SCHEMBL11746367

SCHEMBL11746367

CC(O)Oc1ccc2ccccc2c1

nearest known ligand 0.57

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
CYP1A2 P05177 1/20 0.54
CYP2A6 P11509 1/20 0.54
UGT2B7 P16662 1/20 0.53
PPARG P37231 3/20 0.51
PPARA Q07869 3/20 0.51
RAB9A P51151 3/20 0.47
NPC1 O15118 1/20 0.47
MAPT P10636 2/20 0.47
PTPN7 P35236 1/20 0.47
MEN1 O00255 1/20 0.47
KMT2A Q03164 1/20 0.47
TDP1 Q9NUW8 1/20 0.47
RECQL P46063 1/20 0.45
POLB P06746 1/20 0.44
LMNA P02545 1/20 0.44
SMN1; SMN2 Q16637 1/20 0.44
AGXT P21549 1/20 0.44

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL17078190 0.91 PPARG (0.42) CYP1A2CYP2A6UGT2B7PPARGPPARA
SCHEMBL8615951 0.91 AKR1C3 (0.44) CYP1A2UGT2B7PPARGPPARAMAPT
SCHEMBL30933409 0.91 AKR1C3 (0.44) CYP1A2UGT2B7PPARGPPARAMAPT
SCHEMBL28772163 0.89 UGT2B7 (0.47) CYP1A2CYP2A6UGT2B7PPARGPPARA
SCHEMBL20911140 0.84 CYP1A2 (0.50) CYP1A2CYP2A6UGT2B7PPARGPPARA
SCHEMBL21131538 0.84 CYP1A2 (0.50) CYP1A2CYP2A6UGT2B7PPARGPPARA
SCHEMBL276584 0.83 CYP1A2 (0.58) CYP1A2CYP2A6UGT2B7PPARGPPARA
SCHEMBL14184695 0.81 UGT2B7 (0.43) CYP1A2CYP2A6UGT2B7PPARGPPARA
SCHEMBL7857138 0.79 CYP1A2 (0.54) CYP1A2CYP2A6UGT2B7PPARGPPARA
SCHEMBL2256256 0.79 CYP2A6 (0.54) CYP1A2CYP2A6UGT2B7PPARGPPARA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 34 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-111217946-B Composition comprising a compound containing a vinyl group 东京应化工业株式会社 2022-12-06 CN claimed
CN-101240073-B Soot dispersants and lubricating oil compositions containing same INFINEUM INT LTD 2013-11-27 CN claimed
CN-117003621-B 2, 7-Di (phenylethynyl) fluorenyl diol derivative crystal and preparation method thereof 江苏永星化工股份有限公司 2025-07-25 CN disclosed
US-12281198-B2 Thermoplastic resin and optical member TEIJIN LIMITED (JP) 2025-04-22 US disclosed
US-12240944-B2 Optical lens TEIJIN LIMITED (JP) 2025-03-04 US disclosed
EP-3932972-B1 THERMOPLASTIC RESIN AND OPTICAL MEMBER TEIJIN LTD (JP) 2025-02-19 EP disclosed
CN-113474685-B optical lens 帝人株式会社 2024-05-28 CN disclosed
CN-113795476-B Compound having fluorene skeleton and method for producing same 帝人株式会社 2024-04-09 CN disclosed
CN-111465589-B Compound having fluorene skeleton and method for producing same 帝人株式会社 2024-01-05 CN disclosed
CN-117003621-A 2, 7-di (phenylethynyl) fluorenyl diol derivative crystal and preparation method thereof 江苏永星化工股份有限公司 2023-11-07 CN disclosed
CN-117003621-A 2, 7-di (phenylethynyl) fluorenyl diol derivative crystal and preparation method thereof 江苏永星化工股份有限公司 2023-11-07 CN disclosed
WO-2019163829-A1 ANTI-REFLECTION FILM AND LAYERED PRODUCT FILM HAVING ANTI-REFLECTION FILM 三菱瓦斯化学株式会社 2019-08-29 WO disclosed
US-9703193-B2 Onium salt, resist composition, and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2017-07-11 US disclosed
US-9645491-B2 Sulfonium salt, chemically amplified resist composition, and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2017-05-09 US disclosed
US-20160349612-A1 SULFONIUM SALT, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2016-12-01 US disclosed
US-20160320698-A1 ONIUM SALT, RESIST COMPOSITION, AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2016-11-03 US disclosed
CN-103274937-B Soot dispersion agent and the lubricating oil composition containing this dispersion agent ENFENORM INTERNATIONAL CO. (GB) 2016-02-03 CN disclosed
CN-101240073-B Soot dispersants and lubricating oil compositions containing same INFINEUM INT LTD 2013-11-27 CN disclosed
CN-103274937-A Soot dispersants and lubricating oil compositions containing same INFINEUM INT LTD 2013-09-04 CN disclosed
US-4024159-A Process for the production of liquid acetals E. I. DU PONT DE NEMOURS AND COMPANY (US) 1977-05-17 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20160349612-A1 SULFONIUM SALT, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND PATTERNING PROCESS FANCF, PPM1F, SOS2 CYP1A2 4271/4885CYP2A6 3207/4885UGT2B7 2882/4885
US-20160320698-A1 ONIUM SALT, RESIST COMPOSITION, AND PATTERNING PROCESS SLC6A5, EIF2B5, EIF2B4 CYP1A2 3313/4885CYP2A6 3679/4885UGT2B7 2015/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.