SCHEMBL11645792

SCHEMBL11645792

CC1Oc2ccccc2OC1C(=O)O

nearest known ligand 0.55

Predicted protein targets (top 15)

geneUniProtsupporting neighboursconfidence
POLB P06746 2/20 0.55
AGER Q15109 2/20 0.46
ALDH1A1 P00352 3/20 0.41
KDM4E B2RXH2 2/20 0.41
HPGD P15428 2/20 0.41
CASP6 P55212 1/20 0.40
HTT P42858 1/20 0.37
AKR1B1 P15121 1/20 0.36
L3MBTL1 Q9Y468 1/20 0.36
PTGS2 P35354 2/20 0.35
MTNR1A P48039 1/20 0.35
NPC1 O15118 1/20 0.35
RAB9A P51151 1/20 0.35
SMN1; SMN2 Q16637 1/20 0.35
PARP1 P09874 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10974720 0.85 POLB (0.47) POLBALDH1A1KDM4EHPGDCASP6
SCHEMBL10974722 0.85 POLB (0.47) POLBALDH1A1KDM4EHPGDCASP6
SCHEMBL22292224 0.79 POLB (0.63) POLBAGERHPGDL3MBTL1MTNR1A
SCHEMBL24193356 0.77 ABCB1 (0.40) POLBALDH1A1KDM4EHPGDCASP6
SCHEMBL11737877 0.76 PTGS2 (0.48) POLBKDM4EHPGDCASP6HTT
SCHEMBL11494621 0.75 ALDH1A1 (0.56) POLBAGERALDH1A1
SCHEMBL8525523 0.75 POLB (0.43) POLBAGERPARP1
SCHEMBL1107770 0.75 POLB (0.43) POLBAGERPARP1
SCHEMBL11644231 0.74 POLB (0.57) POLBAGERALDH1A1HPGDHTT
SCHEMBL18740908 0.73 POLB (0.42) POLBCASP6AKR1B1PARP1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11874601-B2 Resist composition, method of forming resist pattern, compound, and acid diffusion-controlling agent TOKYO OHKA KOGYO CO., LTD. (JP) 2024-01-16 US disclosed
US-11874601-B2 Resist composition, method of forming resist pattern, compound, and acid diffusion-controlling agent TOKYO OHKA KOGYO CO., LTD. (JP) 2024-01-16 US disclosed
US-20220011665-A1 RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, COMPOUND, AND ACID DIFFUSION-CONTROLLING AGENT TOKYO OHKA KOGYO CO., LTD. (JP) 2022-01-13 US disclosed
US-4118507-A Benzodioxincarboxamide lipogenesis inhibitors SHELL OIL COMPANY (US) 1978-10-03 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20220011665-A1 RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, COMPOUND, AND ACID DIFFUSION-CONTROLLING AGENT MRPS23, MRPS22, SLC11A2 POLB 1693/4885AGER 4606/4885ALDH1A1 2227/4885
US-11874601-B2 Resist composition, method of forming resist pattern, compound, and acid diffusion-controlling agent MRPS23, MRPS22, SLC11A2 POLB 1789/4885AGER 4611/4885ALDH1A1 2173/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.