Known targets — ChEMBL curated mechanism
The experimentally established mechanism targets of Methacrylic Acid. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KDM5C | P41229 | 7/20 | 0.43 |
| ▸ | KDM4C | Q9H3R0 | 5/20 | 0.43 |
| ▸ | KDM2A | Q9Y2K7 | 5/20 | 0.43 |
| ▸ | KDM3A | Q9Y4C1 | 5/20 | 0.43 |
| ▸ | KDM4E | B2RXH2 | 4/20 | 0.43 |
| ▸ | KDM4A | O75164 | 5/20 | 0.43 |
| ▸ | TAS1R3 | Q7RTX0 | 1/20 | 0.40 |
| ▸ | TAS1R1 | Q7RTX1 | 1/20 | 0.40 |
| ▸ | TAS1R2 | Q8TE23 | 1/20 | 0.40 |
| ▸ | KDM5B | Q9UGL1 | 3/20 | 0.39 |
| ▸ | KDM4B | O94953 | 2/20 | 0.39 |
| ▸ | PFKFB3 | Q16875 | 1/20 | 0.36 |
| ▸ | KDM6B | O15054 | 2/20 | 0.36 |
| ▸ | CA1 | P00915 | 2/20 | 0.35 |
| ▸ | CA2 | P00918 | 2/20 | 0.35 |
| ▸ | HIPK2 | Q9H2X6 | 4/20 | 0.34 |
| ▸ | BRAF | P15056 | 1/20 | 0.34 |
| ▸ | PREP | P48147 | 1/20 | 0.33 |
| ▸ | FAP | Q12884 | 1/20 | 0.33 |
| ▸ | CSNK2A1 | P68400 | 3/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Methacrylic Acid SCHEMBL11898560 | 0.78 | KDM4C (0.49) | KDM5CKDM4CKDM2AKDM3AKDM4E | |
| Isonicotinic Acid SCHEMBL11899993 | 0.76 | NAPRT (0.43) | KDM4ECA1CA2ALDH1A1 | |
| SCHEMBL29967026 | 0.76 | TAS1R3 (0.48) | KDM5CKDM4CKDM2AKDM3AKDM4E | |
| SCHEMBL15922749 | 0.76 | TAS1R3 (0.41) | KDM5CKDM4CKDM2AKDM3AKDM4E | |
| SCHEMBL1437180 | 0.76 | TAS1R3 (0.48) | KDM5CKDM4CKDM2AKDM3AKDM4E | |
| Methacrylic Acid SCHEMBL11898492 | 0.75 | KDM5C (0.40) | KDM5CKDM4CKDM2AKDM3AKDM4E | |
| SCHEMBL11898561 | 0.74 | TAS1R3 (0.39) | KDM5CKDM4CKDM2AKDM3AKDM4E | |
| SCHEMBL11898523 | 0.73 | TAS1R3 (0.39) | KDM5CKDM4CKDM2AKDM3AKDM4E | |
| SCHEMBL30475719 | 0.70 | PFKFB3 (0.42) | KDM5CKDM4CKDM2AKDM3AKDM4E | |
| SCHEMBL29957382 | 0.70 | KDM4C (0.61) | KDM5CKDM4CKDM2AKDM3AKDM4E |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20120202153-A1 | RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-08-09 | — | — | US | disclosed |