SCHEMBL1158019

SCHEMBL1158019

COC(=O)OCC=Cc1ccccc1

nearest known ligand 0.51

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
MMP1 P03956 1/20 0.51
MMP2 P08253 1/20 0.51
MMP9 P14780 1/20 0.51
MMP12 P39900 1/20 0.51
IDO1 P14902 2/20 0.50
PAM P19021 1/20 0.50
NPC1 O15118 4/20 0.49
CACNA1B Q00975 2/20 0.49
POLB P06746 1/20 0.49
RAB9A P51151 1/20 0.48
MEN1 O00255 1/20 0.48
KMT2A Q03164 1/20 0.48
MAOB P27338 1/20 0.46
ALDH1A1 P00352 1/20 0.45
PPARD Q03181 2/20 0.45
PPARA Q07869 2/20 0.45
PPARG P37231 1/20 0.45

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1158016 1.00 MMP1 (0.51) MMP1MMP2MMP9MMP12IDO1
Thiophene SCHEMBL28361115 0.91 CACNA1B (0.46) MMP1MMP2MMP9MMP12IDO1
SCHEMBL293067 0.89 IDO1 (0.57) MMP1MMP2MMP9MMP12IDO1
SCHEMBL28456436 0.85 GRIK1 (0.44) MMP2MMP9NPC1CACNA1BRAB9A
SCHEMBL3292040 0.85 MEN1 (0.51) MMP1MMP2MMP9MMP12IDO1
SCHEMBL3292037 0.85 MEN1 (0.51) MMP1MMP2MMP9MMP12IDO1
SCHEMBL28425115 0.84 MMP1 (0.52) MMP1MMP2MMP9MMP12IDO1
SCHEMBL3297767 0.83 GSK3B (0.58) RAB9AALDH1A1
SCHEMBL4842741 0.83 NOS2 (0.49) POLBMEN1KMT2A
SCHEMBL3292230 0.83 GSK3B (0.58) RAB9AALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 66 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11827781-B2 Photosensitive resin composition and use thereof ZHEJIANG FIRST ADVANCED MATERIAL R&D INSTITUTE CO., LTD. (CN) 2023-11-28 US claimed
EP-4024133-A1 PHOTOSENSITIVE RESIN COMPOSITION AND APPLICATION THEREOF Zhejiang First Advanced Material R&D Institute Co., Ltd. (CN) 2022-07-06 EP claimed
US-20220145072-A1 PHOTOSENSITIVE RESIN COMPOSITION AND USE THEREOF HANGZHOU FIRST ELECTONIC MATERIAL CO., LTD (CN) 2022-05-12 US claimed
CN-110515271-B Photosensitive resin composition and application thereof 浙江福斯特新材料研究院有限公司 2022-03-11 CN claimed
CN-118852080-A Chiral amino chromanone derivative and synthesis method thereof 上海市奉贤区中心医院 2024-10-29 CN disclosed
CN-118852080-A Chiral amino chromanone derivative and synthesis method thereof 上海市奉贤区中心医院 2024-10-29 CN disclosed
CN-115108938-B Chiral alpha-substituted deuterated amino acid compound and preparation method thereof 武汉大学 2024-04-19 CN disclosed
CN-113912577-B Rockwell intermediate, rockwell and its derivative, and preparation and application 深圳湾实验室 2023-12-29 CN disclosed
CN-114105822-B Pseudo C 2 Symmetrical chiral diallyl substituted compound and preparation method and application thereof 武汉大学 2023-12-01 CN disclosed
US-11827781-B2 Photosensitive resin composition and use thereof ZHEJIANG FIRST ADVANCED MATERIAL R&D INSTITUTE CO., LTD. (CN) 2023-11-28 US disclosed
CN-114736108-B Allyl carbonyl enol compound and synthesis method thereof 同济大学 2023-10-27 CN disclosed
CN-115108938-A Chiral alpha-substituted deuterated amino acid compound and preparation method thereof 武汉大学 2022-09-27 CN disclosed
US-6506908-B2 From bicyclo(3.1.0)hexabe; decyclization; decarboxylation MERCK & CO., INC. 2003-01-14 US disclosed
US-20020198383-A1 Catalytic compositions and methods for asymmetric allylic alkylation NATIONAL INSTITUTES OF HEALTH (NIH), U.S. DEPT. OF HEALTH AND HUMAN SERVICES (DHHS), U.S. GOVERNMENT 2002-12-26 US disclosed
US-20020016492-A1 Process for preparing 3-hydroxymethyl-4-(aryl or heterocyclic)-cyclopentanones MERCK SHARP & DOHME CORP. 2002-02-07 US disclosed
US-20010034419-A1 Radiation transparent molding materials MITSUBISHI ENGINEERING-PLASTICS CORPORATION (JP) 2001-10-25 US disclosed
EP-1049537-A2 CATALYTIC COMPOSITIONS AND METHODS FOR ASYMMETRIC ALLYLIC ALKYLATION THE BOARD OF TRUSTEES OF THE LELAND STANFORD JUNIOR UNIVERSITY (US) 2000-11-08 EP disclosed
US-6130349-A USING COMPLEX OF MOLYBDENUM, TUNGSTEN OR CHROMIUM WITH 1,1*-BINAPHTHYL SYSTEM CONTAINING HETEROCYCLIC NITROGEN GROUP; ENANTIO- AND REGIOSELECTIVITY THE BOARD OF TRUSTEES OF THE LELAND STANFORD JUNIOR UNIVERSITY (US) 2000-10-10 US disclosed
WO-1999032225-A9 CATALYTIC COMPOSITION BASED ON CHIRAL LIGANDS WITH MOLYBDENUM, TUNGSTEN OR CHROMIUM AND METHOD FOR ASYMMETRIC ALKYLATION OF ALLYLIC SUBSTRATES UNIV LELAND STANFORD JUNIOR (US) 1999-09-30 WO disclosed
WO-1999032225-A2 CATALYTIC COMPOSITION BASED ON CHIRAL LIGANDS WITH MOLYBDENUM, TUNGSTEN OR CHROMIUM AND METHOD FOR ASYMMETRIC ALKYLATION OF ALLYLIC SUBSTRATES THE BOARD OF TRUSTEES OF THE LELAND STANFORD JUNIOR UNIVERSITY (US) 1999-07-01 WO disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20020198383-A1 Catalytic compositions and methods for asymmetric allylic alkylation MPG, UNG, APOBEC3C MMP1 3740/4885MMP2 2616/4885MMP9 2696/4885
US-20020016492-A1 Process for preparing 3-hydroxymethyl-4-(aryl or heterocyclic)-cyclopentanones CCR1, CCR5, CCR6 MMP1 1856/4885MMP2 2843/4885MMP9 1665/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.