOUND AND ARTICLES MADE THEREFROM Fina Technology, Inc. (US) 2017-04-19 EP disclosed
US-20170089503-A1 Chlorine-resistant Polyethylene Compound and Articles Made Therefrom TOTAL AMERICAN SERVICES, INC. 2017-03-30 US disclosed
WO-2015191721-A1 CHLORINE-RESISTANT POLYETHYLENE COMPOUND AND ARTICLES MADE THEREFROM FINA TECHNOLOGY, INC. (US) 2015-12-17 WO disclosed