Methacrylic Acid

Methacrylic Acid

SCHEMBL11898492

C=C(C)C(=O)[O-].O=C([O-])c1ccnc([N+](=O)[O-])c1.[Zn+2]

nearest known ligand 0.40

Full drug profile on Sugi Atlas →

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
▸ KDM5C P41229 6/20 0.40
▸ KDM4C Q9H3R0 4/20 0.40
▸ KDM2A Q9Y2K7 4/20 0.40
▸ KDM3A Q9Y4C1 4/20 0.40
▸ KDM4E B2RXH2 3/20 0.40
▸ KDM4A O75164 4/20 0.40
▸ HIPK2 Q9H2X6 6/20 0.37
▸ CA1 P00915 2/20 0.37
▸ CA2 P00918 2/20 0.37
▸ KDM4B O94953 2/20 0.34
▸ KDM5B Q9UGL1 2/20 0.34
▸ KDM6B O15054 1/20 0.34
▸ GAA P10253 1/20 0.34
▸ CSNK2A1 P68400 3/20 0.33
▸ ALDH1A1 P00352 1/20 0.33
▸ L3MBTL1 Q9Y468 1/20 0.33
▸ MAPK1 P28482 1/20 0.33
▸ SMN1; SMN2 Q16637 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Methacrylic Acid SCHEMBL11899692 0.81 KDM4C (0.44) KDM5CKDM4CKDM2AKDM3AKDM4E
Methacrylic Acid SCHEMBL11899685 0.81 KDM4C (0.44) KDM5CKDM4CKDM2AKDM3AKDM4E
SCHEMBL1880283 0.80 ALDH1A1 (0.50) ALDH1A1L3MBTL1MAPK1SMN1; SMN2
SCHEMBL11899688 0.78 MAPT (0.36) KDM5CKDM4CKDM2AKDM3AKDM4E
SCHEMBL11622568 0.78 MAPT (0.37) KDM4EGAAALDH1A1
SCHEMBL11898493 0.77 MAPT (0.35) KDM5CKDM4CKDM2AKDM3AKDM4E
SCHEMBL11621309 0.75 KDM5C (0.53) KDM5CKDM4CKDM2AKDM3AKDM4E
Methacrylic Acid SCHEMBL11898522 0.75 KDM5C (0.43) KDM5CKDM4CKDM2AKDM3AKDM4E
SCHEMBL11618571 0.74 ALDH1A1 (0.42) KDM4EGAAALDH1A1
SCHEMBL11620111 0.73 TSHR (0.50) KDM5CKDM4EHIPK2KDM4BKDM5B

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20120202153-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2012-08-09 — — US disclosed
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