Predicted protein targets (top 14)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | LMNA | P02545 | 2/20 | 0.46 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.46 |
| ▸ | DUSP3 | P51452 | 1/20 | 0.46 |
| ▸ | MEN1 | O00255 | 1/20 | 0.46 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.46 |
| ▸ | PRKCA | P17252 | 1/20 | 0.42 |
| ▸ | DGKA | P23743 | 1/20 | 0.40 |
| ▸ | FAAH | O00519 | 2/20 | 0.38 |
| ▸ | HMGCR | P04035 | 2/20 | 0.37 |
| ▸ | CYP4F2 | P78329 | 1/20 | 0.37 |
| ▸ | CYP4A11 | Q02928 | 1/20 | 0.37 |
| ▸ | AR | P10275 | 2/20 | 0.35 |
| ▸ | VDR | P11473 | 2/20 | 0.35 |
| ▸ | USP2 | O75604 | 1/20 | 0.35 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL13829166 | 0.91 | HMGCR (0.40) | LMNAKDM4EDUSP3MEN1KMT2A | |
| SCHEMBL12135548 | 0.90 | HMGCR (0.40) | LMNAKDM4EDUSP3MEN1KMT2A | |
| SCHEMBL26326082 | 0.87 | LMNA (0.36) | LMNAKDM4EDUSP3MEN1KMT2A | |
| SCHEMBL8986670 | 0.86 | HMGCR (0.41) | LMNAKDM4EDUSP3MEN1KMT2A | |
| SCHEMBL11306638 | 0.86 | KDM4E (0.43) | LMNAKDM4EDUSP3MEN1KMT2A | |
| SCHEMBL26326087 | 0.86 | PRKCA (0.38) | LMNAKDM4EDUSP3MEN1KMT2A | |
| SCHEMBL19428724 | 0.85 | HMGCR (0.37) | LMNAKDM4EDUSP3MEN1KMT2A | |
| SCHEMBL13829320 | 0.84 | USP2 (0.45) | LMNAKDM4EDUSP3MEN1KMT2A | |
| SCHEMBL14354901 | 0.83 | LMNA (0.40) | LMNAKDM4EDUSP3MEN1KMT2A | |
| SCHEMBL10017776 | 0.83 | HMGCR (0.36) | LMNAKDM4EDUSP3MEN1KMT2A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 142 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-12044968-B2 | Protective film-forming composition having acetal structure and amide structure | NISSAN CHEMICAL CORPORATION (JP) | 2024-07-23 | — | — | US | disclosed |
| US-20240231231-A1 | METHOD FOR FORMING RESIST UNDERLAYER FILM, METHOD FOR PRODUCING SEMICONDUCTOR SUBSTRATE, COMPOSITION, AND RESIST UNDERLAYER FILM | JSR CORPORATION (JP) | 2024-07-11 | — | — | US | disclosed |
| US-20230400767-A1 | RADIATION-SENSITIVE RESIN COMPOSITION, METHOD OF FORMING RESIST PATTERN, POLYMER, AND COMPOUND | JSR CORPORATION (JP) | 2023-12-14 | — | — | US | disclosed |
| US-11839700-B2 | Bio-electrode composition, bio-electrode, and method for manufacturing a bio-electrode | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-12-12 | — | — | US | disclosed |
| US-11841521-B2 | Optical film, circularly polarizing plate, and organic electroluminescence display device | FUJIFILM CORPORATION (JP) | 2023-12-12 | — | — | US | disclosed |
| US-11820162-B2 | Pretreatment liquid, ink set, base material for image recording, method of producing base material for image recording, image recording material, and image recording method | FUJIFILM CORPORATION (JP) | 2023-11-21 | — | — | US | disclosed |
| US-20230369600-A1 | ELECTRODE COMPOSITION, ELECTRODE SHEET FOR ALL-SOLID STATE SECONDARY BATTERY, AND ALL-SOLID STATE SECONDARY BATTERY, AND MANUFACTURING METHODS FOR ELECTRODE SHEET FOR ALL-SOLID STATE SECONDARY BATTERY AND ALL-SOLID STATE SECONDARY BATTERY | FUJIFILM CORPORATION (JP) | 2023-11-16 | — | — | US | disclosed |
| US-11773266-B2 | Polymer, molded body, foam, resin composition, and production method for polymer | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2023-10-03 | — | — | US | disclosed |
| US-11768436-B2 | Protective film forming composition having a diol structure | NISSAN CHEMICAL CORPORATION (JP) | 2023-09-26 | — | — | US | disclosed |
| US-20230276683-A1 | ORGANIC ELECTROLUMINESCENT DISPLAY DEVICE | FUJIFILM CORPORATION (JP) | 2023-08-31 | — | — | US | disclosed |
| US-20090047601-A1 | PLANOGRAPHIC PRINTING PLATE PRECURSOR AND PRINTING METHOD USING THE SAME | FUJIFILM CORPORATION (JP) | 2009-02-19 | — | — | US | disclosed |
| US-20090029151-A1 | TRANSPARENT CONDUCTIVE FILM AND TOUCH PANEL | NITTO DENKO CORPORATION (JP) | 2009-01-29 | — | — | US | disclosed |
| US-20080227037-A1 | Resist lower layer film composition and patterning process using the same | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2008-09-18 | — | — | US | disclosed |
| US-20080220381-A1 | Antireflection film composition and patterning process using the same | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2008-09-11 | — | — | US | disclosed |
| US-7390099-B2 | Hard-coated antiglare film and method of manufacturing the same | NITTO DENKO CORPORATION (JP) | 2008-06-24 | — | — | US | disclosed |
| US-7390099-B2 | Hard-coated antiglare film and method of manufacturing the same | NITTO DENKO CORPORATION (JP) | 2008-06-24 | — | — | US | disclosed |
| US-20080090172-A1 | RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2008-04-17 | — | — | US | disclosed |
| US-20080045420-A1 | Zwitterionic Polymers Comprising Betaine-Type Units And Use Of Zwitterionic Polymers In Drilling Fluids | RHODIA CHIMIE (FR) | 2008-02-21 | — | — | US | disclosed |
| US-20080045420-A1 | Zwitterionic Polymers Comprising Betaine-Type Units And Use Of Zwitterionic Polymers In Drilling Fluids | RHODIA CHIMIE (FR) | 2008-02-21 | — | — | US | disclosed |
| US-20070212641-A1 | Lithographic printing plate precursor and method for preparation of lithographic printing plate | FUJIFILM CORPORATION (JP) | 2007-09-13 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20230400767-A1 | RADIATION-SENSITIVE RESIN COMPOSITION, METHOD OF FORMING RESIST PATTERN, POLYMER, AND COMPOUND | RER1, RAD51, RFT1 | LMNA 2894/4885KDM4E 1854/4885DUSP3 4882/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.