Methacrylic Acid

Methacrylic Acid

SCHEMBL11899692

C=C(C)C(=O)O.O=C(O)c1ccnc([N+](=O)[O-])c1

nearest known ligand 0.44

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Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ KDM4C Q9H3R0 5/20 0.44
▸ KDM4E B2RXH2 3/20 0.44
▸ KDM6B O15054 3/20 0.44
▸ KDM5C P41229 3/20 0.44
▸ KDM2A Q9Y2K7 3/20 0.44
▸ KDM3A Q9Y4C1 3/20 0.44
▸ ALKBH5 Q6P6C2 2/20 0.44
▸ FTO Q9C0B1 2/20 0.44
▸ KDM4A O75164 2/20 0.44
▸ ALDH1A1 P00352 2/20 0.44
▸ TET3 O43151 1/20 0.44
▸ BBOX1 O75936 1/20 0.44
▸ MAPT P10636 1/20 0.44
▸ KDM5A P29375 1/20 0.44
▸ ASPH Q12797 1/20 0.44
▸ KDM4D Q6B0I6 1/20 0.44
▸ TET2 Q6N021 1/20 0.44
▸ KDM7A Q6ZMT4 1/20 0.44
▸ KDM8 Q8N371 1/20 0.44
▸ TET1 Q8NFU7 1/20 0.44

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Methacrylic Acid SCHEMBL11899685 1.00 KDM4C (0.44) KDM4CKDM4EKDM6BKDM5CKDM2A
SCHEMBL11621309 0.89 KDM5C (0.53) KDM4CKDM4EKDM6BKDM5CKDM2A
Methacrylic Acid SCHEMBL11898492 0.81 KDM5C (0.40) KDM4CKDM4EKDM6BKDM5CKDM2A
SCHEMBL1880283 0.81 ALDH1A1 (0.50) ALDH1A1MAPTLMNA
SCHEMBL11622568 0.79 MAPT (0.37) KDM4EALDH1A1MAPTLMNA
SCHEMBL11899688 0.79 MAPT (0.36) KDM4CKDM4EKDM6BKDM5CKDM2A
SCHEMBL11898493 0.78 MAPT (0.35) KDM4CKDM4EKDM6BKDM5CKDM2A
Methacrylic Acid SCHEMBL11898560 0.75 KDM4C (0.49) KDM4CKDM4EKDM6BKDM5CKDM2A
SCHEMBL11618571 0.75 ALDH1A1 (0.42) KDM4EALDH1A1MAPTLMNA
SCHEMBL1681636 0.74 ALDH1A1 (0.50) KDM4CKDM4EKDM6BKDM5CKDM2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20120202153-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2012-08-09 — — US disclosed
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